JP4767605B2 - ハース機構及び成膜装置 - Google Patents

ハース機構及び成膜装置 Download PDF

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Publication number
JP4767605B2
JP4767605B2 JP2005197709A JP2005197709A JP4767605B2 JP 4767605 B2 JP4767605 B2 JP 4767605B2 JP 2005197709 A JP2005197709 A JP 2005197709A JP 2005197709 A JP2005197709 A JP 2005197709A JP 4767605 B2 JP4767605 B2 JP 4767605B2
Authority
JP
Japan
Prior art keywords
hearth
film forming
push
solid film
holding position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005197709A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007016269A (ja
Inventor
喜信 村上
秀彦 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP2005197709A priority Critical patent/JP4767605B2/ja
Priority to KR1020060058847A priority patent/KR100847684B1/ko
Priority to TW095124525A priority patent/TW200710238A/zh
Publication of JP2007016269A publication Critical patent/JP2007016269A/ja
Application granted granted Critical
Publication of JP4767605B2 publication Critical patent/JP4767605B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
    • F04D17/08—Centrifugal pumps
    • F04D17/16—Centrifugal pumps for displacing without appreciable compression
    • F04D17/168—Pumps specially adapted to produce a vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
JP2005197709A 2005-07-06 2005-07-06 ハース機構及び成膜装置 Expired - Fee Related JP4767605B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005197709A JP4767605B2 (ja) 2005-07-06 2005-07-06 ハース機構及び成膜装置
KR1020060058847A KR100847684B1 (ko) 2005-07-06 2006-06-28 허스 기구 및 성막장치
TW095124525A TW200710238A (en) 2005-07-06 2006-07-05 Furnace wall mechanism and film deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005197709A JP4767605B2 (ja) 2005-07-06 2005-07-06 ハース機構及び成膜装置

Publications (2)

Publication Number Publication Date
JP2007016269A JP2007016269A (ja) 2007-01-25
JP4767605B2 true JP4767605B2 (ja) 2011-09-07

Family

ID=37753686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005197709A Expired - Fee Related JP4767605B2 (ja) 2005-07-06 2005-07-06 ハース機構及び成膜装置

Country Status (3)

Country Link
JP (1) JP4767605B2 (ko)
KR (1) KR100847684B1 (ko)
TW (1) TW200710238A (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4633816B2 (ja) * 2008-03-31 2011-02-16 株式会社フェローテック ターゲット交換式プラズマ発生装置
JP6009220B2 (ja) * 2012-05-21 2016-10-19 住友重機械工業株式会社 成膜装置
TWI503433B (zh) * 2013-10-08 2015-10-11 不二越股份有限公司 成膜裝置及成膜方法
JP7034976B2 (ja) * 2019-03-18 2022-03-14 Ｔｏｗａ株式会社 ワーク保持部及びワーク保持部回転ユニット

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4048462A (en) 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
JPS6169963A (ja) 1984-09-14 1986-04-10 Anelva Corp 蒸着用電子銃装置
US5186975A (en) 1987-10-14 1993-02-16 Enichem S.P.A. Process and machinery for step-and-repeat vacuum-deposition of large-area thin-film-electronics matrix-circuits on monolithic glass panes through small perforated metal masks
US5324366A (en) 1991-08-09 1994-06-28 Caterpillar Inc. Heat treat furnace system for performing different carburizing processes simultaneously
JP3189042B2 (ja) * 1997-07-24 2001-07-16 住友重機械工業株式会社 真空成膜の材料供給装置

Also Published As

Publication number Publication date
TWI340176B (ko) 2011-04-11
TW200710238A (en) 2007-03-16
KR100847684B1 (ko) 2008-07-23
KR20070005484A (ko) 2007-01-10
JP2007016269A (ja) 2007-01-25

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