JP4969632B2 - シリカ粉及びシリカ容器並びにそれらの製造方法 - Google Patents

シリカ粉及びシリカ容器並びにそれらの製造方法 Download PDF

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Publication number
JP4969632B2
JP4969632B2 JP2009237686A JP2009237686A JP4969632B2 JP 4969632 B2 JP4969632 B2 JP 4969632B2 JP 2009237686 A JP2009237686 A JP 2009237686A JP 2009237686 A JP2009237686 A JP 2009237686A JP 4969632 B2 JP4969632 B2 JP 4969632B2
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Japan
Prior art keywords
silica
powder
inner layer
base
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2009237686A
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English (en)
Japanese (ja)
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JP2011084428A5 (cg-RX-API-DMAC7.html
JP2011084428A (ja
Inventor
茂 山形
友美 笛吹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority to JP2009237686A priority Critical patent/JP4969632B2/ja
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Priority to PCT/JP2010/005375 priority patent/WO2011045888A1/ja
Priority to KR1020127004097A priority patent/KR101374545B1/ko
Priority to CN201080036839.0A priority patent/CN102482137B/zh
Priority to US13/140,982 priority patent/US8460769B2/en
Priority to EP10823157.2A priority patent/EP2489642A4/en
Priority to TW099130347A priority patent/TWI454425B/zh
Publication of JP2011084428A publication Critical patent/JP2011084428A/ja
Publication of JP2011084428A5 publication Critical patent/JP2011084428A5/ja
Application granted granted Critical
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D1/00—Rigid or semi-rigid containers having bodies formed in one piece, e.g. by casting metallic material, by moulding plastics, by blowing vitreous material, by throwing ceramic material, by moulding pulped fibrous material or by deep-drawing operations performed on sheet material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
    • Y10T428/1317—Multilayer [continuous layer]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Glass Compositions (AREA)
JP2009237686A 2009-10-14 2009-10-14 シリカ粉及びシリカ容器並びにそれらの製造方法 Active JP4969632B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2009237686A JP4969632B2 (ja) 2009-10-14 2009-10-14 シリカ粉及びシリカ容器並びにそれらの製造方法
KR1020127004097A KR101374545B1 (ko) 2009-10-14 2010-09-01 실리카 분말 및 실리카 용기 그리고 그 제조방법
CN201080036839.0A CN102482137B (zh) 2009-10-14 2010-09-01 二氧化硅粉、二氧化硅容器及该粉或容器的制造方法
US13/140,982 US8460769B2 (en) 2009-10-14 2010-09-01 Powdered silica, silica container, and method for producing them
PCT/JP2010/005375 WO2011045888A1 (ja) 2009-10-14 2010-09-01 シリカ粉及びシリカ容器並びにそれらの製造方法
EP10823157.2A EP2489642A4 (en) 2009-10-14 2010-09-01 SILICONE POWDER, SILICONE CONTAINER AND METHOD FOR PRODUCING THE SILICONE PUMP AND CONTAINER
TW099130347A TWI454425B (zh) 2009-10-14 2010-09-08 Silica, silica containers and the manufacture of such powders or containers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009237686A JP4969632B2 (ja) 2009-10-14 2009-10-14 シリカ粉及びシリカ容器並びにそれらの製造方法

Publications (3)

Publication Number Publication Date
JP2011084428A JP2011084428A (ja) 2011-04-28
JP2011084428A5 JP2011084428A5 (cg-RX-API-DMAC7.html) 2012-01-26
JP4969632B2 true JP4969632B2 (ja) 2012-07-04

Family

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Family Applications (1)

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JP2009237686A Active JP4969632B2 (ja) 2009-10-14 2009-10-14 シリカ粉及びシリカ容器並びにそれらの製造方法

Country Status (7)

Country Link
US (1) US8460769B2 (cg-RX-API-DMAC7.html)
EP (1) EP2489642A4 (cg-RX-API-DMAC7.html)
JP (1) JP4969632B2 (cg-RX-API-DMAC7.html)
KR (1) KR101374545B1 (cg-RX-API-DMAC7.html)
CN (1) CN102482137B (cg-RX-API-DMAC7.html)
TW (1) TWI454425B (cg-RX-API-DMAC7.html)
WO (1) WO2011045888A1 (cg-RX-API-DMAC7.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4922355B2 (ja) * 2009-07-15 2012-04-25 信越石英株式会社 シリカ容器及びその製造方法
JP4951057B2 (ja) * 2009-12-10 2012-06-13 信越石英株式会社 シリカ容器及びその製造方法
JP5774400B2 (ja) 2010-08-12 2015-09-09 株式会社Sumco シリカ粉の評価方法、シリカガラスルツボ、シリカガラスルツボの製造方法
EP2712946A4 (en) * 2012-05-15 2015-03-25 Shinetsu Quartz Prod QUARTZ GLASS LEAD FOR BREEDING CRYSTALLINE SILICON AND PROCESS FOR ITS MANUFACTURE
WO2013171955A1 (ja) 2012-05-16 2013-11-21 信越石英株式会社 単結晶シリコン引き上げ用シリカ容器及びその製造方法
US9469819B2 (en) * 2013-01-16 2016-10-18 Clearsign Combustion Corporation Gasifier configured to electrodynamically agitate charged chemical species in a reaction region and related methods
CN103584635B (zh) * 2013-11-21 2015-08-26 河海大学 自供电显水温保温杯
CN104068715A (zh) * 2014-06-20 2014-10-01 郭裴哲 一种智能水杯
EP3218317B1 (en) 2014-11-13 2018-10-17 Gerresheimer Glas GmbH Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter
JP6480827B2 (ja) * 2015-08-03 2019-03-13 信越石英株式会社 水素ドープシリカ粉の保管方法及びシリコン単結晶引上げ用石英ガラスるつぼの製造方法
EP3205630B1 (de) * 2016-02-12 2020-01-01 Heraeus Quarzglas GmbH & Co. KG Diffusormaterial aus synthetisch erzeugtem quarzglas sowie verfahren zur herstellung eines vollständig oder teilweise daraus bestehenden formkörpers
JP6659408B2 (ja) * 2016-03-07 2020-03-04 クアーズテック株式会社 シリコン単結晶引上げ用シリカガラスルツボの製造方法
JP6713382B2 (ja) * 2016-08-30 2020-06-24 クアーズテック株式会社 石英ガラスルツボの製造方法、及び石英ガラスルツボ
JP7692409B2 (ja) * 2020-05-20 2025-06-13 日鉄ケミカル＆マテリアル株式会社 球状結晶質シリカ粒子およびその製造方法
KR102647080B1 (ko) * 2021-11-03 2024-03-13 국립목포대학교산학협력단 비정질 실리카 나노 분말을 이용한 투명한 실리카 소결체의 제조방법

