JP4785389B2 - 反射ミラー、露光装置及びデバイス製造方法 - Google Patents
反射ミラー、露光装置及びデバイス製造方法 Download PDFInfo
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- JP4785389B2 JP4785389B2 JP2005034108A JP2005034108A JP4785389B2 JP 4785389 B2 JP4785389 B2 JP 4785389B2 JP 2005034108 A JP2005034108 A JP 2005034108A JP 2005034108 A JP2005034108 A JP 2005034108A JP 4785389 B2 JP4785389 B2 JP 4785389B2
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- Polarising Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005034108A JP4785389B2 (ja) | 2005-02-10 | 2005-02-10 | 反射ミラー、露光装置及びデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005034108A JP4785389B2 (ja) | 2005-02-10 | 2005-02-10 | 反射ミラー、露光装置及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006220903A JP2006220903A (ja) | 2006-08-24 |
| JP2006220903A5 JP2006220903A5 (https=) | 2008-03-27 |
| JP4785389B2 true JP4785389B2 (ja) | 2011-10-05 |
Family
ID=36983272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005034108A Expired - Fee Related JP4785389B2 (ja) | 2005-02-10 | 2005-02-10 | 反射ミラー、露光装置及びデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4785389B2 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5311757B2 (ja) * | 2007-03-29 | 2013-10-09 | キヤノン株式会社 | 反射光学素子、露光装置およびデバイス製造方法 |
| JP2008257777A (ja) * | 2007-04-03 | 2008-10-23 | Topcon Corp | 光学部品 |
| US10067265B2 (en) | 2010-10-12 | 2018-09-04 | Toyota Motor Engineering & Manufacturing North America, Inc. | Semi-transparent reflectors |
| JP2014086579A (ja) * | 2012-10-19 | 2014-05-12 | Applied Materials Inc | 真空チャンバ用反射部材 |
| JP6236987B2 (ja) | 2013-08-23 | 2017-11-29 | ミツミ電機株式会社 | 光走査装置及び光走査ユニット |
| CN112505815A (zh) * | 2020-09-15 | 2021-03-16 | 中国科学院上海技术物理研究所 | 一种偏振调控分光镜 |
| JP2024104628A (ja) | 2023-01-24 | 2024-08-05 | キヤノン株式会社 | 投影光学系、露光装置、および物品製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2629693B2 (ja) * | 1987-02-26 | 1997-07-09 | 松下電器産業株式会社 | エキシマレーザ用ミラー |
| JPH1031106A (ja) * | 1996-07-18 | 1998-02-03 | Nikon Corp | 多波長用レーザーミラー |
| JP3976919B2 (ja) * | 1998-12-28 | 2007-09-19 | 日東光器株式会社 | 反射ミラー |
| JP2001337462A (ja) * | 2000-05-26 | 2001-12-07 | Nikon Corp | 露光装置、露光装置の製造方法、およびマイクロデバイスの製造方法 |
| JP2001338867A (ja) * | 2000-05-30 | 2001-12-07 | Nikon Corp | 照明装置、位置計測装置、並びに露光装置及び露光方法 |
-
2005
- 2005-02-10 JP JP2005034108A patent/JP4785389B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006220903A (ja) | 2006-08-24 |
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