WO2006033278A1 - マグネトロン発振装置 - Google Patents
マグネトロン発振装置 Download PDFInfo
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- WO2006033278A1 WO2006033278A1 PCT/JP2005/017033 JP2005017033W WO2006033278A1 WO 2006033278 A1 WO2006033278 A1 WO 2006033278A1 JP 2005017033 W JP2005017033 W JP 2005017033W WO 2006033278 A1 WO2006033278 A1 WO 2006033278A1
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- Prior art keywords
- magnetron
- reference signal
- oscillation device
- load
- power
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Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B9/00—Generation of oscillations using transit-time effects
- H03B9/01—Generation of oscillations using transit-time effects using discharge tubes
- H03B9/10—Generation of oscillations using transit-time effects using discharge tubes using a magnetron
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/34—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32201—Generating means
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Definitions
- the present invention relates to a magnetron oscillation device using a magnetron as an oscillation tube, and in particular, a reference signal oscillator having a lower output power than that of a magnetron and having a stable oscillation frequency is provided, and a reference signal generated by the reference signal oscillator is generated.
- the present invention relates to a magnetron oscillation device that improves the frequency stability of a magnetron by injecting it into a magnetron and fixing (synchronizing) the oscillation frequency of the magnetron to the oscillation frequency of a reference signal oscillator.
- One of the oscillation devices in the microwave band is a semiconductor oscillation device that uses a transistor as an amplifier.
- This semiconductor oscillator is used in the frequency band up to about 1000 MHz.
- the frequency band of 2450 MHz necessary for plasma generation the number of usable semiconductor elements is small and expensive, so that the semiconductor oscillation device is very expensive.
- magnetron oscillators are mass-produced with magnetrons up to about 10 kW of output power required for plasma generation, and can be obtained at low cost.
- the magnetron drive power supply is simple in construction and can be manufactured at low cost. Therefore, the magnetron oscillation device is widely used as a magnetron power source for generating plasma.
- FIG. 12 is a Reike diagram showing the load characteristics of the magnetron. This diagram shows the relationship between output power and oscillation frequency and load impedance obtained by connecting a load to the output end of a test launcher attached to the magnetron and changing the impedance of this load. Displayed on Smith chart under constant frequency It is a thing. The graph when the output power is constant is shown by a solid line, and the graph when the frequency is constant is shown by a dotted line.
- the output power and oscillation frequency of the magnetron vary depending on the load impedance.
- the phenomenon in which the oscillation frequency changes depending on the load impedance is called the “pulling phenomenon”.
- FIG. 13 is a performance chart showing the operating characteristics of the magnetron.
- a matching load is connected to the output end of a test launcher attached to the magnetron, and the anode voltage, output power, and oscillation frequency when the anode current is changed while the magnetron is in an operating state. It shows a change.
- a graph 201 shows a change in anode voltage
- a graph 202 shows a change in output power
- a graph 203 shows a change in oscillation frequency.
- the anode voltage is almost constant with respect to the anode current, the output power changes almost proportionally, and the oscillation frequency changes although it is within the standard value ( The frequency change is 15MHz, and the rate of change is 0.6%).
- the oscillation frequency changes according to the load impedance due to the pulling phenomenon, and the oscillation frequency also changes depending on the output power (anode current). Furthermore, due to moting, the oscillation frequency and oscillation state become unstable in the region where the output power is small.
- Reference 2 International Publication No. 2004Z068917
- a reference signal oscillator whose oscillation frequency is more stable than that of the magnetron
- a reference signal generated by the reference signal oscillator is injected into the magnetron.
- the oscillation frequency of the magnetron is fixed to the oscillation frequency (reference frequency) of the reference signal oscillator and the frequency stability of the magnetron is made equal to the stability of the reference signal oscillator.
- “Injection locking” is to fix the oscillation frequency of the oscillator by injection of the reference signal.
- BW Oscillation frequency difference between indication locking operation and non-operation
- F Reference signal frequency (reference frequency)
- the present invention has been made in order to solve these problems, and an object of the present invention is to provide a magnetron oscillation device in which the frequency does not vary even when the output power with a sufficient frequency stability is changed. It is in.
