JP4989223B2 - 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体 - Google Patents

外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体 Download PDF

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JP4989223B2
JP4989223B2 JP2006526105A JP2006526105A JP4989223B2 JP 4989223 B2 JP4989223 B2 JP 4989223B2 JP 2006526105 A JP2006526105 A JP 2006526105A JP 2006526105 A JP2006526105 A JP 2006526105A JP 4989223 B2 JP4989223 B2 JP 4989223B2
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layer
optical microstructure
optical
radiation
negative photoresist
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JP2007507364A5 (enExample
JP2007507364A (ja
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フリース，ロバート・ピー
ラインハート，トーマス・エイ
ウッド，ロバート・エル
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ブライト・ヴュー・テクノロジーズ・コーポレイション
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0025—Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP2006526105A 2003-09-11 2004-08-20 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体 Expired - Lifetime JP4989223B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/661,974 US7192692B2 (en) 2003-09-11 2003-09-11 Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
US10/661,974 2003-09-11
PCT/US2004/027071 WO2005036271A2 (en) 2003-09-11 2004-08-20 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby

Publications (3)

Publication Number Publication Date
JP2007507364A JP2007507364A (ja) 2007-03-29
JP2007507364A5 JP2007507364A5 (enExample) 2007-10-04
JP4989223B2 true JP4989223B2 (ja) 2012-08-01

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JP2006526105A Expired - Lifetime JP4989223B2 (ja) 2003-09-11 2004-08-20 外層の間に挟み込まれた放射線感応層を結像処理することによって微細構造体を形成するためのシステムおよび方法並びにそれにより形成された微細構造体

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US (3) US7192692B2 (enExample)
EP (1) EP1664929B1 (enExample)
JP (1) JP4989223B2 (enExample)
KR (1) KR101192624B1 (enExample)
AT (1) ATE527579T1 (enExample)
WO (1) WO2005036271A2 (enExample)

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Publication number Publication date
EP1664929A2 (en) 2006-06-07
JP2007507364A (ja) 2007-03-29
US20050058949A1 (en) 2005-03-17
US20070003868A1 (en) 2007-01-04
EP1664929B1 (en) 2011-10-05
WO2005036271A2 (en) 2005-04-21
US7192692B2 (en) 2007-03-20
WO2005036271A3 (en) 2005-08-04
KR20070005910A (ko) 2007-01-10
US20080233519A1 (en) 2008-09-25
ATE527579T1 (de) 2011-10-15
KR101192624B1 (ko) 2012-10-18
US7425407B1 (en) 2008-09-16

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