JP2006093487A5 - - Google Patents

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Publication number
JP2006093487A5
JP2006093487A5 JP2004278643A JP2004278643A JP2006093487A5 JP 2006093487 A5 JP2006093487 A5 JP 2006093487A5 JP 2004278643 A JP2004278643 A JP 2004278643A JP 2004278643 A JP2004278643 A JP 2004278643A JP 2006093487 A5 JP2006093487 A5 JP 2006093487A5
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JP
Japan
Prior art keywords
light
exposure apparatus
optical path
pixels
light modulator
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Application number
JP2004278643A
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English (en)
Japanese (ja)
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JP2006093487A (ja
JP4750396B2 (ja
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Priority to JP2004278643A priority Critical patent/JP4750396B2/ja
Priority claimed from JP2004278643A external-priority patent/JP4750396B2/ja
Priority to US11/237,486 priority patent/US7239372B2/en
Publication of JP2006093487A publication Critical patent/JP2006093487A/ja
Publication of JP2006093487A5 publication Critical patent/JP2006093487A5/ja
Application granted granted Critical
Publication of JP4750396B2 publication Critical patent/JP4750396B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004278643A 2004-09-27 2004-09-27 露光装置及びデバイス製造方法 Expired - Fee Related JP4750396B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004278643A JP4750396B2 (ja) 2004-09-27 2004-09-27 露光装置及びデバイス製造方法
US11/237,486 US7239372B2 (en) 2004-09-27 2005-09-27 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004278643A JP4750396B2 (ja) 2004-09-27 2004-09-27 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006093487A JP2006093487A (ja) 2006-04-06
JP2006093487A5 true JP2006093487A5 (enExample) 2007-10-18
JP4750396B2 JP4750396B2 (ja) 2011-08-17

Family

ID=36125173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004278643A Expired - Fee Related JP4750396B2 (ja) 2004-09-27 2004-09-27 露光装置及びデバイス製造方法

Country Status (2)

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US (1) US7239372B2 (enExample)
JP (1) JP4750396B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7286277B2 (en) * 2004-11-26 2007-10-23 Alces Technology, Inc. Polarization light modulator
US7379247B2 (en) * 2005-05-23 2008-05-27 Olympus Imaging Corp. Image pickup apparatus
KR20130079603A (ko) * 2006-07-06 2013-07-10 가부시키가이샤 니콘 광학 디바이스, 노광 장치, 및 디바이스 제조 방법
US7768627B2 (en) * 2007-06-14 2010-08-03 Asml Netherlands B.V. Illumination of a patterning device based on interference for use in a maskless lithography system
DE102007043958B4 (de) 2007-09-14 2011-08-25 Carl Zeiss SMT GmbH, 73447 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
JPWO2010024106A1 (ja) * 2008-08-28 2012-01-26 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
US9025136B2 (en) * 2008-09-23 2015-05-05 Applied Materials, Inc. System and method for manufacturing three dimensional integrated circuits
JP2010182934A (ja) * 2009-02-06 2010-08-19 Dainippon Screen Mfg Co Ltd 描画装置および描画方法
JP5842615B2 (ja) * 2010-02-03 2016-01-13 株式会社ニコン 照明光学装置、照明方法、並びに露光方法及び装置
WO2017011188A1 (en) * 2015-07-13 2017-01-19 Applied Materials, Inc. Quarter wave light splitting
JP2021500599A (ja) * 2017-10-23 2021-01-07 シャンハイ ビーシゥフー エンタープライズ マネージメント カンパニー リミテッドＳｈａｎｇｈａｉ Ｂｉｘｉｕｆｕ Ｅｎｔｅｒｐｒｉｓｅ Ｍａｎａｇｅｍｅｎｔ Ｃｏ．， Ｌｔｄ． 光生成方法及びシステム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0821531B2 (ja) 1986-08-29 1996-03-04 株式会社ニコン 投影光学装置
EP0610183B1 (de) 1991-10-30 1995-05-10 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
US5311360A (en) 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
JPH06102459A (ja) * 1992-09-17 1994-04-15 Dainippon Screen Mfg Co Ltd 光変調装置およびそれを備えた画像記録装置
US5841579A (en) 1995-06-07 1998-11-24 Silicon Light Machines Flat diffraction grating light valve
US6133986A (en) 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
JP3550861B2 (ja) * 1996-03-19 2004-08-04 松下電器産業株式会社 光偏向装置
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
JP3881865B2 (ja) * 2001-10-19 2007-02-14 株式会社 液晶先端技術開発センター 光学的な記録装置及び方法並びに露光装置及び方法
JP2004184921A (ja) * 2002-12-06 2004-07-02 Fuji Photo Film Co Ltd 露光装置
JP2004268345A (ja) * 2003-03-06 2004-09-30 Canon Inc 画像形成装置

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