JP4897334B2 - 表面検査方法及び表面検査装置 - Google Patents
表面検査方法及び表面検査装置 Download PDFInfo
- Publication number
- JP4897334B2 JP4897334B2 JP2006100144A JP2006100144A JP4897334B2 JP 4897334 B2 JP4897334 B2 JP 4897334B2 JP 2006100144 A JP2006100144 A JP 2006100144A JP 2006100144 A JP2006100144 A JP 2006100144A JP 4897334 B2 JP4897334 B2 JP 4897334B2
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- Prior art keywords
- detection
- inspection
- light
- light intensity
- scattered light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/8867—Grading and classifying of flaws using sequentially two or more inspection runs, e.g. coarse and fine, or detecting then analysing
- G01N2021/887—Grading and classifying of flaws using sequentially two or more inspection runs, e.g. coarse and fine, or detecting then analysing the measurements made in two or more directions, angles, positions
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
2 基板チャック
3 モータ
4 検査面
5 検査光照射系
7 レーザ光線
9 側方散乱光検出器
11 前方散乱光検出器
12 散乱光
15 信号処理部
16 受光器
17 演算装置
18 回転位置検出器
19 送り位置検出器
21 クロック信号発生器
22 記憶装置
23 表示装置
Claims (6)
- 検査面にレーザ光線を照射、走査して前記検査面の異物等を検出する表面検査方法に於いて、前記レーザ光線の照射部位を所要数の検出領域に分け、各検出領域間で検出光強度が変化する様に受光器で受光し、検査部位について検出光強度の異なる所要数の出力信号を取得し、所要数の出力信号の内、飽和していない最大値を示す出力信号を表面検査信号として選択することを特徴とする表面検査方法。
- 照射部位で光強度が変化する光強度分布となる様に前記レーザ光線を照射し、検出光強度が異なる様に所要数の検出領域を設定した請求項1の表面検査方法。
- 検出領域間で検出光強度が異なる様に光学フィルタで光量調整する請求項1の表面検査方法。
- 検査面にレーザ光線を照射する検査光照射系と、散乱光を検出する散乱光受光系と、該散乱光受光系の散乱光検出出力に基づき異物を検出する為の演算処理を行う演算装置とを具備し、前記散乱光受光系は前記レーザ光線の照射部位を所要数の検出領域に区分し、各検出領域間で受光する散乱光光強度が異なる様に検出光を検出し、前記演算装置は同一部位について得られる複数の散乱光検出出力の内、飽和していない最大値の散乱光検出出力を表面検査信号として選択し、該表面検査信号に基づき異物等を検査する様構成したことを特徴とする表面検査装置。
- 前記検査光照射系は、照射部位で光強度が変化する光強度分布となる様に前記レーザ光線を照射し、検査領域は検出光強度が異なる様に設定された請求項4の表面検査装置。
- 前記散乱光受光系は、検査領域間で検出光強度が異なる様に、光学フィルタが設けられた請求項4の表面検査装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006100144A JP4897334B2 (ja) | 2006-03-31 | 2006-03-31 | 表面検査方法及び表面検査装置 |
US11/725,849 US7477373B2 (en) | 2006-03-31 | 2007-03-20 | Surface inspection method and surface inspection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006100144A JP4897334B2 (ja) | 2006-03-31 | 2006-03-31 | 表面検査方法及び表面検査装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007273879A JP2007273879A (ja) | 2007-10-18 |
JP2007273879A5 JP2007273879A5 (ja) | 2009-05-14 |
JP4897334B2 true JP4897334B2 (ja) | 2012-03-14 |
Family
ID=38558389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006100144A Expired - Fee Related JP4897334B2 (ja) | 2006-03-31 | 2006-03-31 | 表面検査方法及び表面検査装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7477373B2 (ja) |
JP (1) | JP4897334B2 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8107812B2 (en) * | 2005-09-23 | 2012-01-31 | Honeywell International Inc. | Dynamic range measurement and calculation of optical keyless entry sensor |
US8935022B2 (en) | 2009-03-17 | 2015-01-13 | General Electric Company | Data communication system and method |
US9379775B2 (en) | 2009-03-17 | 2016-06-28 | General Electric Company | Data communication system and method |
US9637147B2 (en) | 2009-03-17 | 2017-05-02 | General Electronic Company | Data communication system and method |
US7826049B2 (en) * | 2008-02-11 | 2010-11-02 | Applied Materials South East Asia Pte. Ltd. | Inspection tools supporting multiple operating states for multiple detector arrangements |
JP2009236791A (ja) * | 2008-03-28 | 2009-10-15 | Hitachi High-Technologies Corp | 欠陥検査方法及び欠陥検査装置 |
US7973921B2 (en) * | 2008-06-25 | 2011-07-05 | Applied Materials South East Asia Pte Ltd. | Dynamic illumination in optical inspection systems |
US10144440B2 (en) | 2010-11-17 | 2018-12-04 | General Electric Company | Methods and systems for data communications |
US9513630B2 (en) | 2010-11-17 | 2016-12-06 | General Electric Company | Methods and systems for data communications |
JP6441252B2 (ja) * | 2016-03-16 | 2018-12-19 | 東芝メモリ株式会社 | 熱レーザ刺激装置、熱レーザ刺激方法および記録媒体 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4468120A (en) * | 1981-02-04 | 1984-08-28 | Nippon Kogaku K.K. | Foreign substance inspecting apparatus |
US4922308A (en) * | 1986-06-27 | 1990-05-01 | Hitachi, Ltd. | Method of and apparatus for detecting foreign substance |
US6411377B1 (en) * | 1991-04-02 | 2002-06-25 | Hitachi, Ltd. | Optical apparatus for defect and particle size inspection |
US6104481A (en) * | 1997-11-11 | 2000-08-15 | Kabushiki Kaisha Topcon | Surface inspection apparatus |
US6774991B1 (en) * | 1999-05-27 | 2004-08-10 | Inspex Incorporated | Method and apparatus for inspecting a patterned semiconductor wafer |
JP4644329B2 (ja) * | 2000-02-24 | 2011-03-02 | 株式会社トプコン | 表面検査装置 |
US6797975B2 (en) * | 2000-09-21 | 2004-09-28 | Hitachi, Ltd. | Method and its apparatus for inspecting particles or defects of a semiconductor device |
US6833913B1 (en) | 2002-02-26 | 2004-12-21 | Kla-Tencor Technologies Corporation | Apparatus and methods for optically inspecting a sample for anomalies |
JP2004271519A (ja) | 2003-02-18 | 2004-09-30 | Topcon Corp | 表面検査装置 |
JP4641143B2 (ja) * | 2003-06-30 | 2011-03-02 | 株式会社トプコン | 表面検査装置 |
US7297921B2 (en) | 2003-11-21 | 2007-11-20 | Olympus Corportion | Photodetection circuit and confocal microscope that has it |
JP4996856B2 (ja) * | 2006-01-23 | 2012-08-08 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置およびその方法 |
-
2006
- 2006-03-31 JP JP2006100144A patent/JP4897334B2/ja not_active Expired - Fee Related
-
2007
- 2007-03-20 US US11/725,849 patent/US7477373B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2007273879A (ja) | 2007-10-18 |
US20070229813A1 (en) | 2007-10-04 |
US7477373B2 (en) | 2009-01-13 |
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