JP4982022B2 - マイクロ波システム - Google Patents

マイクロ波システム Download PDF

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Publication number
JP4982022B2
JP4982022B2 JP2001524184A JP2001524184A JP4982022B2 JP 4982022 B2 JP4982022 B2 JP 4982022B2 JP 2001524184 A JP2001524184 A JP 2001524184A JP 2001524184 A JP2001524184 A JP 2001524184A JP 4982022 B2 JP4982022 B2 JP 4982022B2
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JP
Japan
Prior art keywords
waveguide
microwave
power
microwave system
impedance
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2001524184A
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English (en)
Japanese (ja)
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JP2003509832A5 (enExample
JP2003509832A (ja
Inventor
ペルティエール ジャック
ラコステ アナ
レオン ラガルド チエリー
モアザン ミシェル
イヴ アルナル アルバン・マリー
ザクルゼウシー ゼノン
Original Assignee
サントル ナショナル ドゥ ラ ルシュルシュ シャンティフィク（セ・エヌ・エル・エス）
ユニヴェルシト ドゥ モントリオール
ボレアル プラズマ
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Publication date
Application filed by サントル ナショナル ドゥ ラ ルシュルシュ シャンティフィク（セ・エヌ・エル・エス）, ユニヴェルシト ドゥ モントリオール, ボレアル プラズマ filed Critical サントル ナショナル ドゥ ラ ルシュルシュ シャンティフィク（セ・エヌ・エル・エス）
Publication of JP2003509832A publication Critical patent/JP2003509832A/ja
Publication of JP2003509832A5 publication Critical patent/JP2003509832A5/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32311—Circuits specially adapted for controlling the microwave discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00—Coupling devices of the waveguide type
    • H01P5/12—Coupling devices having more than two ports
    • H01P5/16—Conjugate devices, i.e. devices having at least one port decoupled from one other port

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Waveguides (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Discharge Heating (AREA)
JP2001524184A 1999-09-13 2000-09-12 マイクロ波システム Expired - Lifetime JP4982022B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR99/11422 1999-09-13
FR9911422A FR2798552B1 (fr) 1999-09-13 1999-09-13 Dispositif assurant une division de puissance micro-onde predeterminee sur une pluralite de charges, notamment pour la production de plasma
PCT/FR2000/002507 WO2001020710A1 (fr) 1999-09-13 2000-09-12 Diviseur de puissance pour dispositif a plasma

Publications (3)

Publication Number Publication Date
JP2003509832A JP2003509832A (ja) 2003-03-11
JP2003509832A5 JP2003509832A5 (enExample) 2010-11-25
JP4982022B2 true JP4982022B2 (ja) 2012-07-25

Family

ID=9549779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001524184A Expired - Lifetime JP4982022B2 (ja) 1999-09-13 2000-09-12 マイクロ波システム

Country Status (7)

Country Link
US (1) US6727656B1 (enExample)
EP (1) EP1216493B1 (enExample)
JP (1) JP4982022B2 (enExample)
AT (1) ATE245855T1 (enExample)
DE (1) DE60004073T2 (enExample)
FR (1) FR2798552B1 (enExample)
WO (1) WO2001020710A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4150621B2 (ja) * 2002-09-20 2008-09-17 富士通株式会社 折り畳み式携帯型無線機および当該無線機のシャーシ
US7445690B2 (en) * 2002-10-07 2008-11-04 Tokyo Electron Limited Plasma processing apparatus
US7806077B2 (en) * 2004-07-30 2010-10-05 Amarante Technologies, Inc. Plasma nozzle array for providing uniform scalable microwave plasma generation
US20070095281A1 (en) * 2005-11-01 2007-05-03 Stowell Michael W System and method for power function ramping of microwave liner discharge sources
JP4862375B2 (ja) * 2005-12-06 2012-01-25 株式会社エーイーティー 進行波形マイクロ波プラズマ発生装置
WO2010020917A1 (en) * 2008-08-20 2010-02-25 Koninklijke Philips Electronics N.V. Rf power splitter for magnetic resonance system
US20110094830A1 (en) * 2009-10-26 2011-04-28 Lund Kurt O'ferrall Vehicle and object portable lift
GB2497880B (en) 2010-12-23 2015-05-27 Element Six Ltd Controlling doping of synthetic diamond material
GB201021860D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for diamond synthesis
GB201021913D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave plasma reactors and substrates for synthetic diamond manufacture
GB201021853D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021855D0 (en) * 2010-12-23 2011-02-02 Element Six Ltd Microwave power delivery system for plasma reactors
GB201021870D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021865D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
FR2974701B1 (fr) 2011-04-27 2014-03-21 Sairem Soc Pour L Applic Ind De La Rech En Electronique Et Micro Ondes Installation de production d'un plasma micro-onde
JP6179004B2 (ja) * 2011-05-24 2017-08-16 イマジニアリング株式会社 電磁波放射装置
KR102007230B1 (ko) * 2018-01-26 2019-08-06 한국원자력연구원 대전력 가변 고주파 전력 분배기
US20250239753A1 (en) * 2022-02-25 2025-07-24 Panasonic Intellectual Property Management Co., Ltd. Power combiner and power distributor
JP2024178971A (ja) * 2023-06-14 2024-12-26 古野電気株式会社 導波管型電力分配器、導波管型電力合成器、アンテナ装置、及びレーダー

