JP4983713B2 - 大気圧プラズマ発生装置 - Google Patents
大気圧プラズマ発生装置 Download PDFInfo
- Publication number
- JP4983713B2 JP4983713B2 JP2008111936A JP2008111936A JP4983713B2 JP 4983713 B2 JP4983713 B2 JP 4983713B2 JP 2008111936 A JP2008111936 A JP 2008111936A JP 2008111936 A JP2008111936 A JP 2008111936A JP 4983713 B2 JP4983713 B2 JP 4983713B2
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- JP
- Japan
- Prior art keywords
- discharge tube
- substrate
- antenna
- atmospheric pressure
- plasma
- Prior art date
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- 239000000758 substrate Substances 0.000 claims description 80
- 239000004020 conductor Substances 0.000 claims description 5
- 238000009616 inductively coupled plasma Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 55
- 239000003990 capacitor Substances 0.000 description 11
- 239000011261 inert gas Substances 0.000 description 7
- 238000012423 maintenance Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000007769 metal material Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- Plasma Technology (AREA)
Description
まず、本発明の大気圧プラズマ発生装置の第1の実施形態について,図1〜図4を参照して説明する。
次に、本発明の第2の実施形態について,図5〜図7を参照して説明する。なお、本実施形態の説明においては、上記第1の実施形態と共通の構成要素については同一の参照符号を付して説明を省略し、主として相違点についてのみ説明する。
2 基板
3 アンテナ
6 被覆基板
7 放電管
7a 一端
7b 他端
8 放電管保持部
9 ガス
12 位置規制部
18 締結ボルト
20 混合ガス空間
21 ガス供給口
22 混合ガス
Claims (4)
- アンテナに高周波電力を供給し、アンテナ近傍に配置した放電管に一端からガスを供給して誘導結合型のプラズマを発生し、放電管の他端からプラズマを噴出する大気圧プラズマ発生装置において、基板と、基板の一側部に区画形成されたアンテナ配置部位に配設された平板状の導体からなる波状形態のアンテナと、放電管を保持してアンテナ配置部位を除く凹陥部上に配置される放電管保持部とを備え、放電管保持部を基板に対して着脱可能にかつ放電管がアンテナの近傍に配置されるように装着したものであり、かつアンテナ配置部位の上面と凹陥部との間の段差を放電管保持部の装着位置を規制する位置規制部とすることを特徴とする大気圧プラズマ発生装置。
- 放電管保持部は、基板上に螺着若しくは基板間に挟持固定して基板に装着したことを特徴とする請求項1記載の大気圧プラズマ発生装置。
- 放電管の他端は、放電管保持部の端面から突出させたことを特徴とする請求項1又は2に記載の大気圧プラズマ発生装置。
- 放電管保持部には、放電管の他端が内部で開口する混合ガス空間を設け、混合ガス空間内に反応性ガスを含む混合ガスを供給するガス供給口を設けたことを特徴とする請求項1又は2に記載の大気圧プラズマ発生装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008111936A JP4983713B2 (ja) | 2008-04-23 | 2008-04-23 | 大気圧プラズマ発生装置 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2008111936A JP4983713B2 (ja) | 2008-04-23 | 2008-04-23 | 大気圧プラズマ発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009266439A JP2009266439A (ja) | 2009-11-12 |
JP4983713B2 true JP4983713B2 (ja) | 2012-07-25 |
Family
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JP2008111936A Active JP4983713B2 (ja) | 2008-04-23 | 2008-04-23 | 大気圧プラズマ発生装置 |
Country Status (1)
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JP (1) | JP4983713B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013077474A (ja) * | 2011-09-30 | 2013-04-25 | Panasonic Corp | 大気圧プラズマ発生装置 |
US20130118589A1 (en) | 2011-11-15 | 2013-05-16 | Mks Instruments, Inc. | Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel |
KR102161718B1 (ko) * | 2019-04-02 | 2020-10-06 | 주식회사 뉴파워 프라즈마 | 플라즈마 반응 장치 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3616088B1 (ja) * | 2004-03-17 | 2005-02-02 | 独立行政法人科学技術振興機構 | マイクロプラズマジェット発生装置 |
JP5103846B2 (ja) * | 2005-09-28 | 2012-12-19 | パナソニック株式会社 | マイクロプラズマジェット発生装置及び方法 |
JP4458066B2 (ja) * | 2006-05-08 | 2010-04-28 | パナソニック株式会社 | 大気圧プラズマ発生装置および大気圧プラズマ処理装置 |
JP4508061B2 (ja) * | 2005-09-28 | 2010-07-21 | パナソニック株式会社 | マイクロプラズマジェット発生装置 |
JP4687543B2 (ja) * | 2006-04-14 | 2011-05-25 | パナソニック株式会社 | 大気圧プラズマ発生装置及び発生方法 |
JP4682917B2 (ja) * | 2006-05-30 | 2011-05-11 | パナソニック株式会社 | 大気圧プラズマ発生方法及び装置 |
JP4760609B2 (ja) * | 2006-08-17 | 2011-08-31 | パナソニック株式会社 | 基板への部品実装方法及び装置 |
JP4682946B2 (ja) * | 2006-07-25 | 2011-05-11 | パナソニック株式会社 | プラズマ処理方法及び装置 |
JP5055893B2 (ja) * | 2006-08-17 | 2012-10-24 | パナソニック株式会社 | 大気圧プラズマ発生装置 |
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- 2008-04-23 JP JP2008111936A patent/JP4983713B2/ja active Active
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