JP4985728B2 - 塗布、現像装置及びその方法 - Google Patents

塗布、現像装置及びその方法 Download PDF

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Publication number
JP4985728B2
JP4985728B2 JP2009193367A JP2009193367A JP4985728B2 JP 4985728 B2 JP4985728 B2 JP 4985728B2 JP 2009193367 A JP2009193367 A JP 2009193367A JP 2009193367 A JP2009193367 A JP 2009193367A JP 4985728 B2 JP4985728 B2 JP 4985728B2
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unit
block
wafer
substrate
coating
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JP2009193367A
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Japanese (ja)
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JP2009278138A5 (enrdf_load_stackoverflow
JP2009278138A (ja
Inventor
正巳 飽本
伸一 林
林田　　安
伸明 松岡
義雄 木村
一成 上田
晃 伊東
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009193367A 2009-08-24 2009-08-24 塗布、現像装置及びその方法 Expired - Lifetime JP4985728B2 (ja)

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JP2009193367A JP4985728B2 (ja) 2009-08-24 2009-08-24 塗布、現像装置及びその方法

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JP2009193367A JP4985728B2 (ja) 2009-08-24 2009-08-24 塗布、現像装置及びその方法

Related Parent Applications (1)

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JP2005069723A Division JP4566035B2 (ja) 2005-03-11 2005-03-11 塗布、現像装置及びその方法

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JP2009278138A JP2009278138A (ja) 2009-11-26
JP2009278138A5 JP2009278138A5 (enrdf_load_stackoverflow) 2010-01-14
JP4985728B2 true JP4985728B2 (ja) 2012-07-25

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5168300B2 (ja) * 2010-02-24 2013-03-21 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP5338757B2 (ja) * 2010-07-09 2013-11-13 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5408059B2 (ja) * 2010-07-09 2014-02-05 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5348083B2 (ja) * 2010-07-16 2013-11-20 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5287913B2 (ja) * 2011-03-18 2013-09-11 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5954125B2 (ja) 2012-02-07 2016-07-20 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP5565422B2 (ja) * 2012-02-08 2014-08-06 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP5928283B2 (ja) * 2012-09-28 2016-06-01 東京エレクトロン株式会社 基板処理装置、基板搬送方法及び記憶媒体
JP5644916B2 (ja) * 2013-08-13 2014-12-24 東京エレクトロン株式会社 塗布、現像装置
JP2013243406A (ja) * 2013-08-13 2013-12-05 Tokyo Electron Ltd 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5590201B2 (ja) * 2013-08-13 2014-09-17 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3462426B2 (ja) * 1999-05-24 2003-11-05 東京エレクトロン株式会社 基板処理装置
JP2004186426A (ja) * 2002-12-03 2004-07-02 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3996845B2 (ja) * 2002-12-27 2007-10-24 大日本スクリーン製造株式会社 基板処理装置
JP4291096B2 (ja) * 2003-09-22 2009-07-08 大日本スクリーン製造株式会社 基板処理装置および基板処理装置のための機能ブロック組合せシステム

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JP2009278138A (ja) 2009-11-26

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