JP4875834B2 - マスク - Google Patents

マスク Download PDF

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Publication number
JP4875834B2
JP4875834B2 JP2004097220A JP2004097220A JP4875834B2 JP 4875834 B2 JP4875834 B2 JP 4875834B2 JP 2004097220 A JP2004097220 A JP 2004097220A JP 2004097220 A JP2004097220 A JP 2004097220A JP 4875834 B2 JP4875834 B2 JP 4875834B2
Authority
JP
Japan
Prior art keywords
light
composition
mask
shielding
aqueous base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004097220A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005187792A5 (enExample
JP2005187792A (ja
Inventor
エドワード・アンズレス
ロバート・ケー・バー
トーマス・シー・サッター
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Rohm and Haas Electronic Materials LLC
DuPont Electronic Materials International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials LLC, DuPont Electronic Materials International LLC filed Critical Rohm and Haas Electronic Materials LLC
Publication of JP2005187792A publication Critical patent/JP2005187792A/ja
Publication of JP2005187792A5 publication Critical patent/JP2005187792A5/ja
Application granted granted Critical
Publication of JP4875834B2 publication Critical patent/JP4875834B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/34—Hot-melt inks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Ink Jet (AREA)
  • Duplication Or Marking (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004097220A 2003-12-24 2004-03-29 マスク Expired - Fee Related JP4875834B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US53237903P 2003-12-24 2003-12-24
US60/532379 2003-12-24

Publications (3)

Publication Number Publication Date
JP2005187792A JP2005187792A (ja) 2005-07-14
JP2005187792A5 JP2005187792A5 (enExample) 2007-04-26
JP4875834B2 true JP4875834B2 (ja) 2012-02-15

Family

ID=34590489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004097220A Expired - Fee Related JP4875834B2 (ja) 2003-12-24 2004-03-29 マスク

Country Status (6)

Country Link
US (1) US7632621B2 (enExample)
EP (1) EP1553445B1 (enExample)
JP (1) JP4875834B2 (enExample)
KR (1) KR101203216B1 (enExample)
CN (1) CN1637595B (enExample)
TW (1) TWI303015B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7378738B2 (en) * 2003-09-02 2008-05-27 International Business Machines Corporation Method for producing self-aligned mask, articles produced by same and composition for same
EP1630600A3 (en) * 2004-07-29 2006-03-22 Rohm and Haas Electronic Materials, L.L.C. Hot melt composition and method involving forming a masking pattern
DE102006022722B4 (de) * 2006-05-12 2010-06-17 Hueck Engraving Gmbh & Co. Kg Verfahren und Vorrichtung zur Oberflächenstrukturierung eines Pressbleches oder eines Endlosbandes
US7626185B2 (en) * 2006-08-11 2009-12-01 Battelle Memorial Institute Patterning compositions, masks, and methods
TWI426351B (zh) * 2006-11-15 2014-02-11 Taiyo Holdings Co Ltd Photolithography (Phototool) and the formation of resistance to resistance pattern
US8968985B2 (en) * 2007-03-30 2015-03-03 Palo Alto Research Center Incorporated Method and system for patterning a mask layer
GB2450975B (en) * 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
US8623586B2 (en) * 2009-02-25 2014-01-07 Gary Ganghui Teng Method for on-press developable lithographic plate utilizing light-blocking material
US8303832B2 (en) * 2009-08-17 2012-11-06 Palo Alto Research Center Incorporated Solid inks for masks for printed circuit boards and other electronic devices
US8211617B2 (en) 2009-08-17 2012-07-03 Palo Alto Research Center Incorporated Solid inks for printed masks
CN101851390B (zh) * 2010-05-19 2012-05-23 广东生益科技股份有限公司 黑色无卤环氧树脂组合物以及使用其制备的覆盖膜
US8677929B2 (en) * 2010-12-29 2014-03-25 Intevac, Inc. Method and apparatus for masking solar cell substrates for deposition
US9622353B2 (en) 2014-05-31 2017-04-11 Rohm And Haas Electronic Materials Llc Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films
EP2950144B1 (en) 2014-05-31 2016-12-14 Rohm and Haas Electronic Materials LLC Imaging process on substrates with aqueous alkaline soluble uv blocking compositions and aqueous soluble uv transparent films
TWI613944B (zh) * 2015-02-17 2018-02-01 吳博文 電路佈線基板的製作方法
AU2017289257B2 (en) * 2016-06-30 2019-10-10 3M Innovative Properties Company Printable compositions including highly viscous components and methods of creating 3D articles therefrom
TWI622863B (zh) * 2017-01-20 2018-05-01 Hong Neng Wen Method of reprocessing after printing
CN110383180B (zh) * 2018-02-13 2021-08-03 洪能文 印刷后再次加工的方法
CN113602013B (zh) * 2021-08-03 2024-03-08 宁波舜宇奥来技术有限公司 遮光结构的制作方法和遮光结构

Family Cites Families (36)

