JP4783928B2 - 窒素含有バナジウム被膜、その製造方法及び機械部材 - Google Patents
窒素含有バナジウム被膜、その製造方法及び機械部材 Download PDFInfo
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- JP4783928B2 JP4783928B2 JP2005101042A JP2005101042A JP4783928B2 JP 4783928 B2 JP4783928 B2 JP 4783928B2 JP 2005101042 A JP2005101042 A JP 2005101042A JP 2005101042 A JP2005101042 A JP 2005101042A JP 4783928 B2 JP4783928 B2 JP 4783928B2
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- Prior art keywords
- nitrogen
- vanadium
- coating
- containing vanadium
- sputtering
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Description
2 真空ポンプ
3 回転テーブル
5 治具
4 基材(被処理部材)
6 バナジウムターゲット
7 スパッタ電源
8 イオンボンバード及びバイアス電源
9 ガス導入パイプ
10 スパッタリング装置
Claims (5)
- バナジウムの被膜中にバナジウムの窒化物であるVxNy結晶が混在している、窒素含有バナジウム被膜。
- 前記VxNy結晶は、100原子当たり50〜99のバナジウム原子及び50〜1の窒素原子を含んでいる、請求項1に記載の窒素含有バナジウム被膜。
- アルゴンガスと窒素ガスからなる雰囲気中でバナジウムターゲットに高電圧を印加して前記バナジウムターゲットの近傍でグロー放電を生じさせ、室温より高く300℃より低い温度でスパッタリングを行い、これによって、バナジウムの被膜中にバナジウムの窒化物であるVxNy結晶が混在する窒素含有バナジウム被膜を基材の表面に形成する、窒素含有バナジウム被膜の製造方法。
- 前記スパッタリングを行う前にイオンボンバード処理を行う、請求項3に記載の窒素含有バナジウム被膜の製造方法。
- 請求項1又は2に記載の窒素含有バナジウム被膜を基材の表面に有する、機械部材。
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JP2005101042A JP4783928B2 (ja) | 2005-03-31 | 2005-03-31 | 窒素含有バナジウム被膜、その製造方法及び機械部材 |
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JP2005101042A JP4783928B2 (ja) | 2005-03-31 | 2005-03-31 | 窒素含有バナジウム被膜、その製造方法及び機械部材 |
Publications (2)
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JP2006283055A JP2006283055A (ja) | 2006-10-19 |
JP4783928B2 true JP4783928B2 (ja) | 2011-09-28 |
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Families Citing this family (1)
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CN102785422B (zh) * | 2012-08-17 | 2015-04-15 | 中国科学院宁波材料技术与工程研究所 | 一种氮化钒刀具涂层及其制备方法 |
Family Cites Families (5)
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JPS5392378A (en) * | 1976-12-29 | 1978-08-14 | Seiko Epson Corp | External parts for portable watches |
JPS646514A (en) * | 1987-06-30 | 1989-01-11 | Riken Kk | Sliding member |
JP3250966B2 (ja) * | 1996-12-04 | 2002-01-28 | 住友電気工業株式会社 | 被覆切削工具およびその製造方法 |
JP3954739B2 (ja) * | 1997-11-06 | 2007-08-08 | Dowaホールディングス株式会社 | 窒素含有Cr被膜の製造方法 |
JP4666788B2 (ja) * | 2001-02-26 | 2011-04-06 | 帝国ピストンリング株式会社 | 摺動部材及びその製造方法 |
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