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946553U (ja) * 1982-09-20 1984-03-28 オージー技研株式会社 マイクロ波治療装置
JPS61290722A (ja) * 1985-06-19 1986-12-20 Tokuda Seisakusho Ltd プラズマ発生装置
JPH01132236U (enExample) * 1988-03-02 1989-09-07
JPH0339480A (ja) * 1989-07-05 1991-02-20 Sony Corp Ｅｃｒプラズマ装置
JPH1140397A (ja) * 1997-05-22 1999-02-12 Canon Inc 環状導波路を有するマイクロ波供給器及びそれを備えたプラズマ処理装置及び処理方法
JPH1167492A (ja) * 1997-05-29 1999-03-09 Sumitomo Metal Ind Ltd プラズマ処理装置及びプラズマ処理方法
JPH11195924A (ja) * 1997-12-26 1999-07-21 New Japan Radio Co Ltd マイクロストリップアレーアンテナ

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946553A (ja) * 1982-09-08 1984-03-15 Sumitomo Chem Co Ltd 超音波による斜角探傷方法
DE3711184A1 (de) * 1987-04-02 1988-10-20 Leybold Ag Vorrichtung zur einbringung von mikrowellenenergie mit einem offenen mikrowellenleiter
JPH01132236A (ja) * 1987-11-18 1989-05-24 Matsushita Electric Ind Co Ltd 部品固定法
US5153406A (en) * 1989-05-31 1992-10-06 Applied Science And Technology, Inc. Microwave source
JPH0441675A (ja) * 1990-06-07 1992-02-12 Matsushita Electric Ind Co Ltd マイクロ波プラズマ装置
DE4235914A1 (de) * 1992-10-23 1994-04-28 Juergen Prof Dr Engemann Vorrichtung zur Erzeugung von Mikrowellenplasmen
US5714009A (en) * 1995-01-11 1998-02-03 Deposition Sciences, Inc. Apparatus for generating large distributed plasmas by means of plasma-guided microwave power
US5796080A (en) * 1995-10-03 1998-08-18 Cem Corporation Microwave apparatus for controlling power levels in individual multiple cells
KR970071945A (ko) * 1996-02-20 1997-11-07 가나이 쯔도무 플라즈마처리방법 및 장치
US5869817A (en) * 1997-03-06 1999-02-09 General Mills, Inc. Tunable cavity microwave applicator
US6258329B1 (en) * 1998-04-20 2001-07-10 Cem Corporation Microwave transparent vessel for microwave assisted chemical processes
US6084226A (en) * 1998-04-21 2000-07-04 Cem Corporation Use of continuously variable power in microwave assisted chemistry

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946553U (ja) * 1982-09-20 1984-03-28 オージー技研株式会社 マイクロ波治療装置
JPS61290722A (ja) * 1985-06-19 1986-12-20 Tokuda Seisakusho Ltd プラズマ発生装置
JPH01132236U (enExample) * 1988-03-02 1989-09-07
JPH0339480A (ja) * 1989-07-05 1991-02-20 Sony Corp Ｅｃｒプラズマ装置
JPH1140397A (ja) * 1997-05-22 1999-02-12 Canon Inc 環状導波路を有するマイクロ波供給器及びそれを備えたプラズマ処理装置及び処理方法
JPH1167492A (ja) * 1997-05-29 1999-03-09 Sumitomo Metal Ind Ltd プラズマ処理装置及びプラズマ処理方法
JPH11195924A (ja) * 1997-12-26 1999-07-21 New Japan Radio Co Ltd マイクロストリップアレーアンテナ

Also Published As

Publication number Publication date
WO2001020710A1 (fr) 2001-03-22
ATE245855T1 (de) 2003-08-15
EP1216493B1 (fr) 2003-07-23
JP2003509832A (ja) 2003-03-11
US6727656B1 (en) 2004-04-27
EP1216493A1 (fr) 2002-06-26
DE60004073T2 (de) 2004-04-15
DE60004073D1 (de) 2003-08-28
FR2798552A1 (fr) 2001-03-16
FR2798552B1 (fr) 2001-11-30

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