JP4786946B2 - 研磨中に混合伴流を促進するように配置された溝を有する研磨パッド - Google Patents
研磨中に混合伴流を促進するように配置された溝を有する研磨パッド Download PDFInfo
- Publication number
- JP4786946B2 JP4786946B2 JP2005175892A JP2005175892A JP4786946B2 JP 4786946 B2 JP4786946 B2 JP 4786946B2 JP 2005175892 A JP2005175892 A JP 2005175892A JP 2005175892 A JP2005175892 A JP 2005175892A JP 4786946 B2 JP4786946 B2 JP 4786946B2
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- Prior art keywords
- polishing
- grooves
- wafer
- groove
- polishing pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000005498 polishing Methods 0.000 title claims description 177
- 239000000758 substrate Substances 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 88
- 239000002002 slurry Substances 0.000 description 37
- 239000013598 vector Substances 0.000 description 31
- 230000007704 transition Effects 0.000 description 11
- 239000000126 substance Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S451/00—Abrading
- Y10S451/921—Pad for lens shaping tool
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
Claims (4)
- 磁性基材、光学基材及び半導体基材の少なくとも一つを研磨するのに適した、回転軸を中心に回転可能な回転研磨パッドであって、
(a)研磨パッド上の回転軸を中心とする第一の円形に対応する第一の境界線と、研磨パッド上の回転軸を中心とする第二の円形によって画定され、前記第一の境界線から離間した第二の境界線と、第二の境界線に接する第一のゾーンと、第三のゾーン及び第一のゾーンの間の第二のゾーンと、第一の境界線に接する第三のゾーンとによって画定される研磨領域を有する研磨層、
(b)前記第一の境界線に接する前記研磨領域の中に少なくとも部分的に含まれ、前記第一の境界線に接する地点で前記第一の境界線に対して−40°〜40°の角度を形成する、第三のゾーンの中の複数の第一の小さな角度の溝であって、第三のゾーンの中の溝が複数の第一の小さな角度の溝からなる、複数の第一の小さな角度の溝、
(c)前記第二の境界線に接する前記研磨領域の中に少なくとも部分的に含まれ、前記第二の境界線に接する地点で前記第二の境界線に対して−40°〜40°の角度を形成する、第一のゾーンの中の複数の第二の小さな角度の溝であって、第一のゾーンの溝が複数の第二の小さな角度の溝からなる、複数の第二の小さな角度の溝、及び
(d)それぞれが、前記研磨領域の中に含まれ、前記複数の第一の小さな角度の溝と前記複数の第二の小さな角度の溝との間に位置し、前記第一の境界線及び前記第二の境界線それぞれに対して60°〜120°の角度を形成する、第二のゾーンの中の複数の大きな角度の溝であって、第二のゾーンの溝が複数の大きな角度の溝からなる、複数の大きな角度の溝
を含む研磨パッド。 - 前記複数の第一の小さな角度の溝それぞれ及び前記複数の第二の小さな角度の溝それぞれが、らせん溝である、請求項1記載の研磨パッド。
- 前記複数の大きな角度の溝それぞれが、前記回転研磨パッドの前記回転軸に対して半径方向にある、請求項1記載の研磨パッド。
- 前記複数の大きな角度の溝それぞれ一つが、第一端で前記複数の第一の小さな角度の溝の対応する一つに接続し、第二端で前記複数の第二の小さな角度の溝の対応する一つに接続する、請求項1記載の研磨パッド。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/869,394 US6974372B1 (en) | 2004-06-16 | 2004-06-16 | Polishing pad having grooves configured to promote mixing wakes during polishing |
US10/869,394 | 2004-06-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006007412A JP2006007412A (ja) | 2006-01-12 |
JP4786946B2 true JP4786946B2 (ja) | 2011-10-05 |
Family
ID=35452479
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005175892A Active JP4786946B2 (ja) | 2004-06-16 | 2005-06-16 | 研磨中に混合伴流を促進するように配置された溝を有する研磨パッド |
Country Status (7)
Country | Link |
---|---|
US (2) | US6974372B1 (ja) |
JP (1) | JP4786946B2 (ja) |
KR (1) | KR101184628B1 (ja) |
CN (1) | CN100479992C (ja) |
DE (1) | DE102005023469A1 (ja) |
FR (1) | FR2871716B1 (ja) |
TW (1) | TWI353906B (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7377840B2 (en) * | 2004-07-21 | 2008-05-27 | Neopad Technologies Corporation | Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs |
US7704125B2 (en) | 2003-03-24 | 2010-04-27 | Nexplanar Corporation | Customized polishing pads for CMP and methods of fabrication and use thereof |
US8864859B2 (en) | 2003-03-25 | 2014-10-21 | Nexplanar Corporation | Customized polishing pads for CMP and methods of fabrication and use thereof |
US9278424B2 (en) | 2003-03-25 | 2016-03-08 | Nexplanar Corporation | Customized polishing pads for CMP and methods of fabrication and use thereof |
US7266568B1 (en) * | 2003-04-11 | 2007-09-04 | Ricoh Company, Ltd. | Techniques for storing multimedia information with source documents |
US6974372B1 (en) * | 2004-06-16 | 2005-12-13 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad having grooves configured to promote mixing wakes during polishing |
TWI385050B (zh) | 2005-02-18 | 2013-02-11 | Nexplanar Corp | 用於cmp之特製拋光墊及其製造方法及其用途 |
KR100721196B1 (ko) * | 2005-05-24 | 2007-05-23 | 주식회사 하이닉스반도체 | 연마패드 및 이를 이용한 화학적기계적연마장치 |
US7520798B2 (en) * | 2007-01-31 | 2009-04-21 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad with grooves to reduce slurry consumption |
US7311590B1 (en) | 2007-01-31 | 2007-12-25 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad with grooves to retain slurry on the pad texture |
JP5284610B2 (ja) * | 2007-08-20 | 2013-09-11 | 八千代マイクロサイエンス株式会社 | 両面ラップ盤用回転定盤 |
US9180570B2 (en) | 2008-03-14 | 2015-11-10 | Nexplanar Corporation | Grooved CMP pad |
TWI492818B (zh) * | 2011-07-12 | 2015-07-21 | Iv Technologies Co Ltd | 研磨墊、研磨方法以及研磨系統 |
US20140024299A1 (en) * | 2012-07-19 | 2014-01-23 | Wen-Chiang Tu | Polishing Pad and Multi-Head Polishing System |
TWI599447B (zh) | 2013-10-18 | 2017-09-21 | 卡博特微電子公司 | 具有偏移同心溝槽圖樣之邊緣排除區的cmp拋光墊 |
CN103769995B (zh) * | 2013-12-31 | 2017-01-25 | 于静 | 一种研磨下盘结构 |
TWI549781B (zh) * | 2015-08-07 | 2016-09-21 | 智勝科技股份有限公司 | 研磨墊、研磨系統及研磨方法 |
CN111941251A (zh) * | 2020-07-08 | 2020-11-17 | 上海新昇半导体科技有限公司 | 一种抛光垫、抛光设备及硅片的抛光方法 |
CN117862986B (zh) * | 2024-03-06 | 2024-05-10 | 长沙韶光芯材科技有限公司 | 一种玻璃基片研磨装置及研磨方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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BE398709A (ja) * | 1932-09-22 | |||
FR2365411A1 (fr) * | 1976-09-27 | 1978-04-21 | Robert Jean | Ponceuse a disque de papier abrasif monte sur un plateau circulaire tournant |
JPS63237865A (ja) * | 1987-03-25 | 1988-10-04 | Matsushima Kogyo Co Ltd | 回転式研磨機の定盤 |
US5690540A (en) * | 1996-02-23 | 1997-11-25 | Micron Technology, Inc. | Spiral grooved polishing pad for chemical-mechanical planarization of semiconductor wafers |
US5921855A (en) * | 1997-05-15 | 1999-07-13 | Applied Materials, Inc. | Polishing pad having a grooved pattern for use in a chemical mechanical polishing system |
US6273806B1 (en) | 1997-05-15 | 2001-08-14 | Applied Materials, Inc. | Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus |
US5990012A (en) | 1998-01-27 | 1999-11-23 | Micron Technology, Inc. | Chemical-mechanical polishing of hydrophobic materials by use of incorporated-particle polishing pads |
JPH11216663A (ja) | 1998-02-03 | 1999-08-10 | Sony Corp | 研磨パッド、研磨装置および研磨方法 |
US6315857B1 (en) | 1998-07-10 | 2001-11-13 | Mosel Vitelic, Inc. | Polishing pad shaping and patterning |
JP2000237950A (ja) * | 1999-02-18 | 2000-09-05 | Nec Corp | 半導体ウェハーの研磨パッド及び半導体装置の製造方法 |
US6328632B1 (en) | 1999-08-31 | 2001-12-11 | Micron Technology, Inc. | Polishing pads and planarizing machines for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies |
US20020068516A1 (en) * | 1999-12-13 | 2002-06-06 | Applied Materials, Inc | Apparatus and method for controlled delivery of slurry to a region of a polishing device |
US6656019B1 (en) * | 2000-06-29 | 2003-12-02 | International Business Machines Corporation | Grooved polishing pads and methods of use |
KR20020022198A (ko) | 2000-09-19 | 2002-03-27 | 윤종용 | 표면에 비 선형 트랙이 형성된 연마 패드를 구비하는화학적 기계적 연마 장치 |
KR100646702B1 (ko) * | 2001-08-16 | 2006-11-17 | 에스케이씨 주식회사 | 홀 및/또는 그루브로 형성된 화학적 기계적 연마패드 |
US6783436B1 (en) * | 2003-04-29 | 2004-08-31 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad with optimized grooves and method of forming same |
US6843711B1 (en) * | 2003-12-11 | 2005-01-18 | Rohm And Haas Electronic Materials Cmp Holdings, Inc | Chemical mechanical polishing pad having a process-dependent groove configuration |
US6843709B1 (en) * | 2003-12-11 | 2005-01-18 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing method for reducing slurry reflux |
US6955587B2 (en) * | 2004-01-30 | 2005-10-18 | Rohm And Haas Electronic Materials Cmp Holdings, Inc | Grooved polishing pad and method |
US6974372B1 (en) * | 2004-06-16 | 2005-12-13 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad having grooves configured to promote mixing wakes during polishing |
-
2004
- 2004-06-16 US US10/869,394 patent/US6974372B1/en not_active Expired - Lifetime
-
2005
- 2005-05-20 DE DE102005023469A patent/DE102005023469A1/de not_active Ceased
- 2005-05-23 TW TW094116738A patent/TWI353906B/zh active
- 2005-06-14 FR FR0551614A patent/FR2871716B1/fr not_active Expired - Fee Related
- 2005-06-15 KR KR1020050051594A patent/KR101184628B1/ko active IP Right Grant
- 2005-06-15 CN CNB2005100779488A patent/CN100479992C/zh not_active Expired - Fee Related
- 2005-06-16 JP JP2005175892A patent/JP4786946B2/ja active Active
- 2005-09-28 US US11/236,948 patent/US7108597B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6974372B1 (en) | 2005-12-13 |
US20060025061A1 (en) | 2006-02-02 |
FR2871716B1 (fr) | 2008-03-28 |
FR2871716A1 (fr) | 2005-12-23 |
JP2006007412A (ja) | 2006-01-12 |
US20050282479A1 (en) | 2005-12-22 |
KR101184628B1 (ko) | 2012-09-21 |
US7108597B2 (en) | 2006-09-19 |
TWI353906B (en) | 2011-12-11 |
DE102005023469A1 (de) | 2006-03-16 |
CN1712187A (zh) | 2005-12-28 |
TW200602157A (en) | 2006-01-16 |
CN100479992C (zh) | 2009-04-22 |
KR20060048390A (ko) | 2006-05-18 |
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