- a magnetron oscillation device includes a first magnetron, a launcher for taking out output power of the first magnetron, and one end at an output end of the launcher. Is connected to the impedance generator for adjusting the load impedance of the first magnetron, and the reference signal is connected to the other end of the impedance generator and has a lower power and a stable frequency than the output of the first magnetron.
- the first And a reference signal supply unit that supplies the magnetron.
- the oscillation frequency of the magnetron can be fixed to the frequency of the reference signal, and the frequency stability of the magnetron oscillation device can be improved.
- the variation range of the oscillation frequency can be reduced.
- the oscillation frequency can be fixed to the frequency of the reference signal, and the output power range in which the oscillation frequency is stable can be widened.
- FIG. 1 is a block diagram showing a configuration of a magnetron oscillation device according to an embodiment of the present invention.
- Fig. 2 is a graph showing the oscillation state of the magnetron when the load phase is changed while the load VSWR of the magnetron is made constant by the impedance generator.
- FIG. 3 is a block diagram showing a configuration of a magnetron and a magnetron power supply.
- FIG. 4 is a graph showing the relationship between anode current and heater voltage.
- FIG. 5A is a cross-sectional view showing a configuration example of a reactance stub type impedance generator.
- FIG. 5B is a cross-sectional view showing a configuration example of a waveguide branch-type impedance generator.
- FIG. 6A is a diagram for explaining an example of a method of amplifying a reference signal using an amplifier.
- FIG. 6B is a diagram for explaining another example of a method of amplifying a reference signal using an amplifier.
- FIG. 7 is a diagram for explaining a method of amplifying a reference signal using injection locking.
- Figure 8 illustrates a method of amplifying the reference signal by performing injection locking in parallel. It is a figure for clarification.
- FIG. 9 is a block diagram showing a configuration of a synchronization control unit.
- FIG. 10 is a block diagram showing a modification of the magnetron oscillation device shown in FIG.
- FIG. 11 is a diagram showing a configuration example of a plasma processing apparatus using a magnetron oscillation apparatus according to an embodiment of the present invention.
- FIG. 12 is a Reike diagram showing the load characteristics of a magnetron.
- FIG. 13 is a performance chart showing the operating characteristics of the magnetron.
- FIG. 1 is a block diagram showing a configuration of a magnetron oscillation device according to an embodiment of the present invention.
- a magnetron oscillation device 1 according to the present embodiment includes a magnetron 2, a magnetron power source 3, a launcher 4, an impedance generator 5, a reference signal supply unit 6, an isolator 7, and a synchronization control unit 11. .
- Magnetron 2 is an oscillation tube of magnetron oscillation device 1 and oscillates microwave M.
- the magnetron oscillation device 1 When the magnetron oscillation device 1 is used as a microwave power source for plasma generation, for example, the magnetron 2 having an oscillation frequency of 2450 MHz and an output power of several kW to 10 kW can be used!
- the magnetron power source 3 is a power source that supplies voltage and current to the heater and power sword of the magnetron 2. As the magnetron power source 3, it is also necessary to use a power source using a switching regulator system with good stability and to suppress frequency fluctuations due to power source fluctuations as much as possible.
- the launcher 4 is a high-frequency coupler that efficiently extracts output power from the oscillated magnetron 2, and also has a rectangular waveguide force with one end short-circuited.
- Magnetron 2 is arranged on launcher 4, and microwave M is radiated from antenna 21 of magnetron 2 protruding into launcher 4.
- the impedance generator 5 has a function of setting the impedance to an arbitrary value, and also functions as a standing wave generator. The method for changing the impedance will be described later. There are so many kinds to do. Moreover, it is classified into a waveguide system, a coaxial system, etc. according to the transmission line used.
- the impedance generator 5 has one end connected to the output end of the launcher 4 and is used to adjust the load impedance of the magnetron 2.
- the reference signal supply unit 6 supplies a reference signal S to the magnetron 2 and includes at least a reference signal oscillator 61 and a three-terminal circulator 62.
- the reference signal oscillator 61 is an oscillator that oscillates the reference signal S, and an oscillator having an output power lower than that of the magnetron 2 and having a stable oscillation frequency is used.
- a DRO using a crystal oscillator or a dielectric resonator is used as the original oscillation, and amplification and multiplication are performed as will be described later to obtain output power of several tens to several tens of watts.
