JP4776891B2 - 照明光学系、露光装置、及びデバイス製造方法 - Google Patents

照明光学系、露光装置、及びデバイス製造方法 Download PDF

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Publication number
JP4776891B2
JP4776891B2 JP2004128602A JP2004128602A JP4776891B2 JP 4776891 B2 JP4776891 B2 JP 4776891B2 JP 2004128602 A JP2004128602 A JP 2004128602A JP 2004128602 A JP2004128602 A JP 2004128602A JP 4776891 B2 JP4776891 B2 JP 4776891B2
Authority
JP
Japan
Prior art keywords
optical system
light
exposure apparatus
polarization
illumination optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004128602A
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English (en)
Japanese (ja)
Other versions
JP2005311187A (ja
JP2005311187A5 (enExample
Inventor
堅一郎 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004128602A priority Critical patent/JP4776891B2/ja
Priority to CNA2008101463842A priority patent/CN101369103A/zh
Priority to CN2005100650138A priority patent/CN1690861B/zh
Priority to EP05252521A priority patent/EP1589379A3/en
Priority to US11/112,989 priority patent/US7206060B2/en
Priority to KR1020050033539A priority patent/KR100699955B1/ko
Priority to EP08166812A priority patent/EP2012183A3/en
Publication of JP2005311187A publication Critical patent/JP2005311187A/ja
Publication of JP2005311187A5 publication Critical patent/JP2005311187A5/ja
Application granted granted Critical
Publication of JP4776891B2 publication Critical patent/JP4776891B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G07—CHECKING-DEVICES
    • G07D—HANDLING OF COINS OR VALUABLE PAPERS, e.g. TESTING, SORTING BY DENOMINATIONS, COUNTING, DISPENSING, CHANGING OR DEPOSITING
    • G07D9/00—Counting coins; Handling of coins not provided for in the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Polarising Elements (AREA)
JP2004128602A 2004-04-23 2004-04-23 照明光学系、露光装置、及びデバイス製造方法 Expired - Fee Related JP4776891B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004128602A JP4776891B2 (ja) 2004-04-23 2004-04-23 照明光学系、露光装置、及びデバイス製造方法
CN2005100650138A CN1690861B (zh) 2004-04-23 2005-04-12 照明光学系、曝光装置、及器件制造方法
CNA2008101463842A CN101369103A (zh) 2004-04-23 2005-04-12 照明光学系、曝光装置、及器件制造方法
US11/112,989 US7206060B2 (en) 2004-04-23 2005-04-22 Illumination optical system, exposure apparatus, and device fabrication method with a polarizing element and an optical element with low birefringence
EP05252521A EP1589379A3 (en) 2004-04-23 2005-04-22 Optical illumination system, exposure apparatus and device fabrication method
KR1020050033539A KR100699955B1 (ko) 2004-04-23 2005-04-22 조명광학계, 노광장치 및 디바이스의 제조방법
EP08166812A EP2012183A3 (en) 2004-04-23 2005-04-22 Optical illumination system, exposure apparatus and device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004128602A JP4776891B2 (ja) 2004-04-23 2004-04-23 照明光学系、露光装置、及びデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008256977A Division JP2009065175A (ja) 2008-10-02 2008-10-02 照明光学系

Publications (3)

Publication Number Publication Date
JP2005311187A JP2005311187A (ja) 2005-11-04
JP2005311187A5 JP2005311187A5 (enExample) 2008-11-20
JP4776891B2 true JP4776891B2 (ja) 2011-09-21

Family

ID=34940974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004128602A Expired - Fee Related JP4776891B2 (ja) 2004-04-23 2004-04-23 照明光学系、露光装置、及びデバイス製造方法

Country Status (5)

Country Link
US (1) US7206060B2 (enExample)
EP (2) EP1589379A3 (enExample)
JP (1) JP4776891B2 (enExample)
KR (1) KR100699955B1 (enExample)
CN (2) CN1690861B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
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EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TWI511179B (zh) 2003-10-28 2015-12-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) * 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
EP1716457B9 (en) 2004-01-16 2012-04-04 Carl Zeiss SMT GmbH Projection system with a polarization-modulating element having a variable thickness profile
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
JP4776891B2 (ja) 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
JP2007220767A (ja) * 2006-02-15 2007-08-30 Canon Inc 露光装置及びデバイス製造方法
JP2007258575A (ja) * 2006-03-24 2007-10-04 Canon Inc 照明装置、当該照明装置を有する露光装置及びデバイス製造方法
JP4752695B2 (ja) * 2006-09-15 2011-08-17 ソニー株式会社 マスクパターン補正方法，マスクパターン補正装置およびそのプログラム
US7817250B2 (en) 2007-07-18 2010-10-19 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
DE102007043958B4 (de) 2007-09-14 2011-08-25 Carl Zeiss SMT GmbH, 73447 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
TW200938957A (en) * 2008-03-05 2009-09-16 Nanya Technology Corp Feedback system and feedback method for controlling power ratio of light source
JP5167032B2 (ja) 2008-08-27 2013-03-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2009065175A (ja) * 2008-10-02 2009-03-26 Canon Inc 照明光学系
JP5688672B2 (ja) * 2009-02-17 2015-03-25 株式会社ニコン 光伝送装置、照明光学系、露光装置、およびデバイス製造方法
JP5511882B2 (ja) * 2012-04-19 2014-06-04 ギガフォトン株式会社 極端紫外光源装置
WO2018229854A1 (ja) * 2017-06-13 2018-12-20 ギガフォトン株式会社 レーザ装置及び光学素子の製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2884947B2 (ja) * 1992-10-01 1999-04-19 株式会社ニコン 投影露光装置、露光方法および半導体集積回路の製造方法
JP3322274B2 (ja) * 1992-10-29 2002-09-09 株式会社ニコン 投影露光方法及び投影露光装置
JP3189993B2 (ja) 1993-10-14 2001-07-16 日本電信電話株式会社 多地点間音声通信端末
KR20010042098A (ko) * 1998-03-24 2001-05-25 오노 시게오 조명 장치, 노광 방법 및 장치와 디바이스 제조 방법
JP3985346B2 (ja) * 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
JP4065923B2 (ja) * 1998-09-29 2008-03-26 株式会社ニコン 照明装置及び該照明装置を備えた投影露光装置、該照明装置による投影露光方法、及び該投影露光装置の調整方法
AU1891200A (en) * 1999-01-06 2000-07-24 Nikon Corporation Projection optical system, method for producing the same, and projection exposure apparatus using the same
WO2000067303A1 (en) * 1999-04-28 2000-11-09 Nikon Corporation Exposure method and apparatus
US6410192B1 (en) * 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
JP3639807B2 (ja) * 2001-06-27 2005-04-20 キヤノン株式会社 光学素子及び製造方法
KR100908587B1 (ko) * 2001-07-17 2009-07-22 가부시키가이샤 니콘 광학 부재의 제조 방법
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法
US7251029B2 (en) * 2002-07-01 2007-07-31 Canon Kabushiki Kaisha Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus
JP4095376B2 (ja) * 2002-08-28 2008-06-04 キヤノン株式会社 露光装置及び方法、並びに、デバイス製造方法
JP4189724B2 (ja) 2002-09-09 2008-12-03 株式会社ニコン 露光装置および露光方法
JP2004128602A (ja) 2002-09-30 2004-04-22 Canon Inc 画像編集方法、画像編集装置、プログラム及び記録媒体
US6975765B2 (en) * 2003-05-06 2005-12-13 New Light Industries, Ltd. Optically variable form birefringent structure and method and system and method for reading same
JP4776891B2 (ja) 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法

Also Published As

Publication number Publication date
US7206060B2 (en) 2007-04-17
JP2005311187A (ja) 2005-11-04
KR20060047407A (ko) 2006-05-18
EP1589379A3 (en) 2008-04-09
EP1589379A2 (en) 2005-10-26
US20050237527A1 (en) 2005-10-27
EP2012183A3 (en) 2011-11-02
EP2012183A8 (en) 2010-06-23
CN101369103A (zh) 2009-02-18
KR100699955B1 (ko) 2007-03-27
EP2012183A2 (en) 2009-01-07
CN1690861B (zh) 2011-11-23
CN1690861A (zh) 2005-11-02

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