JP4833211B2 - マイクロリソグラフィ用の投影対物レンズ - Google Patents

マイクロリソグラフィ用の投影対物レンズ Download PDF

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Publication number
JP4833211B2
JP4833211B2 JP2007524269A JP2007524269A JP4833211B2 JP 4833211 B2 JP4833211 B2 JP 4833211B2 JP 2007524269 A JP2007524269 A JP 2007524269A JP 2007524269 A JP2007524269 A JP 2007524269A JP 4833211 B2 JP4833211 B2 JP 4833211B2
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Japan
Prior art keywords
projection objective
image
curvature
mask
curved
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Expired - Fee Related
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JP2007524269A
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Japanese (ja)
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JP2008509544A (ja
JP2008509544A5 (enExample
Inventor
ゲー ベルント
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2008509544A5 publication Critical patent/JP2008509544A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007524269A 2004-08-06 2005-08-03 マイクロリソグラフィ用の投影対物レンズ Expired - Fee Related JP4833211B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US59905504P 2004-08-06 2004-08-06
US60/599,055 2004-08-06
PCT/EP2005/008392 WO2006013100A2 (en) 2004-08-06 2005-08-03 Projection objective for microlithography

Publications (3)

Publication Number Publication Date
JP2008509544A JP2008509544A (ja) 2008-03-27
JP2008509544A5 JP2008509544A5 (enExample) 2008-06-19
JP4833211B2 true JP4833211B2 (ja) 2011-12-07

Family

ID=34978760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007524269A Expired - Fee Related JP4833211B2 (ja) 2004-08-06 2005-08-03 マイクロリソグラフィ用の投影対物レンズ

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Country Link
US (4) US8212988B2 (enExample)
JP (1) JP4833211B2 (enExample)
WO (1) WO2006013100A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7949548B2 (en) * 2006-03-08 2011-05-24 Guy Carpenter & Company Spatial database system for generation of weather event and risk reports
CN101681092B (zh) * 2007-05-09 2012-07-25 株式会社尼康 光罩用基板、光罩用基板的成形构件、光罩用基板的制造方法、光罩、及使用光罩的曝光方法
DE202008016307U1 (de) 2008-12-09 2009-04-02 Carl Zeiss Smt Ag Retikel mit einer abzubildenden Struktur, Projektionsoptik zur Abbildung der Struktur sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
DE102011086513A1 (de) 2011-11-16 2013-05-16 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie
DE102012211256A1 (de) 2012-06-29 2014-01-02 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Projektionslithographie
NL2014267A (en) * 2014-02-24 2015-08-25 Asml Netherlands Bv Lithographic apparatus and method.
DE102015212619A1 (de) * 2015-07-06 2017-01-12 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
CN105447228B (zh) * 2015-11-11 2018-10-19 中国人民解放军国防科学技术大学 一种地球扰动引力赋值模型适用性能评估方法
CN107977486B (zh) * 2017-11-06 2019-08-09 北京宇航系统工程研究所 一种地球扰动引力场球冠谐模型阶次扩展方法及系统
DE102018218107A1 (de) 2018-10-23 2018-12-20 Carl Zeiss Smt Gmbh Optische Anordnung zur Bauteilinspektion von Bauteilen mit einer gekrümmten Oberfläche und Inspektionsverfahren hierzu

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0636987A (ja) * 1992-07-17 1994-02-10 Nikon Corp 投影露光装置
JP2000077321A (ja) * 1998-08-31 2000-03-14 Canon Inc 投影露光方法及び投影露光装置
EP1231513A1 (en) * 2001-02-08 2002-08-14 Asm Lithography B.V. Lithographic projection apparatus with adjustable focal surface
JP2003133223A (ja) * 2001-10-30 2003-05-09 Canon Inc 露光装置
US20030090640A1 (en) * 2001-11-02 2003-05-15 Tadahito Fujisawa Exposure method and apparatus
JP2003178971A (ja) * 2002-10-24 2003-06-27 Nikon Corp 投影露光装置及び投影露光方法
JP2003203848A (ja) * 2002-01-08 2003-07-18 Canon Inc 走査露光装置及びその製造方法並びにデバイス製造方法
JP2003264136A (ja) * 2002-03-08 2003-09-19 Canon Inc 位置検出方法、面形状推測方法及びそれを用いた露光装置、デバイスの製造方法
US20060144211A1 (en) * 2004-11-19 2006-07-06 Yoshimoto Inc. Data input device and data input method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4812028A (en) 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
US5052763A (en) 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
US5527139A (en) 1993-09-13 1996-06-18 Creative Foam Corporation Vehicle door protection system
JP3341269B2 (ja) * 1993-12-22 2002-11-05 株式会社ニコン 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
JP3231241B2 (ja) 1996-05-01 2001-11-19 キヤノン株式会社 Ｘ線縮小露光装置、及び該装置を用いた半導体製造方法
US6522386B1 (en) * 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
US7112772B2 (en) * 1998-05-29 2006-09-26 Carl Zeiss Smt Ag Catadioptric projection objective with adaptive mirror and projection exposure method
KR100796825B1 (ko) 2000-04-12 2008-01-22 엔엑스피 비 브이 반도체 디바이스 제조 방법
DE10123725A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
TWI282487B (en) * 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0636987A (ja) * 1992-07-17 1994-02-10 Nikon Corp 投影露光装置
JP2000077321A (ja) * 1998-08-31 2000-03-14 Canon Inc 投影露光方法及び投影露光装置
EP1231513A1 (en) * 2001-02-08 2002-08-14 Asm Lithography B.V. Lithographic projection apparatus with adjustable focal surface
JP2003133223A (ja) * 2001-10-30 2003-05-09 Canon Inc 露光装置
US20030090640A1 (en) * 2001-11-02 2003-05-15 Tadahito Fujisawa Exposure method and apparatus
JP2003142373A (ja) * 2001-11-02 2003-05-16 Toshiba Corp 露光方法および露光装置
JP2003203848A (ja) * 2002-01-08 2003-07-18 Canon Inc 走査露光装置及びその製造方法並びにデバイス製造方法
JP2003264136A (ja) * 2002-03-08 2003-09-19 Canon Inc 位置検出方法、面形状推測方法及びそれを用いた露光装置、デバイスの製造方法
JP2003178971A (ja) * 2002-10-24 2003-06-27 Nikon Corp 投影露光装置及び投影露光方法
US20060144211A1 (en) * 2004-11-19 2006-07-06 Yoshimoto Inc. Data input device and data input method

Also Published As

Publication number Publication date
WO2006013100A3 (en) 2006-07-06
US9217932B2 (en) 2015-12-22
US20120327382A1 (en) 2012-12-27
US9568838B2 (en) 2017-02-14
JP2008509544A (ja) 2008-03-27
US8212988B2 (en) 2012-07-03
WO2006013100A2 (en) 2006-02-09
US20160170307A1 (en) 2016-06-16
US20080252987A1 (en) 2008-10-16
US20170248850A1 (en) 2017-08-31

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