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US4247616A (en) * 1979-07-27 1981-01-27 Minnesota Mining And Manufacturing Company Positive-acting photoresist composition
US4621043A (en) * 1983-01-31 1986-11-04 E. I. Du Pont De Nemours And Company Storage stable photopolymerizable composition
DE3540950A1 (de) * 1985-11-19 1987-05-21 Basf Ag Durch photopolymerisation vernetzbare gemische
US4721531A (en) * 1986-07-08 1988-01-26 Plasticolors, Inc. Pigment dispersions exhibiting improved compatibility in polyurethane systems
US5229252A (en) * 1989-06-09 1993-07-20 Morton International, Inc. Photoimageable compositions
JP2571855B2 (ja) 1989-09-29 1997-01-16 東洋インキ製造株式会社 プリント配線板の製造方法
US5254608A (en) * 1989-10-19 1993-10-19 E. I. Du Pont De Nemours And Company Ultraviolet screener blends
ES2081458T3 (es) * 1990-03-30 1996-03-16 Ciba Geigy Ag Composicion de pintura.
JP2919142B2 (ja) * 1990-12-27 1999-07-12 株式会社東芝 感光性組成物およびそれを用いたパターン形成方法
DE4120174A1 (de) * 1991-06-19 1992-12-24 Hoechst Ag Strahlungsempfindliche sulfonsaeureester und deren verwendung
GB9403451D0 (en) * 1994-02-23 1994-04-13 Ciba Geigy Ag Sunscreen compositions
US5495803A (en) * 1994-07-25 1996-03-05 Gerber Scientific Products, Inc. Method of forming a photomask for a printing plate with an ink jet
US5820932A (en) * 1995-11-30 1998-10-13 Sun Chemical Corporation Process for the production of lithographic printing plates
GB2315076A (en) * 1996-07-05 1998-01-21 Sericol Ltd A phase change ink
US5779779A (en) * 1996-09-27 1998-07-14 Dataproducts Corporation UV-blocking hot melt inks
DE19650562A1 (de) * 1996-12-05 1998-06-10 Basf Ag Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate
US5891228A (en) * 1997-01-08 1999-04-06 Markem Corporation Hot melt jet ink composition
US5938826A (en) * 1997-05-16 1999-08-17 Markem Corporation Hot melt ink
JPH11246760A (ja) * 1998-03-04 1999-09-14 Hitachi Chem Co Ltd ポリアミドイミド樹脂ペースト及びそれを含む被膜形成材料
JPH11256047A (ja) * 1998-03-10 1999-09-21 Toray Ind Inc 感光性ペースト
US6156108A (en) * 1998-12-23 2000-12-05 The Smithsonian Institution Emulsion-containing surface polishes
JP3832177B2 (ja) * 1999-03-17 2006-10-11 東レ株式会社 ガラスペーストおよびそれを用いたディスプレイパネル用部材の製造方法
US6162842A (en) * 1999-05-18 2000-12-19 The Goodyear Tire & Rubber Company Radiation curable coating composition
US6113678A (en) * 1999-09-23 2000-09-05 Xerox Corporation Hot melt inks containing polyanhydrides
US6268111B1 (en) * 1999-10-20 2001-07-31 Rohm And Haas Company Photoimageable composition having photopolymerizeable binder oligomer
US6265132B1 (en) * 1999-10-20 2001-07-24 Rohm And Haas Company Photoimageable composition containing flexible oligomer
US6541590B1 (en) * 1999-12-14 2003-04-01 Rohm And Haas Company Polymeric binders from copolymers of unsaturated carboxylic acids and surfactant monomers
EP1117006A1 (en) * 2000-01-14 2001-07-18 Shipley Company LLC Photoresist having increased photospeed
US6342094B1 (en) * 2000-01-31 2002-01-29 Hewlett-Packard Company Miniemulsion techniques for ink jet inks
US6296674B1 (en) * 2000-02-01 2001-10-02 Ciba Specialty Chemicals Corporation Candle wax stabilized with red-shift benzotriazoles
US6754551B1 (en) * 2000-06-29 2004-06-22 Printar Ltd. Jet print apparatus and method for printed circuit board manufacturing
JP4611554B2 (ja) * 2000-12-01 2011-01-12 昭和電工株式会社 感光性組成物およびその硬化物ならびにそれを用いたプリント配線基板
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JP2002333712A (ja) * 2001-05-10 2002-11-22 Hitachi Chem Co Ltd 着色画像形成材料、感光性着色樹脂組成物、着色画像形成用感光液、着色画像の製造法、カラーフィルターの製造法及びカラーフィルター
DE60304288T2 (de) 2002-01-30 2006-12-28 Rohm And Haas Co. Bindemittelzusammensetzung für Tintenstrahltinte

Also Published As

Publication number Publication date
CN1637595B (zh) 2011-07-06
TWI303015B (en) 2008-11-11
CN1637595A (zh) 2005-07-13
TW200525294A (en) 2005-08-01
KR101203216B1 (ko) 2012-11-20
US7632621B2 (en) 2009-12-15
US20050164121A1 (en) 2005-07-28
EP1553445A2 (en) 2005-07-13
KR20050065337A (ko) 2005-06-29
EP1553445B1 (en) 2018-11-14
EP1553445A3 (en) 2006-12-13
JP2005187792A (ja) 2005-07-14

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