JP4855885B2 - マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法 - Google Patents

マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法 Download PDF

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Publication number
JP4855885B2
JP4855885B2 JP2006269609A JP2006269609A JP4855885B2 JP 4855885 B2 JP4855885 B2 JP 4855885B2 JP 2006269609 A JP2006269609 A JP 2006269609A JP 2006269609 A JP2006269609 A JP 2006269609A JP 4855885 B2 JP4855885 B2 JP 4855885B2
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JP
Japan
Prior art keywords
mask
cassette
case
photomask
holding means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006269609A
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English (en)
Japanese (ja)
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JP2008087811A (ja
Inventor
和久 井村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
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Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2006269609A priority Critical patent/JP4855885B2/ja
Priority to TW096134036A priority patent/TW200821235A/zh
Priority to CN2007101630075A priority patent/CN101152919B/zh
Priority to KR1020070097765A priority patent/KR101094502B1/ko
Publication of JP2008087811A publication Critical patent/JP2008087811A/ja
Application granted granted Critical
Publication of JP4855885B2 publication Critical patent/JP4855885B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1906—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers specially adapted for containing masks, reticles or pellicles

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006269609A 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法 Expired - Fee Related JP4855885B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006269609A JP4855885B2 (ja) 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法
TW096134036A TW200821235A (en) 2006-09-29 2007-09-12 Mask case, mask cassette, pattern transfer method, manufacturing method for display apparatus and installation method of phto-mask
CN2007101630075A CN101152919B (zh) 2006-09-29 2007-09-28 掩膜壳体、掩膜盒、图案转录方法及显示装置的制造方法
KR1020070097765A KR101094502B1 (ko) 2006-09-29 2007-09-28 마스크 케이스, 마스크 카세트, 패턴 전사 방법, 표시장치의 제조 방법 및 포토마스크의 설치 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006269609A JP4855885B2 (ja) 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法

Publications (2)

Publication Number Publication Date
JP2008087811A JP2008087811A (ja) 2008-04-17
JP4855885B2 true JP4855885B2 (ja) 2012-01-18

Family

ID=39254845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006269609A Expired - Fee Related JP4855885B2 (ja) 2006-09-29 2006-09-29 マスクケース、マスクカセット、パターン転写方法及び表示装置の製造方法

Country Status (4)

Country Link
JP (1) JP4855885B2 (https=)
KR (1) KR101094502B1 (https=)
CN (1) CN101152919B (https=)
TW (1) TW200821235A (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5052106B2 (ja) * 2006-11-22 2012-10-17 旭化成イーマテリアルズ株式会社 ペリクルの収納方法
KR101121176B1 (ko) * 2008-04-23 2012-03-23 피엠씨글로벌 주식회사 포토마스크 케이스의 구조
JP5149207B2 (ja) * 2009-01-13 2013-02-20 株式会社荏原製作所 基板搭載装置
KR101067818B1 (ko) * 2009-08-14 2011-09-27 (주)아이콘 반도체 장비용 트레이 클램프 장치
JP2011203309A (ja) * 2010-03-24 2011-10-13 Shin-Etsu Chemical Co Ltd ペリクルの収納容器およびペリクル収納容器の搬送用台車
JP5586559B2 (ja) * 2011-10-28 2014-09-10 信越化学工業株式会社 ペリクル収容容器
KR101962505B1 (ko) * 2012-05-11 2019-03-26 가부시키가이샤 니콘 기판 케이스, 기판 운반 케이스, 케이스 커버, 기판 운반 시스템 및 기판 운반 방법
JP2014218328A (ja) * 2013-05-08 2014-11-20 新東エスプレシジョン株式会社 メタルマスクシート供給システム
KR102242065B1 (ko) * 2015-01-26 2021-04-19 가부시키가이샤 니콘 마스크 케이스, 보관 장치 및 방법, 반송 장치 및 방법, 그리고 노광 장치
TWI658532B (zh) * 2017-08-09 2019-05-01 明安國際企業股份有限公司 基板承置匣
US11104496B2 (en) * 2019-08-16 2021-08-31 Gudeng Precision Industrial Co., Ltd. Non-sealed reticle storage device
JP7503139B2 (ja) * 2019-12-24 2024-06-19 インテグリス・インコーポレーテッド ベースプレートを介した保持力を有するレチクルポッド
US11703754B2 (en) 2020-05-14 2023-07-18 Taiwan Semiconductor Manufacturing Company Ltd. Particle prevention method in reticle pod
TWI779505B (zh) * 2020-05-14 2022-10-01 台灣積體電路製造股份有限公司 光罩盒及防止光罩污染之方法
TWI760062B (zh) * 2020-05-14 2022-04-01 家登精密工業股份有限公司 提供有保持銷組件之光罩盒及固持光罩的方法
US11874596B2 (en) * 2020-09-30 2024-01-16 Gudeng Precision Industrial Co., Ltd Workpiece container system
JP7313498B1 (ja) 2022-02-18 2023-07-24 株式会社協同 フォトマスク収納ケース、及び、フォトマスク収納ケース用のフォトマスク用クッション部材
TWI853622B (zh) * 2023-06-28 2024-08-21 日商協同股份有限公司 光罩收納盒
CN119218546A (zh) * 2023-06-30 2024-12-31 株式会社协同 光掩模收纳盒

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03188446A (ja) 1989-09-05 1991-08-16 Konica Corp カセット供給装置
KR100383260B1 (ko) 2001-03-08 2003-05-09 삼성전자주식회사 레티클 위치감지장치기능을 갖는 포크 암을 구비한 레이클이송장치
JP2005032886A (ja) * 2003-07-10 2005-02-03 Nikon Corp マスクフレーム、露光方法及び露光装置
JP4581681B2 (ja) * 2004-12-27 2010-11-17 株式会社ニコン レチクル保護装置および露光装置

Also Published As

Publication number Publication date
JP2008087811A (ja) 2008-04-17
CN101152919A (zh) 2008-04-02
TW200821235A (en) 2008-05-16
TWI356797B (https=) 2012-01-21
CN101152919B (zh) 2013-07-31
KR20080029876A (ko) 2008-04-03
KR101094502B1 (ko) 2011-12-19

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