JP4913028B2 - ウエーハ保持装置 - Google Patents
ウエーハ保持装置 Download PDFInfo
- Publication number
- JP4913028B2 JP4913028B2 JP2007337867A JP2007337867A JP4913028B2 JP 4913028 B2 JP4913028 B2 JP 4913028B2 JP 2007337867 A JP2007337867 A JP 2007337867A JP 2007337867 A JP2007337867 A JP 2007337867A JP 4913028 B2 JP4913028 B2 JP 4913028B2
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- Prior art keywords
- wafer
- holding
- block
- edge
- holding device
- Prior art date
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- 238000012546 transfer Methods 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 158
- 238000000034 method Methods 0.000 description 12
- 238000003384 imaging method Methods 0.000 description 11
- 238000007689 inspection Methods 0.000 description 9
- 230000007547 defect Effects 0.000 description 7
- 238000005259 measurement Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
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- 238000012545 processing Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
2 載置ブロック
3 クランプパッド
4 駆動機構
5 保持ブロック
6 回転台
7 基台
8 撮像手段
9 照明手段
Claims (4)
- ウエーハを水平に載置する載置ブロックと、ウエーハを載置ブロックに載置した状態でウエーハをセンタリングするクランプパッドと、センタリングされたウエーハを載置する保持ブロックと、前記クランプパッドをウエーハの中心側に退避させる駆動機構と前記保持ブロックを回転させる回転台とを備えることを特徴とするウエーハ保持装置。
- 前記保持ブロックは下方から上昇することにより前記載置ブロックからウエーハを移載することを特徴とする請求項1に記載のウエーハ保持装置。
- 前記載置ブロックは下降することにより前記載置ブロックより下方に待機する前記保持ブロックにウエーハを移載することを特徴とする請求項1に記載のウエーハ保持装置。
- 前記保持ブロックはウエーハが載置される突起を有し、外周が円形となるように複数個配置されることを特徴とする請求項1に記載のウエーハ保持装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007337867A JP4913028B2 (ja) | 2007-11-29 | 2007-11-29 | ウエーハ保持装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007337867A JP4913028B2 (ja) | 2007-11-29 | 2007-11-29 | ウエーハ保持装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009135382A JP2009135382A (ja) | 2009-06-18 |
| JP4913028B2 true JP4913028B2 (ja) | 2012-04-11 |
Family
ID=40866971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007337867A Expired - Fee Related JP4913028B2 (ja) | 2007-11-29 | 2007-11-29 | ウエーハ保持装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4913028B2 (ja) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3709426B2 (ja) * | 2001-11-02 | 2005-10-26 | 日本エレクトロセンサリデバイス株式会社 | 表面欠陥検出方法および表面欠陥検出装置 |
| JP2006024837A (ja) * | 2004-07-09 | 2006-01-26 | Olympus Corp | 保持機構およびそれを用いた保持装置 |
| JP4222997B2 (ja) * | 2004-11-15 | 2009-02-12 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP2007287729A (ja) * | 2006-04-12 | 2007-11-01 | Yaskawa Electric Corp | ウエハプリアライメント装置 |
-
2007
- 2007-11-29 JP JP2007337867A patent/JP4913028B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009135382A (ja) | 2009-06-18 |
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