- the oscillation frequency of the reference signal oscillator 61 that is, the frequency of the reference signal S is set to a desired frequency that fixes the oscillation frequency of the magnetron 2. For example, when the oscillation frequency of magnetron 2 is fixed to 2450 MHz, the reference signal S of 2450 MHz is used.
- the three-terminal circulator 62 reduces the input power from the first terminal to the second terminal, the input power from the second terminal to the third terminal, and the input power from the third terminal to the first terminal. It is an irreversible member that transmits with loss and does not transmit in the opposite direction.
- the first terminal is connected to the other end of the impedance generator 5, the second terminal is connected to the isolator 7, and the third terminal is connected to the reference signal oscillator 61. Therefore, the reference signal S from the reference signal oscillator 61 is sent only to the impedance generator 5, and the microwave M from the magnetron 2 is sent from the impedance generator 5 only to the isolator 7.
- a directional coupler a simple branch, or a coupler may be used. However, in this case, restrictions such as coupling degree and load impedance occur.
- the isolator 7 absorbs microwaves (reflected power) R reflected by the load, and has a three-terminal circulator 71 and a dummy load 72.
- the 3-terminal circulator 71 is a non-reciprocal member similar to the 3-terminal circulator 62 described above.
- the first terminal is connected to the second terminal of the circulator 62, the second terminal is connected to the load, and the third terminal is a dummy load.
- the dummy load 72 has a function of efficiently absorbing power. In order to be able to withstand even when the reflection from the load is total reflection, an absorption capacity that can withstand even the maximum output value of magnetron 2 is used.
- the synchronization control unit 11 detects the anode current and output power of the magnetron 2, and controls the impedance generator 5 and the reference signal supply unit 6 based on the detection result.
- a microcomputer, a sequencer, or the like is used as the synchronization control unit 11. The synchronization control unit 11 will be described in detail later.
- the microwave M radiated from the antenna 21 of the magnetron 2 to the inside of the launcher 4 passes through the impedance generator 5 and circulators 62 and 71. Is sent to the load.
- the microwave R reflected by the load is sent to the dummy load 72 by the circulator 71 and absorbed. Accordingly, it is possible to prevent the reference signal oscillator 61 from malfunctioning due to the microwave R reflected by the load being sent to the reference signal oscillator 61 by the circulator 62.
- the reference signal S from the reference signal oscillator 61 is sent to the launcher 4 via the impedance generator 5 by the circulator 62 and injected into the magnetron 2 from the antenna 21.
- the vibration frequency is attracted and fixed to the frequency F of the reference signal S (injection lock).
- the oscillation frequency of the magnetron 2 can be fixed and the oscillation frequency of the magnetron 2 can be stabilized.
- the load impedance of the magnetron 2 can be changed using the impedance generator 5.
- the load impedance changes, the pulling phenomenon changes the oscillation frequency of magnetron 2 when the injection locking is not operating. Therefore, by adjusting the load impedance using the impedance generator 5, the oscillation frequency of the magnetron 2 when the injection locking is not operating can be controlled. Is possible.
- the oscillation frequency of the magnetron 2 when the injection locking is not operating is made substantially equal to the frequency F of the reference signal S. That is, B in equation (1)
- the power of the reference signal S that is, the injection power P can be reduced. That is, the generation locking can be easily performed with an injection power P. which is sufficiently smaller than the output power P of the magnetron 2, for example, an injection power P of 1 Z 100 or less.
- the output power P of the magnetron 2 can be increased. That is, the range of the output power P of the magnetron 2 that does not release the injection locking can be widened.
- the variation width of the oscillation frequency can be reduced. As a result, even if the value of BW decreases and the output power P of the magnetron 2 is changed, the oscillation frequency of the magnetron 2 is changed to the frequency F of the reference signal S.
- the range of the output power P that is fixed at 0 and has a stable oscillation frequency can be widened.
- Fig. 2 is a graph showing the oscillation state of magnetron 2 when the load phase is changed while the load VSWR (voltage standing wave ratio) of magnetron 2 is kept constant by impedance generator 5. The change in the oscillation frequency range when the output power P of 2 is kept constant is shown.
- the range of output power P that can be king can be widened.
- FIG. 3 is a block diagram showing the configuration of the magnetron 2 and the magnetron power supply 3.
