JP4955849B2 - アパタイト構造体、及びアパタイトパターン形成方法 - Google Patents

アパタイト構造体、及びアパタイトパターン形成方法 Download PDF

Info

Publication number
JP4955849B2
JP4955849B2 JP2000104926A JP2000104926A JP4955849B2 JP 4955849 B2 JP4955849 B2 JP 4955849B2 JP 2000104926 A JP2000104926 A JP 2000104926A JP 2000104926 A JP2000104926 A JP 2000104926A JP 4955849 B2 JP4955849 B2 JP 4955849B2
Authority
JP
Japan
Prior art keywords
apatite
substrate
cao
sio
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000104926A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001294411A (ja
JP2001294411A5 (enExample
Inventor
健 八尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP2000104926A priority Critical patent/JP4955849B2/ja
Publication of JP2001294411A publication Critical patent/JP2001294411A/ja
Publication of JP2001294411A5 publication Critical patent/JP2001294411A5/ja
Application granted granted Critical
Publication of JP4955849B2 publication Critical patent/JP4955849B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Materials For Medical Uses (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Formation Of Insulating Films (AREA)
JP2000104926A 2000-04-06 2000-04-06 アパタイト構造体、及びアパタイトパターン形成方法 Expired - Fee Related JP4955849B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000104926A JP4955849B2 (ja) 2000-04-06 2000-04-06 アパタイト構造体、及びアパタイトパターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000104926A JP4955849B2 (ja) 2000-04-06 2000-04-06 アパタイト構造体、及びアパタイトパターン形成方法

Publications (3)

Publication Number Publication Date
JP2001294411A JP2001294411A (ja) 2001-10-23
JP2001294411A5 JP2001294411A5 (enExample) 2007-05-31
JP4955849B2 true JP4955849B2 (ja) 2012-06-20

Family

ID=18618388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000104926A Expired - Fee Related JP4955849B2 (ja) 2000-04-06 2000-04-06 アパタイト構造体、及びアパタイトパターン形成方法

Country Status (1)

Country Link
JP (1) JP4955849B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8632583B2 (en) 2011-05-09 2014-01-21 Palmaz Scientific, Inc. Implantable medical device having enhanced endothelial migration features and methods of making the same
US8268340B2 (en) 2002-09-26 2012-09-18 Advanced Bio Prosthetic Surfaces, Ltd. Implantable materials having engineered surfaces and method of making same
US8679517B2 (en) 2002-09-26 2014-03-25 Palmaz Scientific, Inc. Implantable materials having engineered surfaces made by vacuum deposition and method of making same
CA2499976C (en) 2002-09-26 2013-06-11 Advanced Bio Prosthetic Surfaces, Ltd. Implantable materials having engineered surfaces and method of making same
US8178066B2 (en) 2005-08-15 2012-05-15 Kyoto University Method for stabilizing calcium phosphates fine particles, method for manufacturing calcium phosphates fine particles by using the method, and use thereof
JP5162749B2 (ja) * 2006-09-14 2013-03-13 国立大学法人 岡山大学 アパタイト複合体及びその製造方法
JP5458230B2 (ja) * 2007-08-30 2014-04-02 HOYA Technosurgical株式会社 フッ素アパタイトの製造方法、フッ素アパタイトおよび吸着装置
JP5334030B2 (ja) * 2007-08-31 2013-11-06 独立行政法人産業技術総合研究所 ハイドロキシアパタイトの製造方法及びハイドロキシアパタイト−蛋白質複合体の製造方法
US8728563B2 (en) 2011-05-03 2014-05-20 Palmaz Scientific, Inc. Endoluminal implantable surfaces, stents, and grafts and method of making same
JP5964793B2 (ja) * 2013-09-03 2016-08-03 日本電信電話株式会社 アパタイト薄膜形成方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0483811A (ja) * 1990-07-27 1992-03-17 Sumitomo Metal Ind Ltd 多孔質複合材料の製造方法
JP3038965B2 (ja) * 1991-03-14 2000-05-08 日本電気株式会社 微小機械の製造方法
JP3062969B2 (ja) * 1991-10-14 2000-07-12 科学技術振興事業団 生体活性層のコーティング方法
JPH0692366A (ja) * 1992-09-01 1994-04-05 Nippon Kentetsu Co Ltd 薄膜フィルム
JPH06293507A (ja) * 1993-04-02 1994-10-21 Nippon Electric Glass Co Ltd 水酸アパタイト膜の形成方法
JPH06293505A (ja) * 1993-04-02 1994-10-21 Nippon Sherwood Kk 水酸アパタイトコーティング方法
JPH07132140A (ja) * 1993-11-09 1995-05-23 Kyoritsu Yogyo Genryo Kk 医療用補綴材料
JP3275032B2 (ja) * 1997-03-03 2002-04-15 独立行政法人産業技術総合研究所 環境浄化材料及びその製造方法
JP3678606B2 (ja) * 1999-05-21 2005-08-03 富士通株式会社 金属修飾アパタイト及びその製造方法

Also Published As

Publication number Publication date
JP2001294411A (ja) 2001-10-23

Similar Documents

Publication Publication Date Title
DE69707325T2 (de) Bilderzeugungsmaterial und Verfahren
JP4955849B2 (ja) アパタイト構造体、及びアパタイトパターン形成方法
CN102269929B (zh) 图案化的无机层、基于辐射的图案化组合物和相应方法
KR20010050865A (ko) 패턴 형성 방법, 및 그 패턴 형성 방법을 사용하여만들어진 전자 소자, 광학 소자 및 회로 기판
JP2000147792A (ja) パターン形成方法
CN105204291B (zh) 溶菌酶二维纳米薄膜作为光刻胶的应用
JPH035573B2 (enExample)
Ji et al. Use of microcontact printing methods to direct pattern formation of calcified mesoporous silicon
JP2008162885A (ja) 超音波エネルギーを利用したZnOナノワイヤの製造方法
JPH01154050A (ja) パターン形成方法
JP5334030B2 (ja) ハイドロキシアパタイトの製造方法及びハイドロキシアパタイト−蛋白質複合体の製造方法
CN101734944A (zh) 二维图案化纳米硫亚化铜薄膜的制备方法
JP4675450B2 (ja) 薄膜パターンの形成方法
EP0103844A2 (en) X-ray mask
JP2001284288A (ja) 微細構造体及びその製造方法
CN106371289A (zh) 鸡蛋清稀薄蛋白作为光刻胶的应用
JPS6376438A (ja) パタ−ン形成方法
JPH04107561A (ja) レジスト組成物
JPH0661160A (ja) パターン形成方法
JPS62113136A (ja) レジスト組成物
JP2004119428A (ja) 微粒子構造体の製造方法
JPH09292707A (ja) パターン形成材料及びパターン形成方法
JP2004272049A (ja) Si−O−Si結合を含む固体化合物膜の形成方法、固体化合物膜の酸化ケイ素への改質方法、パターン形成方法及びリソグラフイー用レジスト
US20040191639A1 (en) Micro-imprinting method and template for use in same
TWI241460B (en) The method of manufacturing nano pattern particles

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070405

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070405

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100122

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100907

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20101101

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101102

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101108

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101102

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110405

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110526

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20111011

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111128

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120313

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120316

R150 Certificate of patent or registration of utility model

Ref document number: 4955849

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150323

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees