JP4882385B2 - 熱電素子及び熱電モジュールの製造方法 - Google Patents
熱電素子及び熱電モジュールの製造方法 Download PDFInfo
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- JP4882385B2 JP4882385B2 JP2006011698A JP2006011698A JP4882385B2 JP 4882385 B2 JP4882385 B2 JP 4882385B2 JP 2006011698 A JP2006011698 A JP 2006011698A JP 2006011698 A JP2006011698 A JP 2006011698A JP 4882385 B2 JP4882385 B2 JP 4882385B2
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- thermoelectric element
- thermoelectric
- type thermoelectric
- mold
- module
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- 238000004519 manufacturing process Methods 0.000 title claims description 32
- 239000000463 material Substances 0.000 claims description 112
- 238000000034 method Methods 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 27
- 238000001816 cooling Methods 0.000 claims description 18
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 11
- 229910052918 calcium silicate Inorganic materials 0.000 claims description 10
- 239000000378 calcium silicate Substances 0.000 claims description 10
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 claims description 10
- 238000005498 polishing Methods 0.000 claims description 9
- 238000007711 solidification Methods 0.000 claims description 5
- 230000008023 solidification Effects 0.000 claims description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 4
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- 230000015271 coagulation Effects 0.000 claims 1
- 238000005345 coagulation Methods 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000002184 metal Substances 0.000 description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 11
- 239000010949 copper Substances 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 239000010453 quartz Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000011575 calcium Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000012212 insulator Substances 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 229910004762 CaSiO Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000007578 melt-quenching technique Methods 0.000 description 2
- MKTRXTLKNXLULX-UHFFFAOYSA-P pentacalcium;dioxido(oxo)silane;hydron;tetrahydrate Chemical compound [H+].[H+].O.O.O.O.[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O MKTRXTLKNXLULX-UHFFFAOYSA-P 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000005678 Seebeck effect Effects 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000007712 rapid solidification Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
- H10N10/17—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects characterised by the structure or configuration of the cell or thermocouple forming the device
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/01—Manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
7;熱電材料の溶湯、8;真空チャンバー、9;めっき膜、10;p型熱電素子
11;n型熱電素子、12;上部電極、13;上基板、14;下部電極、15;下基板
16;リード線、17;ペルチェモジュール、18、19;銅板
20;温調用ペルチェモジュール、21;排熱用ヒートシンク、22;Tc測定用熱電対
23;Th測定用熱電対、24;ヒーター、30;冷却板、31;冷却水の導入口
32;冷却水の排出口
Claims (4)
- 冷却板の上に複数の貫通孔を有する型材を設置する工程と、前記型材内に熱電材料の溶湯を注湯する工程と、前記型材内で前記熱電材料の溶湯を凝固させて熱電素子を形成する工程と、凝固後の熱電素子を前記型材ごと所定の高さになるまで研磨する工程と、前記研磨後の熱電素子の表面にめっきを施す工程と、めっき処理後の熱電素子を前記型材から取り出す工程と、を有することを特徴とする熱電素子の製造方法。
- 冷却板の上に複数の貫通孔を有する型材を設置する工程と、前記型材の隣り合う貫通孔内に交互にp型熱電材料とn型熱電材料とを注入して凝固させる工程と、凝固後の熱電素子を前記型材ごと所定の高さになるまで研磨する工程と、前記研磨後の熱電素子の表面にめっきを施す工程と、前記熱電素子を前記型材と共に下部電極がパターン形成された下基板上に、隣接するp型熱電素子とn型熱電素子とが1個の下部電極上でこの電極により電気的に接続されるように設置する工程と、前記熱電素子の上に上部電極がパターン形成された上基板を設置して、前記上部電極により前記p型熱電素子と前記n型熱電素子とを直列接続する工程と、を有することを特徴とする熱電モジュールの製造方法。
- 前記熱電材料が、Bi及びSbからなる群から選択された少なくとも1種の元素と、Te及びSeからなる群から選択された少なくとも1種の元素とを含む材料であることを特徴とする請求項2に記載の熱電モジュールの製造方法。
- 前記型材が、アルミナ、ケイ酸カルシウム及び窒化アルミニウムのうちいずれかの材料からなることを特徴とする請求項2に記載の熱電モジュールの製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006011698A JP4882385B2 (ja) | 2006-01-19 | 2006-01-19 | 熱電素子及び熱電モジュールの製造方法 |
US11/623,982 US20070175506A1 (en) | 2006-01-19 | 2007-01-17 | Thermoelectric module, method of forming a thermoelectric element, and method of thermoelectric module |
CNB2007100039035A CN100563038C (zh) | 2006-01-19 | 2007-01-18 | 热电模块、形成热电元件的方法和热电模块的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006011698A JP4882385B2 (ja) | 2006-01-19 | 2006-01-19 | 熱電素子及び熱電モジュールの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007194438A JP2007194438A (ja) | 2007-08-02 |
JP4882385B2 true JP4882385B2 (ja) | 2012-02-22 |
Family
ID=38320816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006011698A Expired - Fee Related JP4882385B2 (ja) | 2006-01-19 | 2006-01-19 | 熱電素子及び熱電モジュールの製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20070175506A1 (ja) |
JP (1) | JP4882385B2 (ja) |
CN (1) | CN100563038C (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4872092B2 (ja) * | 2007-08-13 | 2012-02-08 | 独立行政法人産業技術総合研究所 | 微細熱電素子の製造方法 |
US20090044848A1 (en) * | 2007-08-14 | 2009-02-19 | Nanocomp Technologies, Inc. | Nanostructured Material-Based Thermoelectric Generators |
KR100990513B1 (ko) * | 2008-07-10 | 2010-10-29 | 주식회사 도시환경이엔지 | 태양전지 셀의 웨이퍼 제조장치 및 이를 이용한 웨이퍼제조방법 |
US8193439B2 (en) * | 2009-06-23 | 2012-06-05 | Laird Technologies, Inc. | Thermoelectric modules and related methods |
CA2768978A1 (en) * | 2009-07-27 | 2011-02-03 | Basf Se | Method for producing thermoelectric semiconductor materials and branches |
JP2012235017A (ja) * | 2011-05-06 | 2012-11-29 | Shimane Univ | 熱電変換材料製造装置及び熱電変換材料製造方法 |
JP2014007376A (ja) * | 2012-05-30 | 2014-01-16 | Denso Corp | 熱電変換装置 |
JP5670989B2 (ja) * | 2012-11-20 | 2015-02-18 | アイシン高丘株式会社 | 熱電モジュールの製造方法 |
JP5831468B2 (ja) | 2013-01-24 | 2015-12-09 | 株式会社デンソー | 熱電変換装置の製造方法 |
JP7253368B2 (ja) * | 2018-12-25 | 2023-04-06 | 日本軽金属株式会社 | 飲料提供装置の冷却構造 |
CN113328031A (zh) * | 2020-09-01 | 2021-08-31 | 中国科学院宁波材料技术与工程研究所 | 一种高强高效碲化铋块体及其制备方法与应用 |
CN112038478B (zh) * | 2020-09-15 | 2023-09-26 | 上海商皓电子科技有限公司 | 一种半导体制冷元件的制造工艺及元件 |
CN114112087A (zh) * | 2021-11-12 | 2022-03-01 | 中国航空工业集团公司沈阳空气动力研究所 | 一种阵列式原子层热电堆热流传感器 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3248777A (en) * | 1961-05-29 | 1966-05-03 | Whirlpool Co | Method of preparing thermoelectric modules |
US3973750A (en) * | 1972-10-06 | 1976-08-10 | Office National D'etudes Et De Recherches Aerospatiales (O.N.E.R.A.) | Casting mold for directional solidification of an alloy |
US6127619A (en) * | 1998-06-08 | 2000-10-03 | Ormet Corporation | Process for producing high performance thermoelectric modules |
US20020170700A1 (en) * | 2000-09-01 | 2002-11-21 | Shigeru Yanagimoto | Metal-casting method and apparatus, casting system and cast-forging system |
JP2002237622A (ja) * | 2001-02-08 | 2002-08-23 | Okano Electric Wire Co Ltd | 熱電素子の製造方法および熱電モジュールの製造方法 |
JP2003191067A (ja) * | 2001-12-21 | 2003-07-08 | Mitsubishi Heavy Ind Ltd | 方向性凝固鋳造装置、方向性凝固鋳造方法 |
-
2006
- 2006-01-19 JP JP2006011698A patent/JP4882385B2/ja not_active Expired - Fee Related
-
2007
- 2007-01-17 US US11/623,982 patent/US20070175506A1/en not_active Abandoned
- 2007-01-18 CN CNB2007100039035A patent/CN100563038C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2007194438A (ja) | 2007-08-02 |
CN101005111A (zh) | 2007-07-25 |
US20070175506A1 (en) | 2007-08-02 |
CN100563038C (zh) | 2009-11-25 |
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