- the magnetron 2 has a heater Z force sword HZK in which a force sword and a heater are integrated, and an anode A.
- the anode A is divided into a plurality of parts, which are connected by a vibration circuit (resonance circuit).
- a heater Z cathode HZK is provided concentrically with anode A! /.
- a heater power supply 31 of a magnetron power supply 3 is connected to both ends of the heater Z force sword HZK.
- the heater Z force sword HZK is heated and the heater Z force sword HZK force electrons are emitted.
- An anode power supply 32 of a magnetron power supply 3 is further connected to one end of the heater Z power sword HZK. Negative voltage is applied to anode A connected to ground.
- FIG. 4 is a graph showing the relationship between the anode current and the heater voltage. “Max” represents the upper limit of the heater voltage with respect to the anode current, and “Min” represents the lower limit. According to this dull, knocking can be prevented by controlling the heater voltage using the heater power supply 31.
- FIG. 5A is a cross-sectional view showing a configuration example of a reactance stub type impedance generator.
- the impedance generator 5a has a structure in which three stubs 51a, 51b, 51c protrude into the tube wall force tube of the rectangular waveguide 50. These stubs 51a to 51c are arranged in the direction of the axis Z of the rectangular waveguide 50 at intervals such as gZ8 and gZ4. “E g” is the guide wavelength of the rectangular waveguide 50.
- the stubs 51a to 51c have a metal rod force with a circular cross section, and the reactance of the stubs 51a to 51c changes depending on the length of the stub 51a to 51c protruding into the tube, and the impedance in the rectangular waveguide 50 changes accordingly.
- the number of stubs may be one or more, but the number of stubs is mainly three.
- the stub may be an E stub system that is normally disposed on the E surface of the force E disposed on the H surface of the rectangular waveguide 50.
- FIG. 5B is a cross-sectional view showing a configuration example of a waveguide branch type impedance generator.
- the impedance generator 5b has a structure in which three branch waveguides 52a, 52b, and 52c are connected perpendicularly to the tube wall of the rectangular waveguide 50. These branch waveguides 52a to 52c are arranged in the direction of the axis Z of the rectangular waveguide 50 at intervals of gZ8, gZ4, and the like. Each of the branched waveguides 52a to 52c has one end opened in the rectangular waveguide 50, and the other end is electrically short-circuited by short plates 53a to 53c.
- a combination of a phase shifter and a stub tuner, an impedance generator using a combination of a 3 dB coupler and a variable short circuit, a waveguide four-branch tuner (Ref. 3 (Japanese Patent Application Laid-Open No. 2-249301) Slag tuner etc. can be used as the impedance generator 5.
- the coaxial impedance generator 5 is a coaxial type of the above-described rectangular waveguide. It was replaced with a tube.
- the reference signal amplification method includes a method using an amplifier and a method using injection locking.
- FIG. 6A and FIG. 6B are diagrams for explaining a method of amplifying a reference signal using an amplifier.
- a plurality of amplifiers 63a, 63b, 63c are connected in series as in the reference signal supply unit 6a shown in FIG. 6A, and the output power of the reference signal oscillator 61 is amplified by the amplifiers 63a to 63c.
- a reference signal S having a desired power can be obtained by sequentially amplifying the signal with a plurality of amplifiers 64a between a distributor 65 and a combiner 66 as in a reference signal supply unit 6b shown in FIG. 6B.
- the output of the reference signal oscillator 61 is distributed to the amplifiers 64a to 64c by the distributor 65, and the outputs of the amplifiers 64a to 64c are combined by the combiner 66. Therefore, the reference signal S having a desired power can be obtained.
- a plurality of amplifiers 64a, 64b, 64c may be connected in series.
- FIG. 7 is a diagram for explaining a method of amplifying a reference signal using injection locking.
- the reference signal supply unit 6c shown in this figure is connected to the magnetron 2 of the magnetron oscillation device 1, the magnetron power supply 3, the launcher 4, the impedance generator 5, and the 3-terminal circulator 62.
- Each has a magnetron 102, a magnetron power source 103, a launcher 104, an impedance generator 105, and a three-terminal circulator 162.
- the magnetron 102 one having a higher output than the reference signal oscillator 61 and a lower output than the magnetron 2 is used.
