JP4989571B2 - 多孔質膜の前駆体組成物の溶液 - Google Patents

多孔質膜の前駆体組成物の溶液 Download PDF

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JP4989571B2
JP4989571B2 JP2008173910A JP2008173910A JP4989571B2 JP 4989571 B2 JP4989571 B2 JP 4989571B2 JP 2008173910 A JP2008173910 A JP 2008173910A JP 2008173910 A JP2008173910 A JP 2008173910A JP 4989571 B2 JP4989571 B2 JP 4989571B2
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film
acid
group
compound
porous
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JP2010016130A (ja
JP2010016130A5 (https=
Inventor
正明 平川
高博 中山
伸一 朝比奈
貴久 山崎
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Ulvac Inc
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Ulvac Inc
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  • Silicon Compounds (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
JP2008173910A 2008-07-02 2008-07-02 多孔質膜の前駆体組成物の溶液 Active JP4989571B2 (ja)

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JP2008173910A JP4989571B2 (ja) 2008-07-02 2008-07-02 多孔質膜の前駆体組成物の溶液

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JP2008173910A JP4989571B2 (ja) 2008-07-02 2008-07-02 多孔質膜の前駆体組成物の溶液

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JP2010016130A JP2010016130A (ja) 2010-01-21
JP2010016130A5 JP2010016130A5 (https=) 2011-05-26
JP4989571B2 true JP4989571B2 (ja) 2012-08-01

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101977927B1 (ko) 2012-07-11 2019-05-13 인텔렉츄얼 키스톤 테크놀로지 엘엘씨 광전소자 및 그 제조방법
JP6187115B2 (ja) * 2013-10-04 2017-08-30 三菱ケミカル株式会社 シリカ多孔質膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002173641A (ja) * 2000-09-29 2002-06-21 Asahi Kasei Corp 絶縁薄膜用の多孔性シリカ薄膜
US7307343B2 (en) * 2002-05-30 2007-12-11 Air Products And Chemicals, Inc. Low dielectric materials and methods for making same
JP4447846B2 (ja) * 2003-02-28 2010-04-07 宇部日東化成株式会社 多孔質シリカ系薄膜の製造方法
JP4279064B2 (ja) * 2003-06-27 2009-06-17 三菱化学株式会社 多孔性シリカ膜、それを有する積層体
JP5030478B2 (ja) * 2006-06-02 2012-09-19 株式会社アルバック 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置

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