ATE527579T1 - Systeme und verfahren zur herstellung von mikrostrukturen durch abbilden einer zwischen äusseren schichten geschichteten strahlungsempfindlichen schicht und dadurch hergestellte mikrostrukturen - Google Patents

Systeme und verfahren zur herstellung von mikrostrukturen durch abbilden einer zwischen äusseren schichten geschichteten strahlungsempfindlichen schicht und dadurch hergestellte mikrostrukturen

Info

Publication number
ATE527579T1
ATE527579T1 AT04809596T AT04809596T ATE527579T1 AT E527579 T1 ATE527579 T1 AT E527579T1 AT 04809596 T AT04809596 T AT 04809596T AT 04809596 T AT04809596 T AT 04809596T AT E527579 T1 ATE527579 T1 AT E527579T1
Authority
AT
Austria
Prior art keywords
microstructures
sensitive layer
outer layers
imaging
radiation
Prior art date
Application number
AT04809596T
Other languages
German (de)
English (en)
Inventor
Robert Freese
Thomas Rinehart
Robert Wood
Original Assignee
Bright View Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bright View Technologies Corp filed Critical Bright View Technologies Corp
Application granted granted Critical
Publication of ATE527579T1 publication Critical patent/ATE527579T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0025—Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
AT04809596T 2003-09-11 2004-08-20 Systeme und verfahren zur herstellung von mikrostrukturen durch abbilden einer zwischen äusseren schichten geschichteten strahlungsempfindlichen schicht und dadurch hergestellte mikrostrukturen ATE527579T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/661,974 US7192692B2 (en) 2003-09-11 2003-09-11 Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
PCT/US2004/027071 WO2005036271A2 (en) 2003-09-11 2004-08-20 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby

Publications (1)

Publication Number Publication Date
ATE527579T1 true ATE527579T1 (de) 2011-10-15

Family

ID=34273989

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04809596T ATE527579T1 (de) 2003-09-11 2004-08-20 Systeme und verfahren zur herstellung von mikrostrukturen durch abbilden einer zwischen äusseren schichten geschichteten strahlungsempfindlichen schicht und dadurch hergestellte mikrostrukturen

Country Status (6)

Country Link
US (3) US7192692B2 (enExample)
EP (1) EP1664929B1 (enExample)
JP (1) JP4989223B2 (enExample)
KR (1) KR101192624B1 (enExample)
AT (1) ATE527579T1 (enExample)
WO (1) WO2005036271A2 (enExample)

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Also Published As

Publication number Publication date
EP1664929A2 (en) 2006-06-07
JP2007507364A (ja) 2007-03-29
US20050058949A1 (en) 2005-03-17
JP4989223B2 (ja) 2012-08-01
US20070003868A1 (en) 2007-01-04
EP1664929B1 (en) 2011-10-05
WO2005036271A2 (en) 2005-04-21
US7192692B2 (en) 2007-03-20
WO2005036271A3 (en) 2005-08-04
KR20070005910A (ko) 2007-01-10
US20080233519A1 (en) 2008-09-25
KR101192624B1 (ko) 2012-10-18
US7425407B1 (en) 2008-09-16

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