JP4819065B2 - 膜厚モニタ用のヘテロダイン反射率計及びその実施方法 - Google Patents

膜厚モニタ用のヘテロダイン反射率計及びその実施方法 Download PDF

Info

Publication number
JP4819065B2
JP4819065B2 JP2007557085A JP2007557085A JP4819065B2 JP 4819065 B2 JP4819065 B2 JP 4819065B2 JP 2007557085 A JP2007557085 A JP 2007557085A JP 2007557085 A JP2007557085 A JP 2007557085A JP 4819065 B2 JP4819065 B2 JP 4819065B2
Authority
JP
Japan
Prior art keywords
frequency
heterodyne
phase shift
thickness
polarization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007557085A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008533447A (ja
JP2008533447A5 (enExample
Inventor
アナンス アイヤー アイヤー，アルン
エー． メロニ，マーク
シー． ハーベイ，ケネス
ウィークス クエニー，アンドリュー
Original Assignee
ヴェリティー インストルメンツ，インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/066,933 external-priority patent/US7339682B2/en
Application filed by ヴェリティー インストルメンツ，インコーポレイテッド filed Critical ヴェリティー インストルメンツ，インコーポレイテッド
Publication of JP2008533447A publication Critical patent/JP2008533447A/ja
Publication of JP2008533447A5 publication Critical patent/JP2008533447A5/ja
Application granted granted Critical
Publication of JP4819065B2 publication Critical patent/JP4819065B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/30—Grating as beam-splitter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2007557085A 2005-02-25 2006-02-21 膜厚モニタ用のヘテロダイン反射率計及びその実施方法 Expired - Fee Related JP4819065B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11/066,933 2005-02-25
US11/066,933 US7339682B2 (en) 2005-02-25 2005-02-25 Heterodyne reflectometer for film thickness monitoring and method for implementing
US11/178,856 US20060285120A1 (en) 2005-02-25 2005-07-10 Method for monitoring film thickness using heterodyne reflectometry and grating interferometry
US11/178,856 2005-07-10
PCT/US2006/005937 WO2006093709A2 (en) 2005-02-25 2006-02-21 Heterodyne reflectometer for film thickness monitoring and method for implementing

Publications (3)

Publication Number Publication Date
JP2008533447A JP2008533447A (ja) 2008-08-21
JP2008533447A5 JP2008533447A5 (enExample) 2009-04-09
JP4819065B2 true JP4819065B2 (ja) 2011-11-16

Family

ID=36941619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007557085A Expired - Fee Related JP4819065B2 (ja) 2005-02-25 2006-02-21 膜厚モニタ用のヘテロダイン反射率計及びその実施方法

Country Status (5)

Country Link
US (1) US20060285120A1 (enExample)
JP (1) JP4819065B2 (enExample)
KR (1) KR20070110390A (enExample)
TW (1) TWI285257B (enExample)
WO (1) WO2006093709A2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7781349B2 (en) * 2005-09-12 2010-08-24 Imec Method and system for optimizing a BARC stack
US20070059849A1 (en) * 2005-09-12 2007-03-15 Interuniversitair Microelktronica Centrum (Imec) Method and system for BARC optimization for high numerical aperture applications
US7589843B2 (en) * 2005-09-27 2009-09-15 Verity Instruments, Inc. Self referencing heterodyne reflectometer and method for implementing
US7823440B2 (en) * 2007-08-16 2010-11-02 Micron Technology, Inc. Systems and methods for characterizing thickness and topography of microelectronic workpiece layers
US20100122456A1 (en) * 2008-11-17 2010-05-20 Chen-Hua Yu Integrated Alignment and Bonding System
KR101126382B1 (ko) * 2010-05-10 2012-03-28 주식회사 케이씨텍 화학 기계식 연마시스템의 컨디셔너
US8908161B2 (en) * 2011-08-25 2014-12-09 Palo Alto Research Center Incorporated Removing aluminum nitride sections
WO2013061417A1 (ja) * 2011-10-26 2013-05-02 三菱電機株式会社 膜厚測定方法
JP6079697B2 (ja) * 2013-07-11 2017-02-15 株式会社村田製作所 電子部品の厚さ測定方法、これを用いる電子部品連の製造方法、これによって製造された電子部品連、および、電子部品の検査装置
KR102292209B1 (ko) 2014-07-28 2021-08-25 삼성전자주식회사 반도체 계측 시스템 및 이를 이용한 반도체 소자의 계측 방법
CN109313393A (zh) 2016-06-09 2019-02-05 Asml荷兰有限公司 计量设备
JP6800800B2 (ja) * 2017-04-06 2020-12-16 株式会社ニューフレアテクノロジー 成長速度測定装置および成長速度検出方法
JP6285597B1 (ja) * 2017-06-05 2018-02-28 大塚電子株式会社 光学測定装置および光学測定方法
JP6919458B2 (ja) 2017-09-26 2021-08-18 オムロン株式会社 変位計測装置、計測システム、および変位計測方法
TWI794416B (zh) * 2018-02-28 2023-03-01 美商賽格股份有限公司 多層堆疊結構之計量方法及干涉儀系統
DE102019104260B4 (de) * 2019-02-20 2025-09-11 Stefan Böttger Photothermisches Verfahren und Vorrichtung zur Bestimmung einer Schichtdicke einer auf ein Substrat aufgebrachten Schicht
CN110715931B (zh) * 2019-10-29 2022-04-12 上海御微半导体技术有限公司 一种透明样品缺陷自动检测方法和检测装置
DE112020005762T5 (de) 2019-11-26 2022-09-22 Hamamatsu Photonics K.K. Optische Einheit und Schichtdicken-Messvorrichtung
IL307209B2 (en) 2021-03-26 2024-09-01 Arun Anath Aiyer Optical sensor for surface inspection and metrology
CN114894712B (zh) * 2022-03-25 2023-08-25 业成科技（成都）有限公司 光学量测设备及其校正方法
CN115451839A (zh) * 2022-08-25 2022-12-09 中钞印制技术研究院有限公司 安全产品表面涂层厚度的检测方法
TWI812482B (zh) * 2022-09-23 2023-08-11 中國鋼鐵股份有限公司 旋轉機械系統與平衡方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63128211A (ja) * 1986-11-19 1988-05-31 Hitachi Ltd スペ−シング測定方法
JPH0221203A (ja) * 1988-07-09 1990-01-24 Brother Ind Ltd 位相差検出装置
JPH06148086A (ja) * 1992-10-30 1994-05-27 Canon Inc 表面状態検査方法及びそれを用いた表面状態検査装置
JPH08271230A (ja) * 1995-03-22 1996-10-18 Zygo Corp 光学的隙間測定方法および装置
JP2000035316A (ja) * 1998-07-16 2000-02-02 Nikon Corp ウエハ上膜厚測定方法及びウエハ上膜厚測定装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4688940A (en) * 1985-03-12 1987-08-25 Zygo Corporation Heterodyne interferometer system
US5450205A (en) * 1993-05-28 1995-09-12 Massachusetts Institute Of Technology Apparatus and method for real-time measurement of thin film layer thickness and changes thereof
US5548401A (en) * 1993-08-23 1996-08-20 Nippon Telegraph And Telephone Public Corporation Photomask inspecting method and apparatus
FR2716531B1 (fr) * 1994-02-18 1996-05-03 Saint Gobain Cinematique Contr Procédé de mesure d'épaisseur d'un matériau transparent.
DE19733890C2 (de) * 1996-08-04 2000-03-16 Matsushita Electric Industrial Co Ltd Verfahren zum Vermessen eines Mediums und Vorrichtung dazu
FR2780778B3 (fr) * 1998-07-03 2000-08-11 Saint Gobain Vitrage Procede et dispositif pour la mesure de l'epaisseur d'un materiau transparent
US6710881B1 (en) * 1999-09-28 2004-03-23 Nanyang Technological University Heterodyne interferometry for small spacing measurement
US7339682B2 (en) * 2005-02-25 2008-03-04 Verity Instruments, Inc. Heterodyne reflectometer for film thickness monitoring and method for implementing

