JP4996542B2 - 有機金属錯体、発光材料、発光素子、及び発光装置 - Google Patents
有機金属錯体、発光材料、発光素子、及び発光装置 Download PDFInfo
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- JP4996542B2 JP4996542B2 JP2008144291A JP2008144291A JP4996542B2 JP 4996542 B2 JP4996542 B2 JP 4996542B2 JP 2008144291 A JP2008144291 A JP 2008144291A JP 2008144291 A JP2008144291 A JP 2008144291A JP 4996542 B2 JP4996542 B2 JP 4996542B2
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- 230000007246 mechanism Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- WOYDRSOIBHFMGB-UHFFFAOYSA-N n,9-diphenyl-n-(9-phenylcarbazol-3-yl)carbazol-3-amine Chemical compound C1=CC=CC=C1N(C=1C=C2C3=CC=CC=C3N(C=3C=CC=CC=3)C2=CC=1)C1=CC=C(N(C=2C=CC=CC=2)C=2C3=CC=CC=2)C3=C1 WOYDRSOIBHFMGB-UHFFFAOYSA-N 0.000 description 1
- RFBDMIDJTYEWSG-UHFFFAOYSA-N n-(4-carbazol-9-ylphenyl)-9,9-dimethyl-n-phenylfluoren-2-amine Chemical compound C1=C2C(C)(C)C3=CC=CC=C3C2=CC=C1N(C=1C=CC(=CC=1)N1C2=CC=CC=C2C2=CC=CC=C21)C1=CC=CC=C1 RFBDMIDJTYEWSG-UHFFFAOYSA-N 0.000 description 1
- UMFJAHHVKNCGLG-UHFFFAOYSA-N n-Nitrosodimethylamine Chemical compound CN(C)N=O UMFJAHHVKNCGLG-UHFFFAOYSA-N 0.000 description 1
- VZYZZKOUCVXTOJ-UHFFFAOYSA-N n-[4-[4-(n-(9,9-dimethylfluoren-2-yl)anilino)phenyl]phenyl]-9,9-dimethyl-n-phenylfluoren-2-amine Chemical group C1=C2C(C)(C)C3=CC=CC=C3C2=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=C2C(C)(C)C3=CC=CC=C3C2=CC=1)C1=CC=CC=C1 VZYZZKOUCVXTOJ-UHFFFAOYSA-N 0.000 description 1
- LBFXFIPIIMAZPK-UHFFFAOYSA-N n-[4-[4-(n-phenanthren-9-ylanilino)phenyl]phenyl]-n-phenylphenanthren-9-amine Chemical group C1=CC=CC=C1N(C=1C2=CC=CC=C2C2=CC=CC=C2C=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C3=CC=CC=C3C=2)C=C1 LBFXFIPIIMAZPK-UHFFFAOYSA-N 0.000 description 1
- COVCYOMDZRYBNM-UHFFFAOYSA-N n-naphthalen-1-yl-9-phenyl-n-(9-phenylcarbazol-3-yl)carbazol-3-amine Chemical compound C1=CC=CC=C1N1C2=CC=C(N(C=3C=C4C5=CC=CC=C5N(C=5C=CC=CC=5)C4=CC=3)C=3C4=CC=CC=C4C=CC=3)C=C2C2=CC=CC=C21 COVCYOMDZRYBNM-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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- 229920002850 poly(3-methoxythiophene) polymer Polymers 0.000 description 1
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- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
