JP4936333B2 - 真空蒸着装置 - Google Patents

真空蒸着装置 Download PDF

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Publication number
JP4936333B2
JP4936333B2 JP2007250735A JP2007250735A JP4936333B2 JP 4936333 B2 JP4936333 B2 JP 4936333B2 JP 2007250735 A JP2007250735 A JP 2007250735A JP 2007250735 A JP2007250735 A JP 2007250735A JP 4936333 B2 JP4936333 B2 JP 4936333B2
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Japan
Prior art keywords
film thickness
substrate
correction plate
rotation axis
thickness correction
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JP2007250735A
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Japanese (ja)
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JP2009079276A (ja
JP2009079276A5 (enExample
Inventor
昌行 瀧本
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Showa Shinku Co Ltd
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Showa Shinku Co Ltd
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Priority to JP2007250735A priority Critical patent/JP4936333B2/ja
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Publication of JP2009079276A5 publication Critical patent/JP2009079276A5/ja
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JP2007250735A 2007-09-27 2007-09-27 真空蒸着装置 Active JP4936333B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007250735A JP4936333B2 (ja) 2007-09-27 2007-09-27 真空蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007250735A JP4936333B2 (ja) 2007-09-27 2007-09-27 真空蒸着装置

Publications (3)

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JP2009079276A JP2009079276A (ja) 2009-04-16
JP2009079276A5 JP2009079276A5 (enExample) 2010-08-05
JP4936333B2 true JP4936333B2 (ja) 2012-05-23

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JP2007250735A Active JP4936333B2 (ja) 2007-09-27 2007-09-27 真空蒸着装置

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Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5652654B2 (ja) * 2011-02-07 2015-01-14 株式会社村田製作所 成膜システム及び成膜方法
CN102899619B (zh) * 2011-07-26 2014-02-19 御林汽配(昆山)有限公司 真空镀膜装置的改良结构
CN102899620B (zh) * 2011-07-26 2014-02-19 御林汽配(昆山)有限公司 真空镀膜装置
CN103993267B (zh) * 2014-04-30 2016-05-25 光驰科技(上海)有限公司 一种镀膜机中补正板的设置修正方法
CN109457221B (zh) * 2019-01-23 2023-09-01 广州北辰工业自动化有限公司 可调节的镀膜修正板机构
DE102021206788A1 (de) * 2021-06-30 2023-01-05 Carl Zeiss Smt Gmbh Verfahren zum Abscheiden einer Schicht, optisches Element und optische Anordnung für den DUV-Wellenlängenbereich
CN115011943A (zh) * 2022-06-22 2022-09-06 中科光智(西安)科技有限公司 一种可切换的均匀性修正板组结构及其真空镀膜机
CN115747748B (zh) * 2022-10-21 2024-06-11 浙江至格科技有限公司 一种具有渐变膜厚的ar镜片及渐变镀膜方法和ar眼镜
CN117418194A (zh) * 2023-11-02 2024-01-19 北极光电(深圳)有限公司 一种ibs真空镀膜均匀性修正装置及使用方法
CN120311141A (zh) * 2025-06-18 2025-07-15 华通芯电(南昌)电子科技有限公司 一种Pt金属蒸镀方法、pHEMT及电子设备

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2752409B2 (ja) * 1989-02-09 1998-05-18 キヤノン株式会社 真空蒸着装置
JP2825918B2 (ja) * 1990-03-13 1998-11-18 キヤノン株式会社 真空蒸着装置
JPH04202773A (ja) * 1990-11-30 1992-07-23 Iwasaki Electric Co Ltd 成膜方法及びこの方法に使用する補正体
JPH06337310A (ja) * 1992-10-23 1994-12-06 Matsushita Electric Ind Co Ltd 光学多層膜並びにその成膜方法及びその成膜装置
JPH06172998A (ja) * 1992-12-08 1994-06-21 Canon Inc 薄膜製造方法および装置
JP2003193217A (ja) * 2001-12-25 2003-07-09 Nippon Seiki Co Ltd 蒸着装置

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JP2009079276A (ja) 2009-04-16

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