- the reference signal S1 from the reference signal oscillator 61 is injected into the magnetron 102, and the oscillation frequency of the magnetron 102 is fixed to the frequency of the reference signal S1.
- the frequency stability is good as in the case of the reference signal S1, and the power S is higher than that of the reference signal S1, and the microwave S2 can be obtained from the magnetron 102.
- This microwave S2 is injected into magnetron 2 as a reference signal.
- the impedance generator 105 may not be used. Yes.
- a plurality of components including the magnetron 102, the magnetron power supply 103, the launcher 104, the impedance generator 105, and the three-terminal circuit regulator 162 in FIG. Alternatively, these may be connected in parallel between the distributor 67 and the combiner 68 to perform injection locking in parallel.
- 102a and 102bi magnetrons, 103a and 103bi magnetron power supplies, 104a and 104bi launchers, 105a and 105b are impedance generators, 162a and 162b are 3-terminal circuit regulators, and Sla and Sib are distributors.
- S2a and S2b are the microphone mouth waves output from the magnetrons 102a and 102b
- S3 is a microwave that is synthesized by the synthesizer 68 from the microwave S2a and S2b. It is a wave.
- the impedance generators 105a and 105b need not be used.
- a low-output oscillator can be used as the reference signal oscillator 61. Even if an oscillator is low in frequency stability, it can be obtained at low cost, so that the manufacturing cost of the high-output magnetron oscillator 1 with good frequency stability can be suppressed.
- FIG. 9 is a block diagram showing the configuration of the synchronization control unit 11.
- the synchronization control unit 11 includes a detection unit 111, a data storage unit 112, and a control unit 113.
- the detection unit 111 includes an anode current supplied from the magnetron power source 3 to the magnetron 2, and an output of the magnetron power source 3. It is a circuit unit for detecting electric power.
- the detection unit 111 may detect the anode current and the output power at the same time, or may detect them at different timings.
- FIG. 1 shows an example in which the output power of magnetron 2 is detected by launcher 4, a directional coupler, probe, etc. are arranged on the load side of reference signal supply unit 6 or isolator 7. The output power of magnetron 2 is detected.
- the data storage unit 112 is a circuit unit that stores characteristic data from which various characteristic forces such as load characteristics and operation characteristics of the magnetron 2 can be obtained. Characteristic data stored in the data storage unit 112 The relationship between the anode current and the output power represented by the performance chart in FIG. 13, the relationship between the anode current and the oscillation frequency, the relationship between the load impedance and the output power represented by the leakage diagram in FIG. Data indicating the relationship between impedance and oscillation frequency. The data storage unit 112 further stores conditional expressions (1) and (2) for injection locking.
- the control unit 113 is a circuit unit that controls the impedance generator 5 and the reference signal supply unit 6 with reference to the stored contents of the data storage unit 112 based on the detection result of the detection unit 111.
- the synchronization control unit 11 determines the load impedance and the gaiter power P that can fix the oscillation frequency of the magnetron 2 to the frequency of the reference signal S with respect to the detected values of the anode current and the output power of the magnetron 2. A value is calculated, and a control signal is output to each of the impedance generator 5 and the reference signal oscillator 61 so that the load impedance and the injected power P become the values.
- the control signal may be output according to the correspondence table of the anode current and output power of the magnetron 2 and the control signal prepared in advance.
- the load impedance of the magnetron 2 and the output power of the reference signal oscillator 61 are automatically linked to the output power P of the magnetron 2. Adjusted. As a result, when the injection locking is not operating, the oscillation frequency of the magnetron 2 approaches the frequency of the reference signal S, and the value of G decreases as the injection power P increases, so that injection locking is maintained. For this reason, even if the output power P of the magnetron 2 is increased, the injection locking is not lost, and the range of the output power P in which the oscillation frequency is stable can be widened.
- the synchronization control unit 11 controls both the impedance generator 5 and the reference signal supply unit 6 at the same time.
- the impedance generator 5 and the reference signal supply unit 6 have been described. Let's control the deviation.
- the synchronization control unit 11 detects the anode current and output power of the magnetron 2 and performs control based on the detection results.
- the synchronization control unit 11 determines which of the anode current and output power of the magnetron 2 Only one of them may be detected, and control may be performed based on the detection result.