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4935046A (en) 1987-12-03 1990-06-19 Shin-Etsu Handotai Company, Limited Manufacture of a quartz glass vessel for the growth of single crystal semiconductor
JPH01148718A (ja) 1987-12-03 1989-06-12 Shin Etsu Handotai Co Ltd 石英るつぼの製造方法
JPH0729871B2 (ja) 1987-12-03 1995-04-05 信越半導体 株式会社 単結晶引き上げ用石英るつぼ
JPH0720645A (ja) 1993-06-30 1995-01-24 Ricoh Co Ltd 電子写真感光体及びその製造方法
JPH07206451A (ja) 1993-12-29 1995-08-08 Nippon Steel Corp 合成石英ガラスの製造方法
JP3702904B2 (ja) 1994-04-04 2005-10-05 セイコーエプソン株式会社 合成石英ガラスの製造方法
JPH07277743A (ja) 1994-04-04 1995-10-24 Nippon Steel Corp 合成石英ガラスの製造方法
JP3100836B2 (ja) 1994-06-20 2000-10-23 信越石英株式会社 石英ガラスルツボとその製造方法
JP2001261353A (ja) * 2000-03-17 2001-09-26 Toshiba Ceramics Co Ltd 石英ガラスルツボ用合成シリカガラス粉及びその製造方法、並びに合成シリカガラス粉を用いた石英ガラスルツボの製造方法
DE10041582B4 (de) * 2000-08-24 2007-01-18 Heraeus Quarzglas Gmbh & Co. Kg Quarzglastiegel sowie Verfahren zur Herstellung desselben
DE10114484C2 (de) 2001-03-24 2003-10-16 Heraeus Quarzglas Verfahren für die Herstellung eines Komposit-Werkstoffs mit einem SiO¶2¶-Gehalt von mindestens 99 Gew.-%, und Verwendung des nach dem Verfahren erhaltenen Komposit-Werkstoffs
US20030012899A1 (en) 2001-07-16 2003-01-16 Heraeus Shin-Etsu America Doped silica glass crucible for making a silicon ingot
JP2003095678A (ja) * 2001-07-16 2003-04-03 Heraeus Shin-Etsu America シリコン単結晶製造用ドープ石英ガラスルツボ及びその製造方法
JP4549008B2 (ja) * 2002-05-17 2010-09-22 信越石英株式会社 水素ドープシリカ粉及びそれを用いたシリコン単結晶引上げ用石英ガラスルツボ
DE10262015B3 (de) 2002-09-20 2004-07-15 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs
JP2005145731A (ja) 2003-11-12 2005-06-09 Kuramoto Seisakusho Co Ltd 結晶化石英ルツボ
US7365037B2 (en) * 2004-09-30 2008-04-29 Shin-Etsu Quartz Products Co., Ltd. Quartz glass having excellent resistance against plasma corrosion and method for producing the same
US7427327B2 (en) * 2005-09-08 2008-09-23 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall
TWI408259B (zh) * 2006-09-28 2013-09-11 Shinetsu Quartz Prod 具有鋇摻雜內壁的矽玻璃坩堝
JP4702898B2 (ja) 2007-09-18 2011-06-15 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボの製造方法

Also Published As

Publication number Publication date
WO2011045888A1 (ja) 2011-04-21
EP2489642A4 (en) 2013-10-30
KR20120041223A (ko) 2012-04-30
EP2489642A1 (en) 2012-08-22
TW201119943A (en) 2011-06-16
KR101374545B1 (ko) 2014-03-17
JP2011084428A (ja) 2011-04-28
TWI454425B (zh) 2014-10-01
US20110256330A1 (en) 2011-10-20
CN102482137A (zh) 2012-05-30
CN102482137B (zh) 2014-09-10
US8460769B2 (en) 2013-06-11

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