JP4912627B2 - 薄膜集積回路の作製方法 - Google Patents

薄膜集積回路の作製方法 Download PDF

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Publication number
JP4912627B2
JP4912627B2 JP2005185380A JP2005185380A JP4912627B2 JP 4912627 B2 JP4912627 B2 JP 4912627B2 JP 2005185380 A JP2005185380 A JP 2005185380A JP 2005185380 A JP2005185380 A JP 2005185380A JP 4912627 B2 JP4912627 B2 JP 4912627B2
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Japan
Prior art keywords
region
layer
substrate
insulating film
thin film
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JP2005185380A
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Japanese (ja)
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JP2006041502A (ja
JP2006041502A5 (enExample
Inventor
卓也 鶴目
浩二 大力
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of JP2006041502A5 publication Critical patent/JP2006041502A5/ja
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  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
JP2005185380A 2004-06-24 2005-06-24 薄膜集積回路の作製方法 Expired - Fee Related JP4912627B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005185380A JP4912627B2 (ja) 2004-06-24 2005-06-24 薄膜集積回路の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004186543 2004-06-24
JP2004186543 2004-06-24
JP2005185380A JP4912627B2 (ja) 2004-06-24 2005-06-24 薄膜集積回路の作製方法

Publications (3)

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JP2006041502A JP2006041502A (ja) 2006-02-09
JP2006041502A5 JP2006041502A5 (enExample) 2008-05-15
JP4912627B2 true JP4912627B2 (ja) 2012-04-11

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JP2005185380A Expired - Fee Related JP4912627B2 (ja) 2004-06-24 2005-06-24 薄膜集積回路の作製方法

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JP (1) JP4912627B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5204959B2 (ja) 2006-06-26 2013-06-05 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP5264016B2 (ja) * 2006-06-30 2013-08-14 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR101430587B1 (ko) * 2006-09-20 2014-08-14 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 전사가능한 반도체 구조들, 디바이스들 및 디바이스 컴포넌트들을 만들기 위한 릴리스 방안들
EP3729499A4 (en) * 2017-12-22 2021-12-15 Board of Regents, The University of Texas System NANOSCALE ALIGNED THREE-DIMENSIONAL STACKED INTEGRATED CIRCUIT

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4748859B2 (ja) * 2000-01-17 2011-08-17 株式会社半導体エネルギー研究所 発光装置の作製方法
EP1455394B1 (en) * 2001-07-24 2018-04-11 Samsung Electronics Co., Ltd. Transfer method

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JP2006041502A (ja) 2006-02-09

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