- the detection unit 111 of the synchronization control unit 11 only needs to have a function of detecting either the anode current of the magnetron 2 or the output power.
- the correspondence table used when outputting the control signal may be a correspondence table of either the anode current and the control signal or the output power and the control signal.
- FIG. 10 is a block diagram showing a modification of the magnetron oscillation device shown in FIG.
- members that are the same as or correspond to those in FIG. 1 are given the same reference numerals.
- the illustration of the synchronization control unit 11 is omitted.
- the magnetron oscillation device la shown in FIG. 10 is different from the magnetron oscillation device 1 shown in FIG. That is, in the magnetron oscillation device la shown in FIG. 10, the isolator 7 including the three-terminal circulator 71 and the dummy load 72 is provided in the reference signal supply unit 6e.
- the first terminal of the three-terminal circulator 62 is connected to the other end of the impedance generator 5, the second terminal is connected to the load, and the third terminal is connected to the first terminal of the three-terminal circulator 71.
- the second terminal of the three-terminal circulator 71 is connected to the dummy load 72, and the third terminal is connected to the reference signal oscillator 61.
- the reference signal S from the reference signal oscillator 61 is sent to the impedance generator 5 via the three-terminal circulators 71 and 62.
- the microwave M from the magnetron 2 is sent from the impedance generator 5 to the load via the three-terminal circulator 62. Further, the microwave R reflected by the load is sent to the dummy load 72 via the three-terminal circulators 6 2 and 71.
- the microwave M passes through the two circulators 62 and 71 before reaching the load.
- the magnetron oscillation device la shown in FIG. No. 62 passes only.
- the insertion loss of a circuit is generally about 0.5 dB. Therefore, by adopting a configuration like the magnetron oscillation device la, the output power of the magnetron 2 can be efficiently supplied to the load.
- the magnetron oscillator 1, la can be used as a microwave power source for a plasma processing apparatus.
- FIG. 11 is a diagram showing a configuration example of a plasma processing apparatus using the magnetron oscillation device 1, la.
- the plasma processing apparatus shown in this figure has a bottomed cylindrical processing container 81 having an open top.
- a mounting table 83 is fixed to the center of the bottom surface of the processing container 81 via an insulating plate 82.
- a substrate 84 to be processed is disposed on the upper surface of the mounting table 83.
- An exhaust port 85 for evacuation is provided on the peripheral edge of the bottom surface of the processing vessel 81.
- a gas introduction nozzle 86 for introducing gas into the processing vessel 81 is provided on the side wall of the processing vessel 81.
- a plasma gas such as Ar and an etching gas such as CF are introduced from the nozzle 86.
- the upper opening of the processing vessel 81 is closed by a dielectric plate 87.
- a sealing member 88 such as an O-ring is interposed between the upper surface of the side wall of the processing container 81 and the dielectric plate 87 to ensure airtightness in the processing container 81.
- a microwave supply device for supplying the microwave M into the processing vessel 81 is provided.
- RLSA99 and dielectric plate 87 are covered with a shielding material 89 arranged in an annular shape on the side wall of processing vessel 81, and the microwave supplied from RLSA99 into processing vessel 81 leaks to the outside1. Become.
- the microwave supply device 90 includes a magnetron oscillation device 1, la as a microwave power source, a rectangular waveguide 91 with a transmission mode of TE, and a transmission mode changed from TE to TE or TM.
- a load matching device 94 provided in the cylindrical waveguide 93, a radial waveguide 95 connected to the cylindrical waveguide 93, and an RLSA 99 formed on the lower surface of the radial waveguide 95 are provided.
- the radial waveguide 95 includes two circular conductor plates 96 and 97 that are parallel to each other, and a conductor ring 98 that connects and shields the outer peripheral portions of the two conductor plates 96 and 97.
- a cylindrical waveguide 93 is connected to the central portion of the conductor plate 96 that is the upper surface of the radial waveguide 95.
- a plurality of slots are formed in the conductor plate 97 serving as the lower surface of the radial waveguide 95, and the RLSA 99 is configured from these slots.
