JP4866910B2 - Oh末端有機水素ポリシロキサンを生成する方法 - Google Patents
Oh末端有機水素ポリシロキサンを生成する方法 Download PDFInfo
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- JP4866910B2 JP4866910B2 JP2008533987A JP2008533987A JP4866910B2 JP 4866910 B2 JP4866910 B2 JP 4866910B2 JP 2008533987 A JP2008533987 A JP 2008533987A JP 2008533987 A JP2008533987 A JP 2008533987A JP 4866910 B2 JP4866910 B2 JP 4866910B2
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- organohydropolysiloxane
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- 238000000034 method Methods 0.000 title claims description 26
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 title 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 8
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 239000000460 chlorine Substances 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 1
- -1 cyclic siloxane Chemical class 0.000 description 26
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 238000004821 distillation Methods 0.000 description 17
- 239000003054 catalyst Substances 0.000 description 9
- 239000012071 phase Substances 0.000 description 8
- 230000008707 rearrangement Effects 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 4
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 4
- 239000005048 methyldichlorosilane Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 3
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 3
- 239000003480 eluent Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 125000004966 cyanoalkyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 125000003106 haloaryl group Chemical group 0.000 description 1
- 150000008282 halocarbons Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001367 organochlorosilanes Chemical class 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000006462 rearrangement reaction Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
Description
HO(SiR2O)m(SiR1 2O)nH (1)
を有し、その場合、
R1は、ハロゲン基またはシアノ基によって任意選択で置換される、1〜18の炭素原子を有する水素基または炭化水素基であり、
Rは、ハロゲン基またはシアノ基によって任意選択で置換される、1〜18の炭素原子を有する炭化水素基であり、
mは、1〜1000の整数であり、
nは、1〜1000の整数であり、
1個以上のR1基が水素であることが条件である。
R1 2SiCl2 (2)
を有し、
その場合、R1は上の定義通りである。
R2SiCl2
を有し、その場合、Rは上の定義通りである。
Me2SiCl2/MeSiHCl2
PropylMeSiCl2/MeSiHCl2
CyclopentylSiHCl2/Me2SiCl2
IsooctylSiHCl2/Me2SiCl2である。
参照番号は図1に基づく。
Claims (7)
- 第1ステップにおいて、オルガノヒドロジクロロシラン(A)およびジオルガノジクロロシラン(A)を加水分解性塩素1モル当たり0.3モル以上0.5モル以下の水と反応させて部分水解物(T)および塩化水素ガスを得て、第2ステップにおいては依然存在するSiCl基を除去するため部分水解物(T)を水で処理して塩酸を発生させ、オルガノヒドロポリシロキサン(P)を含む水解物(H)を得る、OH末端オルガノヒドロポリシロキサン(P)を調製するための、プロセス。
- 前記OH末端オルガノヒドロポリシロキサン(P)が、一般式1
HO(SiR2O)m(SiR1 2O)nH (1)
を有し、その場合、
R1は、ハロゲン基またはシアノ基によって任意選択で置換される、1〜18の炭素原子を有する水素基または炭化水素基であり、
Rは、ハロゲン基またはシアノ基によって任意選択で置換される、1〜18の炭素原子を有する炭化水素基であり、
mは、1〜1000の整数であり、
nは、1〜1000の整数であり、
1個以上のR1基が水素であることが条件である、請求項1に記載のプロセス。 - 前記第1ステップにおいて使用されるオルガノヒドロジクロロシラン(A)が一般式2
R1 2SiCl2
を有し、その場合、R1が上の定義通りである、請求項1または2に記載のプロセス。 - 第1ステップで使用されるジオルガノジクロロシラン(B)が、一般式3
R 2 SiCl 2
を含み、その場合、Rが上の定義通りである、請求項1乃至3のいずれか1項に記載のプロセス。 - 前記第1ステップ、前記第2ステップ、または前記両ステップは、濃度が最大0.9 kg/l(L)の水不溶性有機溶媒の存在下で実行される、請求項1乃至4のいずれか1項に記載のプロセス。
- 前記2ステップが完全連続的に実行される、請求項1乃至5のいずれか1項に記載のプロセス。
- 前記第2ステップ後に得られる水解物(H)がオルガノヒドロポリシロキサン(P)と揮発性オルガノヒドロポリシロキサンを含む混合物(G)とに分離され、前記混合物(G)は、前記第1ステップおよび/または前記第2ステップに再利用される、あるいは全体的または部分的に転位して揮発性の少ない、実質的には直鎖状のオルガノヒドロポリシロキサンにされる、請求項1乃至6のいずれか1項に記載のプロセス。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005048035A DE102005048035A1 (de) | 2005-10-06 | 2005-10-06 | Verfahren zur Herstellung von OH-endständigen Organohydrogenpolysiloxanen |
DE102005048035.7 | 2005-10-06 | ||
PCT/EP2006/066901 WO2007039565A1 (de) | 2005-10-06 | 2006-09-29 | Verfahren zur herstellung von oh-endständigen organohydrogenpolysiloxanen |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009511652A JP2009511652A (ja) | 2009-03-19 |
JP4866910B2 true JP4866910B2 (ja) | 2012-02-01 |
Family
