JP4757474B2 - 有機薄膜形成方法 - Google Patents
有機薄膜形成方法 Download PDFInfo
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- JP4757474B2 JP4757474B2 JP2004301024A JP2004301024A JP4757474B2 JP 4757474 B2 JP4757474 B2 JP 4757474B2 JP 2004301024 A JP2004301024 A JP 2004301024A JP 2004301024 A JP2004301024 A JP 2004301024A JP 4757474 B2 JP4757474 B2 JP 4757474B2
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- thin film
- organic thin
- metal
- atom
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- 238000000034 method Methods 0.000 title claims description 107
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- 229910052751 metal Inorganic materials 0.000 claims description 102
- 239000002184 metal Substances 0.000 claims description 102
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 86
- 239000000758 substrate Substances 0.000 claims description 56
- 239000003960 organic solvent Substances 0.000 claims description 39
- 239000010408 film Substances 0.000 claims description 37
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 35
- 150000003839 salts Chemical class 0.000 claims description 33
- 239000002904 solvent Substances 0.000 claims description 33
- 125000001424 substituent group Chemical group 0.000 claims description 31
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- 125000000217 alkyl group Chemical group 0.000 claims description 25
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 23
- 229910052710 silicon Inorganic materials 0.000 claims description 23
- 229910052731 fluorine Inorganic materials 0.000 claims description 21
- 125000001153 fluoro group Chemical group F* 0.000 claims description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
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- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
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| CN101495246A (zh) * | 2006-07-31 | 2009-07-29 | 日本曹达株式会社 | 使用膜物性改善处理方法制成的有机薄膜的制造方法 |
| JP4931518B2 (ja) * | 2006-08-31 | 2012-05-16 | 大阪瓦斯株式会社 | 皮膜を有する部材及び皮膜形成方法 |
| JP2008104936A (ja) * | 2006-10-25 | 2008-05-08 | National Institute Of Advanced Industrial & Technology | 超撥水性アルミ箔及びその製造方法 |
| WO2008059840A1 (fr) | 2006-11-13 | 2008-05-22 | Nippon Soda Co., Ltd. | Procédé de formation d'un film mince organique |
| JP4971037B2 (ja) * | 2007-01-10 | 2012-07-11 | 日本曹達株式会社 | 水分調整法及びそれを利用した有機薄膜形成方法 |
| JP5286266B2 (ja) * | 2007-07-24 | 2013-09-11 | 日本曹達株式会社 | 有機薄膜の基材への作製方法 |
| CN105968131A (zh) * | 2016-05-04 | 2016-09-28 | 厦门建霖工业有限公司 | 一种含氟超疏水疏油剂及应用 |
| JP7484208B2 (ja) * | 2020-02-14 | 2024-05-16 | Dic株式会社 | ウレタン樹脂組成物、及び、多孔体の製造方法 |
| CN113372109B (zh) * | 2021-05-18 | 2022-12-13 | 景德镇陶瓷大学 | 一种大面积无缺陷纳米量级厚度致密陶瓷薄膜的制备方法及其制得的陶瓷薄膜 |
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| JP2665961B2 (ja) * | 1988-12-20 | 1997-10-22 | ナトコペイント株式会社 | 被膜形成方法 |
| JP3666915B2 (ja) * | 1993-12-17 | 2005-06-29 | Ａｚエレクトロニックマテリアルズ株式会社 | セラミックスの低温形成方法 |
| WO1998053921A1 (de) * | 1997-05-28 | 1998-12-03 | Global Surface Aktiengesellschaft | Verfahren zum beschichten einer oberfläche |
| JP2003080694A (ja) * | 2001-06-26 | 2003-03-19 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体 |
| US7422642B2 (en) * | 2002-03-12 | 2008-09-09 | Nippon Soda Co., Ltd. | Method for preparing chemical adsorption film and solution for preparing chemical adsorption film used in the method |
| PL1621258T3 (pl) * | 2003-04-15 | 2011-12-30 | Nippon Soda Co | Sposób wytwarzania cienkich folii organicznych |
| JP2004349639A (ja) * | 2003-05-26 | 2004-12-09 | Seiko Epson Corp | パターンの形成方法及びパターン形成装置、デバイスの製造方法、電気光学装置及び電子機器 |
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