- the microwave M is converted into the rectangular waveguide 91, the rectangular cylindrical converter 92, and the cylindrical waveguide 93. It is introduced into the radial waveguide 95 via Then, the microwave M introduced into the radial waveguide 95 propagates radially from the central portion of the radial waveguide 95 to the peripheral portion, and gradually propagates from the RLSA 99 on the lower surface of the radial waveguide 95 into the processing container 81. To be supplied. In the processing container 81, the plasma M introduced from the nozzle 86 is ionized by the supplied microwave M to generate plasma P, and the substrate 84 is processed.
- the magnetron oscillation device 1, la can be manufactured at a much lower cost than the semiconductor oscillation device or the klystron oscillation device because the magnetron 2 is an oscillation tube. Therefore, the manufacturing cost of the plasma processing apparatus can be reduced by using the magnetron oscillation device 1 la as a microwave power source of the plasma processing apparatus.
- the magnetron oscillation device 1, la does not have the same frequency stability as the semiconductor oscillation device and the klystron oscillation device. For this reason, the operation of the plasma processing apparatus including many frequency-dependent elements can be stabilized and kept constant. In addition, since it is not necessary to consider the band characteristics, the design of the discharge electrode (radial waveguide 95 and RLSA99 in this embodiment) of the plasma processing apparatus becomes easy.
- magnetron oscillation device 1, la can also be used in other types of plasma processing apparatuses.
- it can also be used in an electron cyclotron resonance (£, CR) fuma processing apparatus.
- the magnetron oscillation device using the same continuous oscillation magnetron as the magnetron 2 used in this embodiment has been considered unsuitable for communication due to the characteristics of the magnetron. .
- the frequency stability can be improved by the present embodiment, the possibility that the magnetron oscillation device can be used for communication, medical accelerators and the like has arisen.
- the oscillation frequency of the magnetron is fixed to the frequency of the reference signal. Since the frequency of the reference signal is more stable than the oscillation frequency of the magnetron, the frequency stability of the magnetron oscillation device can be improved. Since moting does not occur, the matching circuit connected to the load side can be operated normally.
- the load impedance of the magnetron can be changed using an impedance generator.
- the oscillation frequency of the magnetron changes based on the printing phenomenon. Therefore, by adjusting the load impedance using the impedance generator, the variation width of the oscillation frequency can be reduced / J ⁇ .
- the oscillation frequency is fixed to the frequency of the reference signal, and the output power range in which the oscillation frequency is stable can be widened.
- the output power range in which the oscillation frequency is stabilized can be further widened.
- a magnetron is used as the oscillation tube in the present invention, it can be manufactured at a much lower cost than a semiconductor oscillation device or a klystron oscillation device. Even in the present invention, a reference signal oscillator having high frequency stability is used. However, since this reference signal oscillator is low in output and inexpensive, the manufacturing cost of the entire apparatus is not so high. here, By amplifying the reference signal having the reference signal oscillator power using an amplifier or a magnetron having a lower output than the above magnetron, it is possible to use a reference signal oscillator having a lower output and a lower cost, thereby reducing the manufacturing cost of the entire apparatus. Can be suppressed.
- the present invention by providing an isolator, it is possible to prevent the reflected power from the load from being sent to the reference signal oscillator and malfunctioning of the reference signal oscillator.
- the present invention by reducing the voltage applied to the heater as the current flowing through the force sword increases, among the electrons emitted from the force sword toward the anode, the electrons returned to the force sword. It is possible to suppress the abnormal heating of the force sword caused by the collision.
- the above-described magnetron oscillation device is used in a plasma processing apparatus, and a stable frequency microwave is supplied to stabilize the operation of the plasma processing apparatus including many frequency-dependent elements.
- a stable frequency microwave is supplied to stabilize the operation of the plasma processing apparatus including many frequency-dependent elements.
- it can be fixed.
- the design of the discharge electrode and the like of the plasma processing apparatus is facilitated.
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Microwave Tubes (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/572,532 US7545226B2 (en) | 2004-09-24 | 2005-09-15 | Magnetron oscillator |
JP2006032825A JP3856154B1 (ja) | 2005-09-15 | 2006-02-09 | マグネトロン発振装置 |
JP2006032819A JP3856153B1 (ja) | 2005-09-15 | 2006-02-09 | マグネトロン発振装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2004-278051 | 2004-09-24 | ||
JP2004278051A JP3751967B1 (ja) | 2004-09-24 | 2004-09-24 | マグネトロン発振装置 |
Publications (1)
Publication Number | Publication Date |
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WO2006033278A1 true WO2006033278A1 (ja) | 2006-03-30 |
Family
ID=36090039
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PCT/JP2005/017033 WO2006033278A1 (ja) | 2004-09-24 | 2005-09-15 | マグネトロン発振装置 |
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Country | Link |
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US (1) | US7545226B2 (ja) |
JP (1) | JP3751967B1 (ja) |
WO (1) | WO2006033278A1 (ja) |
Cited By (1)
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---|---|---|---|---|
JP2014175051A (ja) * | 2013-03-05 | 2014-09-22 | Tokyo Electron Ltd | マイクロ波導波装置、プラズマ処理装置及びプラズマ処理方法 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8143816B2 (en) * | 2008-08-13 | 2012-03-27 | Varian Medical Systems Technologies, Inc. | Power variator |
KR101124419B1 (ko) * | 2009-02-18 | 2012-03-20 | 포항공과대학교 산학협력단 | 마이크로파 플라즈마 생성을 위한 휴대용 전력 공급 장치 |
JP4528870B1 (ja) * | 2009-06-05 | 2010-08-25 | 日本高周波株式会社 | マグネトロン発振装置およびプラズマ処理装置 |
KR102009541B1 (ko) * | 2012-02-23 | 2019-08-09 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 처리 장치, 및 고주파 발생기 |
JP2014035887A (ja) | 2012-08-09 | 2014-02-24 | Tokyo Electron Ltd | プラズマ処理装置、および高周波発生器 |
JP5819448B2 (ja) | 2014-01-06 | 2015-11-24 | 東京エレクトロン株式会社 | プラズマ処理装置、異常判定方法及びマイクロ波発生器 |
US9922823B1 (en) * | 2016-09-07 | 2018-03-20 | Euclid Techlabs, Llc | CVD reactor and method for nanometric delta doping of diamond |
JP6850645B2 (ja) * | 2017-03-22 | 2021-03-31 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP7201667B2 (ja) * | 2017-08-28 | 2023-01-10 | ミューオンズ インコーポレイテッド | 内部変調機能付きマグネトロンrf源を使用したパルス電力生成 |
CN116043196B (zh) * | 2023-02-23 | 2024-05-28 | 季华实验室 | 一种工作点可调的微波源、调节方法及mpcvd设备 |
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-
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- 2005-09-15 WO PCT/JP2005/017033 patent/WO2006033278A1/ja active Application Filing
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JPS52119810A (en) * | 1976-03-31 | 1977-10-07 | Fujitsu Ltd | Synchronous injection frequency converter |
JPH03227124A (ja) * | 1990-01-31 | 1991-10-08 | Shimada Phys & Chem Ind Co Ltd | 注入同期発振装置 |
JPH04137481A (ja) * | 1990-09-28 | 1992-05-12 | Toshiba Corp | マグネトロン駆動電源 |
JPH05299024A (ja) * | 1992-04-22 | 1993-11-12 | Hitachi Ltd | マグネトロン応用装置 |
JPH0653743A (ja) * | 1992-07-29 | 1994-02-25 | Matsushita Electric Ind Co Ltd | 注入同期形逓倍発振器 |
JPH08298460A (ja) * | 1995-02-27 | 1996-11-12 | Nippon Telegr & Teleph Corp <Ntt> | 注入同期発振器 |
WO2004068917A1 (ja) * | 2003-01-27 | 2004-08-12 | Tokyo Electron Limited | プラズマ処理装置およびプラズマ処理方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2014175051A (ja) * | 2013-03-05 | 2014-09-22 | Tokyo Electron Ltd | マイクロ波導波装置、プラズマ処理装置及びプラズマ処理方法 |
US9252000B2 (en) | 2013-03-05 | 2016-02-02 | National University Corporation Nagoya University | Microwave waveguide apparatus, plasma processing apparatus and plasma processing method |
Also Published As
Publication number | Publication date |
---|---|
US20080231380A1 (en) | 2008-09-25 |
JP2006094214A (ja) | 2006-04-06 |
US7545226B2 (en) | 2009-06-09 |
JP3751967B1 (ja) | 2006-03-08 |
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