JP4939787B2 - ビームホモジナイザ、レーザ照射装置、及び半導体装置の作製方法 - Google Patents
ビームホモジナイザ、レーザ照射装置、及び半導体装置の作製方法 Download PDFInfo
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- JP4939787B2 JP4939787B2 JP2005289970A JP2005289970A JP4939787B2 JP 4939787 B2 JP4939787 B2 JP 4939787B2 JP 2005289970 A JP2005289970 A JP 2005289970A JP 2005289970 A JP2005289970 A JP 2005289970A JP 4939787 B2 JP4939787 B2 JP 4939787B2
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- laser beam
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- optical waveguide
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005289970A JP4939787B2 (ja) | 2004-10-04 | 2005-10-03 | ビームホモジナイザ、レーザ照射装置、及び半導体装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004290968 | 2004-10-04 | ||
| JP2004290968 | 2004-10-04 | ||
| JP2005289970A JP4939787B2 (ja) | 2004-10-04 | 2005-10-03 | ビームホモジナイザ、レーザ照射装置、及び半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006135308A JP2006135308A (ja) | 2006-05-25 |
| JP2006135308A5 JP2006135308A5 (enExample) | 2008-11-06 |
| JP4939787B2 true JP4939787B2 (ja) | 2012-05-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005289970A Expired - Fee Related JP4939787B2 (ja) | 2004-10-04 | 2005-10-03 | ビームホモジナイザ、レーザ照射装置、及び半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4939787B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8237085B2 (en) * | 2006-11-17 | 2012-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Beam homogenizer, laser irradiation apparatus, and laser irradiation method |
| CN104471348A (zh) * | 2012-03-26 | 2015-03-25 | 曼蒂斯影像有限公司 | 三维照相机及其投影仪 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63163405A (ja) * | 1986-12-26 | 1988-07-06 | Matsushita Electric Ind Co Ltd | 光フアイバーケーブル |
| JPH02166782A (ja) * | 1988-12-21 | 1990-06-27 | Hitachi Cable Ltd | 中空導波路の入力結合部構造 |
| JP2002139697A (ja) * | 2000-11-02 | 2002-05-17 | Mitsubishi Electric Corp | 複数レーザビームを用いたレーザ光学系とレーザアニーリング装置 |
| JP2002141302A (ja) * | 2000-11-02 | 2002-05-17 | Mitsubishi Electric Corp | レーザアニーリング用レーザ光学系とこれを用いたレーザアニーリング装置 |
| JP4090374B2 (ja) * | 2003-03-20 | 2008-05-28 | 株式会社日立製作所 | ナノプリント装置、及び微細構造転写方法 |
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- 2005-10-03 JP JP2005289970A patent/JP4939787B2/ja not_active Expired - Fee Related
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| Publication number | Publication date |
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| JP2006135308A (ja) | 2006-05-25 |
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