JP2006110476A5 - - Google Patents
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- Publication number
- JP2006110476A5 JP2006110476A5 JP2004301024A JP2004301024A JP2006110476A5 JP 2006110476 A5 JP2006110476 A5 JP 2006110476A5 JP 2004301024 A JP2004301024 A JP 2004301024A JP 2004301024 A JP2004301024 A JP 2004301024A JP 2006110476 A5 JP2006110476 A5 JP 2006110476A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- metal
- thin film
- organic thin
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000010409 thin film Substances 0.000 claims 27
- 229910052751 metal Inorganic materials 0.000 claims 26
- 239000002184 metal Substances 0.000 claims 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 10
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 8
- 229910044991 metal oxide Inorganic materials 0.000 claims 8
- 150000004706 metal oxides Chemical class 0.000 claims 8
- 150000003839 salts Chemical class 0.000 claims 8
- 125000001424 substituent group Chemical group 0.000 claims 8
- 239000004094 surface-active agent Substances 0.000 claims 8
- 229910052731 fluorine Inorganic materials 0.000 claims 6
- 239000002904 solvent Substances 0.000 claims 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 6
- 230000015572 biosynthetic process Effects 0.000 claims 5
- 239000004215 Carbon black (E152) Substances 0.000 claims 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 239000011737 fluorine Substances 0.000 claims 4
- 229930195733 hydrocarbon Natural products 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 125000005647 linker group Chemical group 0.000 claims 4
- 150000002736 metal compounds Chemical class 0.000 claims 4
- 229910000000 metal hydroxide Inorganic materials 0.000 claims 4
- 150000004692 metal hydroxides Chemical class 0.000 claims 4
- 239000002082 metal nanoparticle Substances 0.000 claims 4
- 239000003960 organic solvent Substances 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
- 125000004423 acyloxy group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 125000004429 atom Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 claims 2
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 claims 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 2
- 150000008282 halocarbons Chemical group 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 150000002430 hydrocarbons Chemical class 0.000 claims 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims 2
- 229920001296 polysiloxane Polymers 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- 239000010408 film Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004301024A JP4757474B2 (ja) | 2004-10-15 | 2004-10-15 | 有機薄膜形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004301024A JP4757474B2 (ja) | 2004-10-15 | 2004-10-15 | 有機薄膜形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006110476A JP2006110476A (ja) | 2006-04-27 |
| JP2006110476A5 true JP2006110476A5 (https=) | 2007-08-16 |
| JP4757474B2 JP4757474B2 (ja) | 2011-08-24 |
Family
ID=36379429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004301024A Expired - Fee Related JP4757474B2 (ja) | 2004-10-15 | 2004-10-15 | 有機薄膜形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4757474B2 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101495246A (zh) * | 2006-07-31 | 2009-07-29 | 日本曹达株式会社 | 使用膜物性改善处理方法制成的有机薄膜的制造方法 |
| JP4931518B2 (ja) * | 2006-08-31 | 2012-05-16 | 大阪瓦斯株式会社 | 皮膜を有する部材及び皮膜形成方法 |
| JP2008104936A (ja) * | 2006-10-25 | 2008-05-08 | National Institute Of Advanced Industrial & Technology | 超撥水性アルミ箔及びその製造方法 |
| WO2008059840A1 (fr) | 2006-11-13 | 2008-05-22 | Nippon Soda Co., Ltd. | Procédé de formation d'un film mince organique |
| JP4971037B2 (ja) * | 2007-01-10 | 2012-07-11 | 日本曹達株式会社 | 水分調整法及びそれを利用した有機薄膜形成方法 |
| JP5286266B2 (ja) * | 2007-07-24 | 2013-09-11 | 日本曹達株式会社 | 有機薄膜の基材への作製方法 |
| CN105968131A (zh) * | 2016-05-04 | 2016-09-28 | 厦门建霖工业有限公司 | 一种含氟超疏水疏油剂及应用 |
| JP7484208B2 (ja) * | 2020-02-14 | 2024-05-16 | Dic株式会社 | ウレタン樹脂組成物、及び、多孔体の製造方法 |
| CN113372109B (zh) * | 2021-05-18 | 2022-12-13 | 景德镇陶瓷大学 | 一种大面积无缺陷纳米量级厚度致密陶瓷薄膜的制备方法及其制得的陶瓷薄膜 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2665961B2 (ja) * | 1988-12-20 | 1997-10-22 | ナトコペイント株式会社 | 被膜形成方法 |
| JP3666915B2 (ja) * | 1993-12-17 | 2005-06-29 | Ａｚエレクトロニックマテリアルズ株式会社 | セラミックスの低温形成方法 |
| WO1998053921A1 (de) * | 1997-05-28 | 1998-12-03 | Global Surface Aktiengesellschaft | Verfahren zum beschichten einer oberfläche |
| JP2003080694A (ja) * | 2001-06-26 | 2003-03-19 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体 |
| US7422642B2 (en) * | 2002-03-12 | 2008-09-09 | Nippon Soda Co., Ltd. | Method for preparing chemical adsorption film and solution for preparing chemical adsorption film used in the method |
| PL1621258T3 (pl) * | 2003-04-15 | 2011-12-30 | Nippon Soda Co | Sposób wytwarzania cienkich folii organicznych |
| JP2004349639A (ja) * | 2003-05-26 | 2004-12-09 | Seiko Epson Corp | パターンの形成方法及びパターン形成装置、デバイスの製造方法、電気光学装置及び電子機器 |
-
2004
- 2004-10-15 JP JP2004301024A patent/JP4757474B2/ja not_active Expired - Fee Related
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