JP4964608B2 - 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品 - Google Patents

帯電防止剤、帯電防止膜及び帯電防止膜被覆物品 Download PDF

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Publication number
JP4964608B2
JP4964608B2 JP2007028883A JP2007028883A JP4964608B2 JP 4964608 B2 JP4964608 B2 JP 4964608B2 JP 2007028883 A JP2007028883 A JP 2007028883A JP 2007028883 A JP2007028883 A JP 2007028883A JP 4964608 B2 JP4964608 B2 JP 4964608B2
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Prior art keywords
group
water
antistatic agent
resist
mass
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JP2007028883A
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Japanese (ja)
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JP2008095060A (ja
JP2008095060A5 (enExample
Inventor
綾子 西岡
隆 大久保
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Resonac Holdings Corp
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Showa Denko KK
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Priority to JP2007028883A priority Critical patent/JP4964608B2/ja
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2007028883A 2006-02-08 2007-02-08 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品 Expired - Fee Related JP4964608B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007028883A JP4964608B2 (ja) 2006-02-08 2007-02-08 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2006031587 2006-02-08
JP2006031587 2006-02-08
JP2006038436 2006-02-15
JP2006038436 2006-02-15
JP2006248758 2006-09-13
JP2006248758 2006-09-13
JP2007028883A JP4964608B2 (ja) 2006-02-08 2007-02-08 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品

Related Child Applications (3)

Application Number Title Priority Date Filing Date
JP2008278239A Division JP4236697B1 (ja) 2006-02-08 2008-10-29 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品
JP2008278238A Division JP4293567B2 (ja) 2006-02-08 2008-10-29 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品
JP2009031403A Division JP4610020B2 (ja) 2006-02-08 2009-02-13 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品

Publications (3)

Publication Number Publication Date
JP2008095060A JP2008095060A (ja) 2008-04-24
JP2008095060A5 JP2008095060A5 (enExample) 2008-12-18
JP4964608B2 true JP4964608B2 (ja) 2012-07-04

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Family Applications (1)

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JP2007028883A Expired - Fee Related JP4964608B2 (ja) 2006-02-08 2007-02-08 帯電防止剤、帯電防止膜及び帯電防止膜被覆物品

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JP (1) JP4964608B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010021359A1 (ja) * 2008-08-20 2010-02-25 日本電子株式会社 レジスト感度向上方法
JP2011170207A (ja) * 2010-02-19 2011-09-01 Jeol Ltd 微細構造物の製造方法
JP5610567B2 (ja) * 2010-02-23 2014-10-22 昭和電工株式会社 レジスト感度向上方法
KR20220136489A (ko) 2012-07-24 2022-10-07 미쯔비시 케미컬 주식회사 도전체, 도전성 조성물, 및 적층체
JP6515609B2 (ja) * 2014-04-23 2019-05-22 東ソー株式会社 導電性高分子水溶液、及び導電性高分子膜並びに該被覆物品
JP6451203B2 (ja) * 2014-10-21 2019-01-16 三菱ケミカル株式会社 レジストパターンの形成方法、パターンが形成された基板の製造方法
JP6543928B2 (ja) * 2014-12-24 2019-07-17 三菱ケミカル株式会社 レジストのパターン形成方法
JP7087265B2 (ja) * 2015-08-20 2022-06-21 三菱ケミカル株式会社 導電性組成物、導電体及びレジストパターンの形成方法
CN118620412A (zh) * 2020-01-29 2024-09-10 三菱化学株式会社 导电性组合物、抗蚀剂被覆材料、抗蚀剂及抗蚀剂图案的形成方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3112745B2 (ja) * 1992-06-17 2000-11-27 富士通株式会社 パターン形成用導電性組成物及び該組成物を用いたパターン形成方法
GB9319790D0 (en) * 1993-09-24 1993-11-10 Kodak Ltd Antistatic composition
JP2545750B2 (ja) * 1994-09-21 1996-10-23 工業技術院長 直鎖状サーファクチン
JP4092736B2 (ja) * 1995-01-24 2008-05-28 コニカミノルタホールディングス株式会社 帯電防止組成物、該帯電防止組成物が塗布された帯電防止層を有するプラスチックフィルム及びハロゲン化銀写真感光材料
JPH0913011A (ja) * 1995-06-28 1997-01-14 Teika Corp 多糖類系帯電防止剤
JPH0952712A (ja) * 1995-08-17 1997-02-25 Mitsubishi Materials Corp アンチモンドープ酸化錫微粉末の製造方法と透明導電性塗料
JPH09241514A (ja) * 1996-03-05 1997-09-16 Showa Denko Kk 水溶性コラーゲン組成物
JPH10195422A (ja) * 1997-01-09 1998-07-28 Mitsubishi Paper Mills Ltd 帯電防止剤および帯電防止フィルム
JPH10306098A (ja) * 1997-05-08 1998-11-17 Tadayuki Imanaka 環状リポペプチド化合物の化学合成方法および環状リポペプチド化合物
JPH11189746A (ja) * 1997-12-26 1999-07-13 Showa Denko Kk 帯電防止処理剤およびその利用方法、該被覆物品
JP4818517B2 (ja) * 2001-01-29 2011-11-16 三菱レイヨン株式会社 導電性組成物、導電体及びその形成法
US6514660B1 (en) * 2001-10-29 2003-02-04 Eastman Kodak Company Polyethyleneimine primer for imaging materials
US20030141487A1 (en) * 2001-12-26 2003-07-31 Eastman Kodak Company Composition containing electronically conductive polymer particles
JP4040938B2 (ja) * 2002-09-06 2008-01-30 昭和電工株式会社 帯電防止処理剤、帯電防止膜および被覆物品
JP2005008837A (ja) * 2003-06-23 2005-01-13 Ichimaru Pharcos Co Ltd ポリグルタミン酸又はその塩を含有する帯電防止剤
ATE425224T1 (de) * 2004-05-21 2009-03-15 Showa Denko Kk Elektrisch leitfähige zusammensetzung und anwendung davon
ATE423383T1 (de) * 2004-08-09 2009-03-15 Showa Denko Kk Antistatisches mittel, antistatischer film und mit antistatischem film beschichtetes produkt

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Publication number Publication date
JP2008095060A (ja) 2008-04-24

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