JP4723175B2 - 半導体素子 - Google Patents
半導体素子 Download PDFInfo
- Publication number
- JP4723175B2 JP4723175B2 JP2003309841A JP2003309841A JP4723175B2 JP 4723175 B2 JP4723175 B2 JP 4723175B2 JP 2003309841 A JP2003309841 A JP 2003309841A JP 2003309841 A JP2003309841 A JP 2003309841A JP 4723175 B2 JP4723175 B2 JP 4723175B2
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- JP
- Japan
- Prior art keywords
- partial region
- layer
- region
- semiconductor substrate
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/00182—Arrangements of deformable or non-deformable structures, e.g. membrane and cavity for use in a transducer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0264—Pressure sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0127—Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0315—Cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0353—Holes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0111—Bulk micromachining
- B81C2201/0115—Porous silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
- B81C2201/0176—Chemical vapour Deposition
- B81C2201/0177—Epitaxy, i.e. homo-epitaxy, hetero-epitaxy, GaAs-epitaxy
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Pressure Sensors (AREA)
- Measuring Fluid Pressure (AREA)
- Semiconductor Lasers (AREA)
Description
102 マスク層
103 カバーされていない領域
104 上側のシリコン層(低い気孔率)
105 下側のシリコン層(高い気孔率)
110 カバー部(カバー領域)
120 多孔性の層
121,122 部分層
129 空洞
130 フレーム/縁部(ラント)
140 ダイヤフラム領域
150 被覆層
201 中空室ないし空洞
301 センサダイヤフラム
Claims (10)
- 少なくとも半導体基板(101)と、該半導体基板の上(101)に前記半導体基板の多孔性のシリコン材料の転移によって形成された中空室(129)と、該中空室(129)の上に前記半導体基板の多孔性のシリコン材料の転移によって形成された被覆層(150)とを備える半導体素子において、
前記被覆層(150)は第1の部分領域(122)と第2の部分領域(121,125,126)を有しており、
前記第1の部分領域(122)における前記転移前の孔構造は、実質的に前記半導体基板の主平面に対して垂直方向に配向されており、かつ
前記第2の部分領域(121,125,126)における前記転移前の孔構造は、実質的に前記半導体基板の主平面に対して平行に配向されている
ことを特徴とする半導体素子。 - 前記第2の部分領域(121,125,126)における前記転移前の孔構造は、前記第1の部分領域(122)における前記転移前の孔構造より高い多孔性に設定されている
請求項1記載の半導体素子。 - 前記半導体基板(101)はシリコンである
請求項1または2記載の半導体素子。 - 前記被覆層(150)の上方にダイヤフラム層(140)が設けられている
請求項1から3までのいずれか1項記載の半導体素子。 - 請求項1から4までのいずれか1項記載の半導体素子を用いた圧力センサ。
- 少なくとも半導体基板(101)と中空室(129)と被覆層(150)とを備える半導体素子の製造方法であって、
前記中空室(129)が、前記半導体基板(101)の上に前記半導体基板の多孔性のシリコン材料の転移によって形成されるステップと、
前記被覆層(150)が、前記中空室(129)の上に前記半導体基板の多孔性のシリコン材料の転移によって形成されるステップ
とを有する半導体素子の製造方法において、
第1の部分領域(122)と第2の部分領域(121,125,126)とを有する前記被覆層(150)の前記第2の部分領域をカバー部(110)で被覆した後に前記被覆層(150)を形成するステップを有することにより、孔が前記カバー部(110)の下方ではラテラルに形成される、
ことを特徴とする半導体素子の製造方法。 - 第2の部分領域(121,125,126)は第1の部分領域(122)より僅かなドーピング度を有しているので、第2の部分領域(121,125,126)における孔は第1の部分領域(122)における孔より小さい
請求項6記載の方法。 - カバー部(110)はラインまたは点ないし小さな正方形において設けられている
請求項6または7記載の方法。 - カバー部(110)と第2の部分領域(121,125,126)とのオーバーラップする部分の幅方向の長さは、第1の部分領域(122)の厚さと同じ長さで設定されている
請求項6から8のいずれか1項記載の方法。 - 第2の部分領域(121,125,126)をカバーするカバー部(110)の幅方向の長さは、5〜10μmである
請求項6から8のいずれか1項記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10241066A DE10241066A1 (de) | 2002-09-05 | 2002-09-05 | Halbleiterbauelement und Verfahren |
DE10241066.6 | 2002-09-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004101524A JP2004101524A (ja) | 2004-04-02 |
JP4723175B2 true JP4723175B2 (ja) | 2011-07-13 |
Family
ID=31502413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003309841A Expired - Fee Related JP4723175B2 (ja) | 2002-09-05 | 2003-09-02 | 半導体素子 |
Country Status (4)
Country | Link |
---|---|
US (1) | US6972447B2 (ja) |
EP (1) | EP1396469A3 (ja) |
JP (1) | JP4723175B2 (ja) |
DE (1) | DE10241066A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10138759A1 (de) * | 2001-08-07 | 2003-03-06 | Bosch Gmbh Robert | Verfahren zur Herstellung eines Halbleiterbauelements sowie Halbleiterbauelement, insbesondere Membransensor |
