JP4859429B2 - ダイオキシン類捕捉剤およびダイオキシン類除去方法 - Google Patents
ダイオキシン類捕捉剤およびダイオキシン類除去方法 Download PDFInfo
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- JP4859429B2 JP4859429B2 JP2005290503A JP2005290503A JP4859429B2 JP 4859429 B2 JP4859429 B2 JP 4859429B2 JP 2005290503 A JP2005290503 A JP 2005290503A JP 2005290503 A JP2005290503 A JP 2005290503A JP 4859429 B2 JP4859429 B2 JP 4859429B2
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- Prior art keywords
- dioxins
- sodium silicate
- dioxin
- crystalline layered
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 title claims description 17
- 239000002516 radical scavenger Substances 0.000 title claims description 16
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 title description 17
- 150000002013 dioxins Chemical class 0.000 claims description 73
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 44
- 239000004115 Sodium Silicate Substances 0.000 claims description 43
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 43
- 239000002351 wastewater Substances 0.000 claims description 41
- 239000011734 sodium Substances 0.000 claims description 10
- 239000010419 fine particle Substances 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- 229910052739 hydrogen Chemical group 0.000 claims description 7
- 229910052708 sodium Inorganic materials 0.000 claims description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical group C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
- 239000001257 hydrogen Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- KVGZZAHHUNAVKZ-UHFFFAOYSA-N 1,4-Dioxin Chemical compound O1C=COC=C1 KVGZZAHHUNAVKZ-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000002000 scavenging effect Effects 0.000 description 5
- 229910021645 metal ion Inorganic materials 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 150000004826 dibenzofurans Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- FOIBFBMSLDGNHL-UHFFFAOYSA-N 1,2,3,4,6,7,8,9-Octachlorodibenzo-p-dioxin Chemical compound ClC1=C(Cl)C(Cl)=C2OC3=C(Cl)C(Cl)=C(Cl)C(Cl)=C3OC2=C1Cl FOIBFBMSLDGNHL-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical compound C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- RHIROFAGUQOFLU-UHFFFAOYSA-N 1,2,3,4,6,7,8,9-Octachlorodibenzofuran Chemical compound ClC1=C(Cl)C(Cl)=C2C3=C(Cl)C(Cl)=C(Cl)C(Cl)=C3OC2=C1Cl RHIROFAGUQOFLU-UHFFFAOYSA-N 0.000 description 1
- WCLNVRQZUKYVAI-UHFFFAOYSA-N 1,2,3,4,6,7,8-Heptachlorodibenzodioxin Chemical compound O1C2=C(Cl)C(Cl)=C(Cl)C(Cl)=C2OC2=C1C=C(Cl)C(Cl)=C2Cl WCLNVRQZUKYVAI-UHFFFAOYSA-N 0.000 description 1
- WDMKCPIVJOGHBF-UHFFFAOYSA-N 1,2,3,4,6,7,8-Heptachlorodibenzofuran Chemical compound ClC1=C(Cl)C(Cl)=C2C(C=C(C(=C3Cl)Cl)Cl)=C3OC2=C1Cl WDMKCPIVJOGHBF-UHFFFAOYSA-N 0.000 description 1
- WCYYQNSQJHPVMG-UHFFFAOYSA-N 1,2,3,4,7,8-Hexachlorodibenzodioxin Chemical compound O1C2=C(Cl)C(Cl)=C(Cl)C(Cl)=C2OC2=C1C=C(Cl)C(Cl)=C2 WCYYQNSQJHPVMG-UHFFFAOYSA-N 0.000 description 1
- LGIRBUBHIWTVCK-UHFFFAOYSA-N 1,2,3,7,8,9-Hexachlorodibenzodioxin Chemical compound O1C2=CC(Cl)=C(Cl)C(Cl)=C2OC2=C1C=C(Cl)C(Cl)=C2Cl LGIRBUBHIWTVCK-UHFFFAOYSA-N 0.000 description 1
- FSPZPQQWDODWAU-UHFFFAOYSA-N 1,2,3,7,8-Pentachlorodibenzodioxin Chemical compound O1C2=CC(Cl)=C(Cl)C(Cl)=C2OC2=C1C=C(Cl)C(Cl)=C2 FSPZPQQWDODWAU-UHFFFAOYSA-N 0.000 description 1