ID=37645584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008533987A Expired - Fee Related JP4866910B2 (ja) | 2005-10-06 | 2006-09-29 | Oh末端有機水素ポリシロキサンを生成する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7655811B2 (ja) |
EP (1) | EP1931720B1 (ja) |
JP (1) | JP4866910B2 (ja) |
KR (1) | KR100984083B1 (ja) |
CN (1) | CN101283023B (ja) |
DE (2) | DE102005048035A1 (ja) |
WO (1) | WO2007039565A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2443726C2 (ru) * | 2010-05-20 | 2012-02-27 | Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП ГНИИХТЭОС) | СПОСОБ ПОЛУЧЕНИЯ ω, ω'-ДИГИДРОКСИОЛИГОДИАЛКИЛСИЛОКСАНОВ |
CN101928399B (zh) * | 2010-08-20 | 2014-06-25 | 浙江中天氟硅材料有限公司 | 粘度可控的107硅橡胶的制备方法 |
CN102002163B (zh) * | 2010-10-19 | 2012-05-09 | 江苏宏达新材料股份有限公司 | 一种聚有机硅氧烷的脱氯工艺 |
DE102019102842B4 (de) | 2019-02-05 | 2024-02-08 | Karl Schickinger | Verfahren zur Herstellung von Organohydrogenpolysiloxanen |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS568396A (en) * | 1979-06-05 | 1981-01-28 | Gen Electric | Manufacture of polysiloxane |
JPH028223A (ja) * | 1988-06-27 | 1990-01-11 | Toshiba Silicone Co Ltd | オルガノクロロシランの加水分解方法 |
JPH07109354A (ja) * | 1993-08-18 | 1995-04-25 | Shin Etsu Chem Co Ltd | ジメチルポリシロキサンの製造方法 |
JP2000026606A (ja) * | 1998-06-25 | 2000-01-25 | Wacker Chemie Gmbh | トリメチルシリル末端基を有するヒドロメチルポリシロキサンの製造方法 |
DE10311724A1 (de) * | 2003-03-17 | 2004-10-07 | Wacker-Chemie Gmbh | Verfahren zur Herstellung von Hydrogenmethylpolysiloxanen mit Trimethylsilyl-Endgruppen |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3126343A1 (de) | 1981-07-03 | 1983-01-20 | Wacker-Chemie GmbH, 8000 München | Verfahren zur herstellung von mischpolymeren organosiloxanen mit si-gebundenem wasserstoff |
US5548053A (en) * | 1992-05-15 | 1996-08-20 | Wacker-Chemie Gmbh | Process for the preparation of organopolysiloxane resin |
JP3067953B2 (ja) | 1994-06-10 | 2000-07-24 | 信越化学工業株式会社 | 末端ヒドロキシ基停止オルガノハイドロジェンポリシロキサンの製造方法 |
DE19846397A1 (de) | 1998-10-08 | 2000-04-20 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Mischungen linearer Organopolysiloxane |
US7208617B2 (en) * | 2004-10-05 | 2007-04-24 | Dow Corning Corporation | Hydrolysis of chlorosilanes |
-
2005
- 2005-10-06 DE DE102005048035A patent/DE102005048035A1/de not_active Withdrawn
-
2006
- 2006-09-29 DE DE502006003210T patent/DE502006003210D1/de active Active
- 2006-09-29 JP JP2008533987A patent/JP4866910B2/ja not_active Expired - Fee Related
- 2006-09-29 EP EP06793919A patent/EP1931720B1/de not_active Ceased
- 2006-09-29 US US12/088,967 patent/US7655811B2/en active Active
- 2006-09-29 WO PCT/EP2006/066901 patent/WO2007039565A1/de active Application Filing
- 2006-09-29 KR KR1020087007562A patent/KR100984083B1/ko active IP Right Grant
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS568396A (en) * | 1979-06-05 | 1981-01-28 | Gen Electric | Manufacture of polysiloxane |
JPH028223A (ja) * | 1988-06-27 | 1990-01-11 | Toshiba Silicone Co Ltd | オルガノクロロシランの加水分解方法 |
JPH07109354A (ja) * | 1993-08-18 | 1995-04-25 | Shin Etsu Chem Co Ltd | ジメチルポリシロキサンの製造方法 |
JP2000026606A (ja) * | 1998-06-25 | 2000-01-25 | Wacker Chemie Gmbh | トリメチルシリル末端基を有するヒドロメチルポリシロキサンの製造方法 |
DE10311724A1 (de) * | 2003-03-17 | 2004-10-07 | Wacker-Chemie Gmbh | Verfahren zur Herstellung von Hydrogenmethylpolysiloxanen mit Trimethylsilyl-Endgruppen |
Also Published As
Publication number | Publication date |
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DE502006003210D1 (de) | 2009-04-30 |
CN101283023A (zh) | 2008-10-08 |
US20080269453A1 (en) | 2008-10-30 |
EP1931720A1 (de) | 2008-06-18 |
DE102005048035A1 (de) | 2007-04-12 |
WO2007039565A1 (de) | 2007-04-12 |
CN101283023B (zh) | 2011-07-06 |
EP1931720B1 (de) | 2009-03-18 |
JP2009511652A (ja) | 2009-03-19 |
US7655811B2 (en) | 2010-02-02 |
KR20080041283A (ko) | 2008-05-09 |
KR100984083B1 (ko) | 2010-09-30 |
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