JP4738012B2 - 高速なモデルに基づく光学的近接効果補正 - Google Patents

高速なモデルに基づく光学的近接効果補正 Download PDF

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Publication number
JP4738012B2
JP4738012B2 JP2005039330A JP2005039330A JP4738012B2 JP 4738012 B2 JP4738012 B2 JP 4738012B2 JP 2005039330 A JP2005039330 A JP 2005039330A JP 2005039330 A JP2005039330 A JP 2005039330A JP 4738012 B2 JP4738012 B2 JP 4738012B2
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Prior art keywords
image
resist
equation
generalized
mask
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JP2005039330A
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English (en)
Japanese (ja)
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JP2005234571A5 (https=
JP2005234571A (ja
Inventor
アラン・イー・ローゼンブルース
グレッグ・エム・ギャラティン
ロナルド・エル・ゴードン
ナクコン・ソン
アレクセイ・ワイ・ルヴォフ
ウィリアム・ディー・ヒンズバーグ
ジョン・エイ・ホーフナグル
フランシス・エイ・ハウル
マーサ・アイ・サンチェス
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International Business Machines Corp
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International Business Machines Corp
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2005039330A 2004-02-20 2005-02-16 高速なモデルに基づく光学的近接効果補正 Expired - Fee Related JP4738012B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/783,938 US7079223B2 (en) 2004-02-20 2004-02-20 Fast model-based optical proximity correction
US10/783938 2004-02-20

Publications (3)

Publication Number Publication Date
JP2005234571A JP2005234571A (ja) 2005-09-02
JP2005234571A5 JP2005234571A5 (https=) 2007-04-12
JP4738012B2 true JP4738012B2 (ja) 2011-08-03

Family

ID=34861375

Family Applications (1)

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JP2005039330A Expired - Fee Related JP4738012B2 (ja) 2004-02-20 2005-02-16 高速なモデルに基づく光学的近接効果補正

Country Status (2)

Country Link
US (1) US7079223B2 (https=)
JP (1) JP4738012B2 (https=)

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US20050185159A1 (en) 2005-08-25
US7079223B2 (en) 2006-07-18
JP2005234571A (ja) 2005-09-02

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