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- 239000011112 polyethylene naphthalate Substances 0.000 description 1
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- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
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- 239000004800 polyvinyl chloride Substances 0.000 description 1
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- 150000004032 porphyrins Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
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- DOYOPBSXEIZLRE-UHFFFAOYSA-N pyrrole-3-carboxylic acid Chemical compound OC(=O)C=1C=CNC=1 DOYOPBSXEIZLRE-UHFFFAOYSA-N 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
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- 150000003460 sulfonic acids Chemical class 0.000 description 1
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- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- YNVOMSDITJMNET-UHFFFAOYSA-N thiophene-3-carboxylic acid Chemical compound OC(=O)C=1C=CSC=1 YNVOMSDITJMNET-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- ZRPRRAOCEABMND-UHFFFAOYSA-K trichloroiridium;hydrate;hydrochloride Chemical compound O.Cl.Cl[Ir](Cl)Cl ZRPRRAOCEABMND-UHFFFAOYSA-K 0.000 description 1
- HSSMNYDDDSNUKH-UHFFFAOYSA-K trichlororhodium;hydrate Chemical compound O.Cl[Rh](Cl)Cl HSSMNYDDDSNUKH-UHFFFAOYSA-K 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- GWDUZCIBPDVBJM-UHFFFAOYSA-L zinc;2-(2-hydroxyphenyl)-3h-1,3-benzothiazole-2-carboxylate Chemical compound [Zn+2].OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1.OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1 GWDUZCIBPDVBJM-UHFFFAOYSA-L 0.000 description 1
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Description
井上晴夫、外3名、基礎化学コース 光化学I(丸善株式会社)、106−110 Zhang、Guo−Lin、外5名、Gaodeng Xuexiao Huaxue Xuebao(2004)、vol.25、No.3、397−400
本実施の形態では、本発明の有機金属錯体について説明する。
本実施の形態では、実施の形態1に記載の有機金属錯体を用いた発光素子について説明する。
本実施の形態は、複数の発光ユニットを積層した構成の発光素子(以下、積層型素子という)の態様について、図2を参照して説明する。この発光素子は、第1の電極と第2の電極との間(すなわち実施の形態2におけるEL層102)に、複数の発光ユニットを有する積層型発光素子である。各発光ユニットの構成としては、実施の形態2でEL層102として示した構成と同様な構成を用いることができる。つまり、実施の形態2で示した発光素子は、1つの発光ユニットを有する発光素子である。本実施の形態では、複数の発光ユニットを有する発光素子について説明する。