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63128211A (ja) * 1986-11-19 1988-05-31 Hitachi Ltd スペ−シング測定方法
JPH0221203A (ja) * 1988-07-09 1990-01-24 Brother Ind Ltd 位相差検出装置
JPH06148086A (ja) * 1992-10-30 1994-05-27 Canon Inc 表面状態検査方法及びそれを用いた表面状態検査装置
JPH08271230A (ja) * 1995-03-22 1996-10-18 Zygo Corp 光学的隙間測定方法および装置
JP2000035316A (ja) * 1998-07-16 2000-02-02 Nikon Corp ウエハ上膜厚測定方法及びウエハ上膜厚測定装置

Also Published As

Publication number Publication date
TWI285257B (en) 2007-08-11
JP2008533447A (ja) 2008-08-21
TW200710370A (en) 2007-03-16
WO2006093709A2 (en) 2006-09-08
US20060285120A1 (en) 2006-12-21
KR20070110390A (ko) 2007-11-16
WO2006093709A3 (en) 2007-05-31

Similar Documents

Publication Publication Date Title
US7339682B2 (en) Heterodyne reflectometer for film thickness monitoring and method for implementing
JP4819065B2 (ja) 膜厚モニタ用のヘテロダイン反射率計及びその実施方法
US10365163B2 (en) Optical critical dimension metrology
US11029258B2 (en) Optical phase measurement method and system
US7115858B1 (en) Apparatus and method for the measurement of diffracting structures
US7889339B1 (en) Complementary waveplate rotating compensator ellipsometer
US20150002852A1 (en) Coherence scanning interferometry using phase shifted interferometrty signals
US7286226B2 (en) Method and apparatus for measuring birefringence
US20070188762A1 (en) Modulated scatterometry
WO2010110926A2 (en) Method and apparatus for phase-compensated sensitivity-enhanced spectroscopy (pcses)
US20050036143A1 (en) Reference calibration of metrology instrument
US20140233016A1 (en) Method and system for measuring patterned substrates
US20150345934A1 (en) Optical method and system for critical dimensions and thickness characterization
US20120089365A1 (en) Data interpolation methods for metrology of surfaces, films and underresolved structures
US20240337590A1 (en) Method and system for optical characterization of patterned samples
US7545503B2 (en) Self referencing heterodyne reflectometer and method for implementing
JP2008533447A5 (enExample)
US7589843B2 (en) Self referencing heterodyne reflectometer and method for implementing
KR102501986B1 (ko) 차동 편광 간섭계를 이용하여 에칭 깊이를 측정하는 방법 및 기기, 그리고 이러한 측정 기기를 포함하는 글로우 방전 분광 측정 장치
CN121192004A (zh) 用于表征膜的方法和装置
Epner et al. Spectroscopic Ellipsometry Analysis of Opaque Gold Film for Epner Technology
Paduschek et al. Advanced ellipsometry for very thin films and multilayers

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090220

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090220

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110330

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110408

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110704

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110711

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110721

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110812

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110831

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140909

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4819065

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: R3D02

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees