JP4750396B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4750396B2
JP4750396B2 JP2004278643A JP2004278643A JP4750396B2 JP 4750396 B2 JP4750396 B2 JP 4750396B2 JP 2004278643 A JP2004278643 A JP 2004278643A JP 2004278643 A JP2004278643 A JP 2004278643A JP 4750396 B2 JP4750396 B2 JP 4750396B2
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JP
Japan
Prior art keywords
light
exposure apparatus
optical system
spatial
modulator
Prior art date
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Expired - Fee Related
Application number
JP2004278643A
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English (en)
Japanese (ja)
Other versions
JP2006093487A (ja
JP2006093487A5 (enExample
Inventor
徳行 本多
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004278643A priority Critical patent/JP4750396B2/ja
Priority to US11/237,486 priority patent/US7239372B2/en
Publication of JP2006093487A publication Critical patent/JP2006093487A/ja
Publication of JP2006093487A5 publication Critical patent/JP2006093487A5/ja
Application granted granted Critical
Publication of JP4750396B2 publication Critical patent/JP4750396B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0482—Interference based printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00—Active addressable light modulator
    • G03H2225/20—Nature, e.g. e-beam addressed
    • G03H2225/24—Having movable pixels, e.g. microelectromechanical systems [MEMS]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00—Active addressable light modulator
    • G03H2225/30—Modulation
    • G03H2225/32—Phase only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004278643A 2004-09-27 2004-09-27 露光装置及びデバイス製造方法 Expired - Fee Related JP4750396B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004278643A JP4750396B2 (ja) 2004-09-27 2004-09-27 露光装置及びデバイス製造方法
US11/237,486 US7239372B2 (en) 2004-09-27 2005-09-27 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004278643A JP4750396B2 (ja) 2004-09-27 2004-09-27 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006093487A JP2006093487A (ja) 2006-04-06
JP2006093487A5 JP2006093487A5 (enExample) 2007-10-18
JP4750396B2 true JP4750396B2 (ja) 2011-08-17

Family

ID=36125173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004278643A Expired - Fee Related JP4750396B2 (ja) 2004-09-27 2004-09-27 露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7239372B2 (enExample)
JP (1) JP4750396B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7286277B2 (en) * 2004-11-26 2007-10-23 Alces Technology, Inc. Polarization light modulator
US7379247B2 (en) * 2005-05-23 2008-05-27 Olympus Imaging Corp. Image pickup apparatus
KR20130079603A (ko) * 2006-07-06 2013-07-10 가부시키가이샤 니콘 광학 디바이스, 노광 장치, 및 디바이스 제조 방법
US7768627B2 (en) * 2007-06-14 2010-08-03 Asml Netherlands B.V. Illumination of a patterning device based on interference for use in a maskless lithography system
DE102007043958B4 (de) 2007-09-14 2011-08-25 Carl Zeiss SMT GmbH, 73447 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
JPWO2010024106A1 (ja) * 2008-08-28 2012-01-26 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
US9025136B2 (en) * 2008-09-23 2015-05-05 Applied Materials, Inc. System and method for manufacturing three dimensional integrated circuits
JP2010182934A (ja) * 2009-02-06 2010-08-19 Dainippon Screen Mfg Co Ltd 描画装置および描画方法
JP5842615B2 (ja) * 2010-02-03 2016-01-13 株式会社ニコン 照明光学装置、照明方法、並びに露光方法及び装置
WO2017011188A1 (en) * 2015-07-13 2017-01-19 Applied Materials, Inc. Quarter wave light splitting
JP2021500599A (ja) * 2017-10-23 2021-01-07 シャンハイ ビーシゥフー エンタープライズ マネージメント カンパニー リミテッドＳｈａｎｇｈａｉ Ｂｉｘｉｕｆｕ Ｅｎｔｅｒｐｒｉｓｅ Ｍａｎａｇｅｍｅｎｔ Ｃｏ．， Ｌｔｄ． 光生成方法及びシステム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0821531B2 (ja) 1986-08-29 1996-03-04 株式会社ニコン 投影光学装置
EP0610183B1 (de) 1991-10-30 1995-05-10 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
US5311360A (en) 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
JPH06102459A (ja) * 1992-09-17 1994-04-15 Dainippon Screen Mfg Co Ltd 光変調装置およびそれを備えた画像記録装置
US5841579A (en) 1995-06-07 1998-11-24 Silicon Light Machines Flat diffraction grating light valve
US6133986A (en) 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
JP3550861B2 (ja) * 1996-03-19 2004-08-04 松下電器産業株式会社 光偏向装置
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
JP3881865B2 (ja) * 2001-10-19 2007-02-14 株式会社 液晶先端技術開発センター 光学的な記録装置及び方法並びに露光装置及び方法
JP2004184921A (ja) * 2002-12-06 2004-07-02 Fuji Photo Film Co Ltd 露光装置
JP2004268345A (ja) * 2003-03-06 2004-09-30 Canon Inc 画像形成装置

Also Published As

Publication number Publication date
JP2006093487A (ja) 2006-04-06
US20060072094A1 (en) 2006-04-06
US7239372B2 (en) 2007-07-03

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