JP4945460B2 - 反射防止構造の形成方法および反射防止構造 - Google Patents

反射防止構造の形成方法および反射防止構造 Download PDF

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Publication number
JP4945460B2
JP4945460B2 JP2008000059A JP2008000059A JP4945460B2 JP 4945460 B2 JP4945460 B2 JP 4945460B2 JP 2008000059 A JP2008000059 A JP 2008000059A JP 2008000059 A JP2008000059 A JP 2008000059A JP 4945460 B2 JP4945460 B2 JP 4945460B2
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JP
Japan
Prior art keywords
layer
particles
substrate
particle
etching
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008000059A
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English (en)
Japanese (ja)
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JP2009162965A (ja
JP2009162965A5 (enExample
Inventor
西 務 中
本 明 藤
川 鋼 児 浅
野 剛 史 沖
村 忍 杉
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Toshiba Corp
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Toshiba Corp
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Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2008000059A priority Critical patent/JP4945460B2/ja
Priority to US12/347,187 priority patent/US8361339B2/en
Publication of JP2009162965A publication Critical patent/JP2009162965A/ja
Publication of JP2009162965A5 publication Critical patent/JP2009162965A5/ja
Application granted granted Critical
Publication of JP4945460B2 publication Critical patent/JP4945460B2/ja
Priority to US13/723,374 priority patent/US8840258B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/77—Coatings having a rough surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/34—Masking
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/355—Temporary coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24372—Particulate matter
    • Y10T428/24421—Silicon containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Laminated Bodies (AREA)
JP2008000059A 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造 Expired - Fee Related JP4945460B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008000059A JP4945460B2 (ja) 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造
US12/347,187 US8361339B2 (en) 2008-01-04 2008-12-31 Antireflection structure formation method and antireflection structure
US13/723,374 US8840258B2 (en) 2008-01-04 2012-12-21 Antireflection structure formation method and antireflection structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008000059A JP4945460B2 (ja) 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造

Publications (3)

Publication Number Publication Date
JP2009162965A JP2009162965A (ja) 2009-07-23
JP2009162965A5 JP2009162965A5 (enExample) 2010-12-02
JP4945460B2 true JP4945460B2 (ja) 2012-06-06

Family

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JP2008000059A Expired - Fee Related JP4945460B2 (ja) 2008-01-04 2008-01-04 反射防止構造の形成方法および反射防止構造

Country Status (2)

Country Link
US (2) US8361339B2 (enExample)
JP (1) JP4945460B2 (enExample)

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CN102325719A (zh) * 2008-12-30 2012-01-18 3M创新有限公司 纳米结构化制品和制备纳米结构化制品的方法
KR101915868B1 (ko) 2008-12-30 2018-11-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 반사방지 용품 및 이의 제조 방법
US8419955B2 (en) * 2009-01-07 2013-04-16 Panasonic Corporation Antireflection structure, lens barrel including antireflection structure, method for manufacturing antireflection structure
US20110085232A1 (en) * 2009-10-08 2011-04-14 The Penn State Research Foundation Multi-spectral filters, mirrors and anti-reflective coatings with subwavelength periodic features for optical devices
DE102009060223A1 (de) * 2009-12-23 2011-06-30 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 80539 Konusförmige Nanostrukturen auf Substratoberflächen, insbesondere optischen Elementen, Verfahren zu deren Erzeugung sowie deren Verwendung
EP2528858A1 (en) * 2010-01-29 2012-12-05 Hewlett Packard Development Company, L.P. Environment sensitive devices
TWI579145B (zh) 2010-04-13 2017-04-21 旭化成電子材料股份有限公司 Self-supporting film, self-supporting structure, self-supporting film manufacturing method and protective film
US9085484B2 (en) * 2010-04-30 2015-07-21 Corning Incorporated Anti-glare surface treatment method and articles thereof
US9017566B2 (en) 2010-04-30 2015-04-28 Corning Incorporated Anti-glare surface treatment method and articles thereof
JP5854397B2 (ja) * 2011-09-05 2016-02-09 国立研究開発法人産業技術総合研究所 ナノインプリントフィルムを用いた粒子の転写方法
KR101334898B1 (ko) 2011-11-21 2013-12-02 한국기계연구원 나노 돌기 패턴의 형성 방법
US9108310B2 (en) * 2012-01-13 2015-08-18 The United States Of America, As Represented By The Secretary Of The Navy Fueldraulic actuator installation and removal tool
SG11201406122WA (en) 2012-03-26 2014-10-30 3M Innovative Properties Co Nanostructured material and method of making the same
JP2013218272A (ja) * 2012-04-04 2013-10-24 Nalux Co Ltd 耐光性プラスチックシート及びその製造方法
WO2013151038A1 (ja) * 2012-04-04 2013-10-10 ナルックス株式会社 耐光性プラスチックシート及びその製造方法
WO2013154077A1 (ja) * 2012-04-09 2013-10-17 旭硝子株式会社 微細パターンを表面に有する物品およびその製造方法、ならびに光学物品、その製造方法および複製モールドの製造方法
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TWI564585B (zh) * 2012-12-06 2017-01-01 大同股份有限公司 抗反射基板結構及其製作方法
WO2014092132A1 (ja) 2012-12-13 2014-06-19 王子ホールディングス株式会社 光学素子作製用金型及びその製造方法、光学素子
JP2015138179A (ja) * 2014-01-23 2015-07-30 王子ホールディングス株式会社 微細構造体および微細構造体の製造方法
DE102014105939B4 (de) * 2014-04-28 2019-08-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer Entspiegelungsschicht auf einer Silikonoberfläche und optisches Element
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CN106384745B (zh) * 2016-11-16 2019-01-08 京东方科技集团股份有限公司 显示基板的制备方法
CN107561611B (zh) * 2017-08-04 2020-04-28 东莞市中图半导体科技有限公司 一种蓝宝石基板的表面图案化加工方法
KR101962034B1 (ko) * 2017-10-25 2019-03-25 한국기초과학지원연구원 무반사 나노패턴을 포함하는 광대역 대물렌즈 및 이의 제조방법
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Publication number Priority date Publication date Assignee Title
KR20200128304A (ko) * 2019-05-03 2020-11-12 공주대학교 산학협력단 콜로이드 입자를 이용한 표면 나노 돌기 구조 제조방법
KR102191074B1 (ko) * 2019-05-03 2020-12-15 공주대학교 산학협력단 콜로이드 입자를 이용한 표면 나노 돌기 구조 제조방법

Also Published As

Publication number Publication date
US8361339B2 (en) 2013-01-29
JP2009162965A (ja) 2009-07-23
US8840258B2 (en) 2014-09-23
US20090176015A1 (en) 2009-07-09
US20130135746A1 (en) 2013-05-30

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