本実施の形態では、実施の形態1に記載の有機金属錯体を含む発光素子、すなわち実施の形態2もしくは実施の形態3に示した発光素子を用いて作製された発光装置の一例について説明する。なお、本発明の発光装置は以下に説明する構成を有する発光装置のみに限定されず、その表示を担う部分(本実施の形態では画素部602)に実施の形態1に記載の有機金属錯体が含まれているもの全てを含むものとする。
本実施の形態では、実施の形態4に示す発光装置をその一部に含む電子機器について説明する。これら電子機器は、実施の形態1で示した有機金属錯体を含む発光素子、すなわち実施の形態2もしくは実施の形態3で説明した発光素子を含んだ表示部を有する。
本合成例1では、下記構造式(1)で表される本発明の有機金属錯体、ビス[2−(4−フルオロフェニル)−3,5−ジイソプロピルピラジナト)](ピコリナト)イリジウム(III)(略称:[Ir(diPrFppr)2(pic)])の合成例を具体的に説明する。
まず、脱水エタノール25mL、1−(4−フルオロフェニル)−3−メチル−1,2−ブタンジオン(みどり化学株式会社製)2.19g、無水エチレンジアミン0.68gを還流管を付けたナスフラスコに入れ、内部をアルゴン置換した。そして、この反応容器にマイクロ波(2.45GHz 100W)を35分間照射することで加熱した。次に、この反応容器内に、アセトン1.66mLと水酸化カリウム0.63gを添加し、さらに内部をアルゴン置換して、マイクロ波(2.45GHz 100W)を15分間照射することで加熱した。この混合物に水を加え、酢酸エチルにて有機層を抽出した。得られた有機層を水で洗浄し、硫酸マグネシウムにて乾燥した。乾燥した後の溶液をろ過した。この溶液の溶媒を留去した後、得られた残渣を、ジクロロメタンを展開溶媒とするシリカゲルカラムクロマトグラフィーで精製し、目的のピラジン誘導体HdiPrFpprを得た(乳白色粉末、収率85%)。なお、マイクロ波の照射はマイクロ波合成装置(CEM社製 Discover)を用いて行った。ステップ1の合成スキームを下記(a−1)に示す。
次に、2−エトキシエタノール15mLと水5mL、上記ステップ1で得たピラジン誘導体HdiPrFppr0.79g、塩化イリジウム水和物(IrCl3・H2O)(Sigma−Aldrich社製)0.46gを、還流管を付けたナスフラスコに入れ、内部をアルゴン置換した。そして、この反応容器にマイクロ波(2.45GHz 150W)を30分間照射することで加熱し、反応させた。反応溶液より析出してきた粉末をろ過し、エタノールにて洗浄することにより、複核錯体[Ir(diPrFppr)2Cl]2を得た(山吹色粉末、収率54%)。ステップ2の合成スキームを下記(b−1)に示す。
ジクロロメタン25mL、上記ステップ2で得た複核錯体[Ir(diPrFppr)2Cl]2 0.63g、ピコリン酸0.41gを、還流管を付けたナスフラスコに入れ、内部をアルゴン置換した。そして、この反応容器にマイクロ波(2.45GHz 50〜100W)を45分間照射することで加熱し、反応させた。反応溶液を室温まで放冷し、溶媒を留去した。得られた残渣を、酢酸エチルを展開溶媒とする中性シリカゲルカラムクロマトグラフィーで精製し、さらにメタノールにて再結晶することにより、本発明の有機金属錯体[Ir(diPrFppr)2(pic)]を得た(黄色粉末、収率24%)。ステップ3の合成スキームを下記(c−1)に示す。
本合成例では、実施形態1で構造式(40)として示した本発明の有機金属錯体、(アセチルアセトナト)ビス{2−(2,4−ジフルオロフェニル)−3,5−ジメチルピラジナト}イリジウム(III)(略称:[Ir(dmF2ppr)2(acac)])の合成例を具体的に説明する。以下にIr(dmF2ppr)2(acac)の構造式を示す。
まず、中間体である2−クロロ−3,5−ジメチルピラジンの合成法を説明する。2,6−ジメチルピラジン7.12gとジメチルホルムアミド(略称:DMF)6.5mLを、滴下ロートと温度計を付けた三つ口フラスコに入れ、内部を窒素フローした。滴下ロートに塩化スルフリル6.7mLを入れ、この反応容器を氷浴に浸した。反応溶液を撹拌しながら、溶液の温度が45℃±5℃を保持するように、塩化スルフリルを滴下した。その後、溶液の温度が40℃以下になったのを確認して、水を加えた。再び溶液の温度が40℃以下になったのを確認して、水酸化ナトリウム水溶液を加えて、溶液のpHを7〜8に調製した。この溶液を水蒸気蒸留した。得られた水溶液をジクロロメタンで抽出し、有機層を分離した。得られた有機層を硫酸マグネシウムにて乾燥した。乾燥した後の溶液をろ過した。この溶液の溶媒を留去した後、得られた残渣を減圧蒸留し、目的の中間体を得た(無色透明の液体、収率36%)。
次に、2−エトキシエタノール18mLと水6mL、上記ステップ1で得たピラジン誘導体HdmF2ppr1.28g、塩化イリジウム水和物(IrCl3・H2O)(Sigma−Aldrich社製)0.87gを、還流管を付けたナスフラスコに入れ、内部をアルゴン置換した。そして、この反応容器にマイクロ波(2.45GHz 100W)を1時間照射することで加熱し、反応させた。反応溶液に水を加えて、ジクロロメタンにて抽出し有機層を分離した。得られた有機層を硫酸マグネシウムにて乾燥した。乾燥した後の溶液をろ過した。この溶液の溶媒を濃縮し、析出してきた黄色粉末をろ過し、エタノールにて洗浄することにより、複核錯体[Ir(dmF2ppr)2Cl]2 を得た(収率63%)。ステップ2の合成スキームを下記(b−2)に示す。
2−エトキシエタノール20mL、上記ステップ2で得た複核錯体[Ir(dmF2ppr)2Cl]2 0.75g、アセチルアセトン0.17mL、炭酸ナトリウム0.59gを、還流管を付けたナスフラスコに入れ、フラスコ内をアルゴン置換した。その後、マイクロ波(2.45GHz 100W)を30分間照射し、反応させた。反応溶液にジクロロメタンを加えてろ過した。得られたろ液を濃縮して、黄土色粉末を析出させた。この粉末をろ取し、エタノールにて洗浄することにより、本発明の有機金属錯体[Ir(dmF2ppr)2(acac)]を得た(収率53%)。本ステップの合成スキームを下記(c−3)に示す。
本合成例3では、実施形態1で示した構造式(13)で表される本発明の有機金属錯体、(アセチルアセトナト)ビス{2−(4−フルオロフェニル)−3,5−ジメチルピラジナト}イリジウム(III)(略称:[Ir(dmFppr)2(acac)])の合成例を具体的に例示する。以下に[Ir(dmFppr)2(acac)]の構造式を示す。
まず、上記合成例2のステップ1で得られた中間体である2−クロロ−3,5−ジメチルピラジン1.42gと4−フルオロフェニルボロン酸1.40g、炭酸ナトリウム1.06g、ビス(トリフェニルホスフィン)パラジウム(II)ジクロリド(略称:Pd(PPh3)2Cl2)0.046g、水15mL、アセトニトリル15mLを、還流管を付けたナスフラスコに入れ、内部をアルゴン置換した。この反応容器にマイクロ波(2.45GHz 100W)を10分間照射することで加熱した。その後この溶液に水を加え、ジクロロメタンにて有機層を抽出した。得られた有機層を水で洗浄し、硫酸マグネシウムにて乾燥した。乾燥した後の溶液をろ過した。この溶液の溶媒を留去した後、得られた残渣を、ジクロロメタンを展開溶媒とするシリカゲルカラムクロマトグラフィーで精製し、目的のピラジン誘導体HdmFpprを得た(白色粉末、収率77%)。ステップ1の合成スキームを下記(a−3)に示す。
次に、2−エトキシエタノール12mLと水3mL、上記ステップ1で得たピラジン誘導体HdmFppr1.55g、塩化イリジウム水和物(IrCl3・H2O)(Sigma−Aldrich社製)0.92gを、還流管を付けたナスフラスコに入れ、内部をアルゴン置換した。そして、この反応容器にマイクロ波(2.45GHz 100W)を30分間照射することで加熱し、反応させた。反応溶液をろ過し、エタノールにて洗浄することにより、複核錯体[Ir(dmFppr)2Cl]2を得た(深緑色粉末、収率63%)。ステップ2の合成スキームを下記(b−3)に示す。
2−エトキシエタノール15mL、上記ステップ2で得た複核錯体[Ir(dmFppr)2Cl]2 1.19g、アセチルアセトン0.29mL、炭酸ナトリウム1.00gを、還流管を付けたナスフラスコに入れ、フラスコ内をアルゴン置換した。その後、マイクロ波(2.45GHz 100W)を30分間照射し、反応させた。反応溶液にジクロロメタンを加えてろ過した。得られたろ液を濃縮して、オレンジ色粉末を析出させた。この粉末をろ取し、エタノール次いでエーテルにて洗浄することにより、本発明の有機金属錯体[Ir(dmFppr)2(acac)]を得た(収率82%)。本ステップの合成スキームを下記(c−3)に示す。
まず、陽極として110nmの膜厚でケイ素を含むインジウム錫酸化物(ITSO)が成膜されたガラス基板を用意した。ITSO表面は、2mm角の大きさで表面が露出するよう周辺をポリイミド膜で覆い、電極面積は2mm×2mmとした。この基板上に発光素子を形成するための前処理として、基板表面を水で洗浄し、200℃で1時間焼成した後、UVオゾン処理を370秒行った。その後、10−4Pa程度まで内部が減圧された真空蒸着装置に基板を導入し、真空蒸着装置内の加熱室において170℃で30分間の真空焼成を行った後、基板を30分程度放冷した。
本合成例4では、実施形態1で示した構造式(12)で表される本発明の有機金属錯体、ビス{2−(4−フルオロフェニル)−3,5−ジメチルピラジナト}(ピコリナト)イリジウム(III)(略称:[Ir(dmFppr)2(pic)])の合成例を具体的に例示する。以下に[Ir(dmFppr)2(pic)]の構造式を示す。
実施例3における合成例3のステップ1と同様に合成した。
実施例3における合成例3のステップ2と同様に合成した。
上記ステップ2で得た複核錯体[Ir(dmFppr)2Cl]2 0.51g、ピコリン酸0.40g、炭酸ナトリウム0.34g、ジクロロメタン25mLを、還流管を付けたナスフラスコに入れ、フラスコ内をアルゴン置換した。その後、マイクロ波(2.45GHz 100W)を30分間照射し、反応させた。反応溶液をろ過し、ろ液を濃縮して残渣を得た。得られた残渣をメタノールにて再結晶することにより、本発明の有機金属錯体[Ir(dmFppr)2(pic)]を得た(山吹色粉末、収率84%)。本ステップの合成スキームを下記(c−4)に示す。