- SBMIVUVRFPGOEB-UHFFFAOYSA-N 1,2,3,7,8-Pentachlorodibenzofuran Chemical compound O1C2=CC(Cl)=C(Cl)C(Cl)=C2C2=C1C=C(Cl)C(Cl)=C2 SBMIVUVRFPGOEB-UHFFFAOYSA-N 0.000 description 1
- OGBQILNBLMPPDP-UHFFFAOYSA-N 2,3,4,7,8-Pentachlorodibenzofuran Chemical compound O1C2=C(Cl)C(Cl)=C(Cl)C=C2C2=C1C=C(Cl)C(Cl)=C2 OGBQILNBLMPPDP-UHFFFAOYSA-N 0.000 description 1
- KSMVNVHUTQZITP-UHFFFAOYSA-N 2,3,7,8-Tetrachlorodibenzofuran Chemical compound O1C2=CC(Cl)=C(Cl)C=C2C2=C1C=C(Cl)C(Cl)=C2 KSMVNVHUTQZITP-UHFFFAOYSA-N 0.000 description 1
- UQMGJOKDKOLIDP-UHFFFAOYSA-N 3,3',4,4'-tetrachlorobiphenyl Chemical group C1=C(Cl)C(Cl)=CC=C1C1=CC=C(Cl)C(Cl)=C1 UQMGJOKDKOLIDP-UHFFFAOYSA-N 0.000 description 1
- ZHLICBPIXDOFFG-UHFFFAOYSA-N 3,4,5,3',4',5'-Hexachlorobiphenyl Chemical group ClC1=C(Cl)C(Cl)=CC(C=2C=C(Cl)C(Cl)=C(Cl)C=2)=C1 ZHLICBPIXDOFFG-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- -1 incinerators Chemical class 0.000 description 1
- 239000010842 industrial wastewater Substances 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000002910 solid waste Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
Landscapes
- Water Treatment By Sorption (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Description
模擬廃水を1mol/L水酸化ナトリウムで中和した(最終pH8)。この液を東洋濾紙株式会社製メンブレンフィルター(孔径1μm)で濾過した。ろ液をJIS K−0312(工業用水・工業用排水中のダイオキシン類の測定方法)に従って分析した。結果を表1に示す。
SiO2/Na2O(モル比)が2になるように調製した珪酸ナトリウム水溶液を蒸発乾固させた後、700℃で1時間焼成させて焼成物を得た。得られた焼成物は、粉末X線回折装置により確認したところ、Na2Si2O5で示される結晶性層状珪酸ナトリウムであった。この結晶性層状珪酸ナトリウムを粉砕し、分級することにより平均粒径100μmの結晶性層状珪酸ナトリウム得た。
Claims (2)
- NaMSixO2x+1・yH2O(但し、式中Mはナトリウムまたは水素、xは1.9から4までの数、yは0から20までの数である)で表される結晶性層状珪酸ナトリウムからなることを特徴とするダイオキシン類捕捉剤。
- ダイオキシン類を含む廃水とNaMSixO2x+1・yH2O(但し、式中Mはナトリウムまたは水素、xは1.9から4までの数、yは0から20までの数である)で表される結晶性層状珪酸ナトリウムとを混合させ、生じた微粒子を分離することを特徴とする廃水のダイオキシン類除去方法。
Priority Applications (1)
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JP2005290503A JP4859429B2 (ja) | 2005-10-03 | 2005-10-03 | ダイオキシン類捕捉剤およびダイオキシン類除去方法 |
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JP2005290503A JP4859429B2 (ja) | 2005-10-03 | 2005-10-03 | ダイオキシン類捕捉剤およびダイオキシン類除去方法 |
Publications (2)
Publication Number | Publication Date |
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JP2007098252A JP2007098252A (ja) | 2007-04-19 |
JP4859429B2 true JP4859429B2 (ja) | 2012-01-25 |
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JP2005290503A Expired - Fee Related JP4859429B2 (ja) | 2005-10-03 | 2005-10-03 | ダイオキシン類捕捉剤およびダイオキシン類除去方法 |
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JP (1) | JP4859429B2 (ja) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3426389A1 (de) * | 1984-07-18 | 1986-01-23 | Hoechst Ag, 6230 Frankfurt | Formkoerper aus silikatischem material, ihre verwendung und verfahren zu ihrer herstellung |
JPH08143310A (ja) * | 1994-11-21 | 1996-06-04 | Ngk Insulators Ltd | 粘土層間架橋体 |
DE19613060A1 (de) * | 1996-04-01 | 1997-10-02 | Hoechst Ag | Verwendung von Schichtsilikaten |
JP4445758B2 (ja) * | 2004-01-22 | 2010-04-07 | 出光興産株式会社 | 難分解性物質を含有する汚染水の処理方法 |
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- 2005-10-03 JP JP2005290503A patent/JP4859429B2/ja not_active Expired - Fee Related
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