US7368313B2 (en) * | 2004-02-17 | 2008-05-06 | Robert Bosch Gmbh | Method of making a differential pressure sensor |
US20060027459A1 (en) * | 2004-05-28 | 2006-02-09 | Lake Shore Cryotronics, Inc. | Mesoporous silicon infrared filters and methods of making same |
DE102005042648B4 (de) * | 2005-09-08 | 2007-06-21 | Robert Bosch Gmbh | Verfahren zur Herstellung von kommunizierenden Hohlräumen |
DE102008003792A1 (de) | 2008-01-10 | 2009-07-16 | Robert Bosch Gmbh | Verfahren zum Herstellen einer Mikropumpe sowie Mikropumpe |
US20150090030A1 (en) * | 2013-09-27 | 2015-04-02 | Infineon Technologies Ag | Transducer arrangement comprising a transducer die and method of covering a transducer die |
CN113426499B (zh) * | 2021-07-08 | 2022-10-14 | 成都齐碳科技有限公司 | 微结构、生物芯片、成膜方法、基因测序装置及其应用 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000124188A (ja) * | 1998-10-13 | 2000-04-28 | Toyota Central Res & Dev Lab Inc | 多孔質透過膜及び微小容器の製造方法 |
JP2001144276A (ja) * | 1999-08-31 | 2001-05-25 | Toshiba Corp | 半導体基板およびその製造方法 |
WO2002002458A1 (de) * | 2000-07-05 | 2002-01-10 | Robert Bosch Gmbh | Verfahren zur herstellung eines halbleiterbauelements sowie ein nach dem verfahren hergestelltes halbleiterbauelement |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6182513B1 (en) * | 1998-12-23 | 2001-02-06 | Radi Medical Systems Ab | Resonant sensor and method of making a pressure sensor comprising a resonant beam structure |
EP1088785A1 (fr) * | 1999-09-10 | 2001-04-04 | Ecole Polytechnique Federale De Lausanne | Procédé de fabrication d'une microstructure intégrée suspendue tridimensionnelle, microstructure intégrée notamment obtenue par ce procédé et élément optique intégré réglable |
DE10046622B4 (de) * | 2000-09-20 | 2010-05-20 | Robert Bosch Gmbh | Verfahren zur Herstellung einer Membransensoreinheit sowie Membransensoreinheit |
US6641643B2 (en) * | 2000-10-10 | 2003-11-04 | Generon Igs Inc. | Ceramic deoxygenation hybrid systems for the production of oxygen and nitrogen gases |
DE10054484A1 (de) * | 2000-11-03 | 2002-05-08 | Bosch Gmbh Robert | Mikromechanisches Bauelement und entsprechendes Herstellungsverfahren |
JP4296731B2 (ja) * | 2001-07-18 | 2009-07-15 | 株式会社デンソー | 静電容量型圧力センサの製造方法 |
DE10138759A1 (de) * | 2001-08-07 | 2003-03-06 | Bosch Gmbh Robert | Verfahren zur Herstellung eines Halbleiterbauelements sowie Halbleiterbauelement, insbesondere Membransensor |
-
2002
- 2002-09-05 DE DE10241066A patent/DE10241066A1/de not_active Ceased
-
2003
- 2003-05-14 EP EP03010777A patent/EP1396469A3/de not_active Withdrawn
- 2003-09-02 JP JP2003309841A patent/JP4723175B2/ja not_active Expired - Fee Related
- 2003-09-04 US US10/655,839 patent/US6972447B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000124188A (ja) * | 1998-10-13 | 2000-04-28 | Toyota Central Res & Dev Lab Inc | 多孔質透過膜及び微小容器の製造方法 |
JP2001144276A (ja) * | 1999-08-31 | 2001-05-25 | Toshiba Corp | 半導体基板およびその製造方法 |
WO2002002458A1 (de) * | 2000-07-05 | 2002-01-10 | Robert Bosch Gmbh | Verfahren zur herstellung eines halbleiterbauelements sowie ein nach dem verfahren hergestelltes halbleiterbauelement |
Also Published As
Publication number | Publication date |
---|---|
DE10241066A1 (de) | 2004-03-18 |
EP1396469A2 (de) | 2004-03-10 |
US20040048430A1 (en) | 2004-03-11 |
JP2004101524A (ja) | 2004-04-02 |
US6972447B2 (en) | 2005-12-06 |
EP1396469A3 (de) | 2005-08-31 |
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