本合成例5では、実施形態1で示した構造式(17)で表される本発明の有機金属錯体、ビス{2−(4−フルオロフェニル)−3,5−ジメチルピラジナト}(L−プロリナト)イリジウム(III)(略称:[Ir(dmFppr)2(pro)])の合成例を具体的に例示する。以下に[Ir(dmFppr)2(pro)]の構造式を示す。
実施例3における合成例3のステップ1と同様に合成した。
実施例3における合成例3のステップ2と同様に合成した。
上記ステップ2で得た複核錯体[Ir(dmFppr)2Cl]2 0.35gをアセトン10mLに懸濁させ、そこへ水10mL、次いで炭酸水素ナトリウム0.47g、次いでL−プロリン0.064gを順に添加した。この混合溶液を室温にて20時間撹拌し、反応させた。反応溶液をろ過し、得られたろ液を濃縮し、粉末を析出させた。この析出物をろ取し、クロロホルムとヘキサンの混合溶液で再結晶することにより、本発明の有機金属錯体[Ir(dmFppr)2(pro)]をオレンジ粉末状固体として得た(収率25%)。本ステップの合成スキームを下記(c−5)に示す。
本合成例6では、実施形態1で示した構造式(21)で表される本発明の有機金属錯体、トリス{2−(4−フルオロフェニル)−3,5−ジメチルピラジナト}イリジウム(III)(略称:[Ir(dmFppr)3])の合成例を具体的に例示する。以下に[Ir(dmFppr)3]の構造式を示す。
102 EL層
103 電極
501 電極
502 電極
511 発光ユニット
512 発光ユニット
513 電荷発生層
601 駆動回路部(ソース側駆動回路)
602 画素部
603 駆動回路部(ゲート側駆動回路)
604 封止基板
605 シール材
607 空間
608 配線
609 FPC(フレキシブルプリントサーキット)
610 素子基板
611 スイッチング用TFT
612 電流制御用TFT
613 電極
614 絶縁物
616 EL層
617 電極
618 発光素子
623 nチャネル型TFT
624 pチャネル型TFT
901 筐体
902 液晶層
903 バックライト
904 筐体
905 ドライバIC
906 端子
920 蛍光光度計((株)浜松ホトニクス製 FS
951 基板
952 電極
953 絶縁層
954 隔壁層
955 EL層
956 電極
2001 筐体
2002 光源
3001 照明装置
9101 筐体
9102 支持台
9103 表示部
9104 スピーカー部
9105 ビデオ入力端子
9201 本体
9202 筐体
9203 表示部
9204 キーボード
9205 外部接続ポート
9206 ポインティングデバイス
9401 本体
9402 筐体
9403 表示部
9404 音声入力部
9405 音声出力部
9406 操作キー
9407 外部接続ポート
9408 アンテナ
9501 本体
9502 表示部
9503 筐体
9504 外部接続ポート
9505 リモコン受信部
9506 受像部
9507 バッテリー
9508 音声入力部
9509 操作キー
9510 接眼部
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2008
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- 2008-05-27 WO PCT/JP2008/060109 patent/WO2008149828A1/en active Application Filing
- 2008-06-02 JP JP2008144291A patent/JP4996542B2/ja not_active Expired - Fee Related
- 2008-06-03 US US12/132,174 patent/US20080305361A1/en not_active Abandoned
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JP2012162564A (ja) * | 2007-06-05 | 2012-08-30 | Semiconductor Energy Lab Co Ltd | 有機金属錯体、発光素子及び発光装置 |
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JP2012162564A (ja) | 2012-08-30 |
JP2009013167A (ja) | 2009-01-22 |
JP5191577B2 (ja) | 2013-05-08 |
KR20100018036A (ko) | 2010-02-16 |
WO2008149828A1 (en) | 2008-12-11 |
US20080305361A1 (en) | 2008-12-11 |
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