JP4711805B2 - Plating tank - Google Patents

Description

  The present invention relates to a technique for electroplating a plate-like workpiece such as a printed circuit board in a surface treatment apparatus such as an electroplating apparatus.

  In conventional surface processing apparatuses (printed circuit board electroplating apparatuses), the plate-like workpiece W is fixedly attached to a rack so as not to sway, and the surface treatment is performed while the rack is being transported. However, since the attachment of the plate-like workpiece W to the rack is a complicated operation and the load on the apparatus is large and the apparatus is enlarged, a rackless type surface treatment apparatus has been proposed.

  As such a rackless type surface treatment apparatus, there is JP-A-2002-36396 (Patent Document 1). The structure of this surface treatment apparatus will be described below with reference to FIGS. FIG. 14 is a plan view of the surface treatment apparatus 300 as viewed from above. FIG. 15 is a side view of the surface treatment apparatus 300 shown in FIG. 14 as viewed from the α direction.

  As shown in FIGS. 14 and 15, the surface treatment apparatus 300 is a so-called pusher type surface treatment apparatus, and guide rails 10 to 10 for conveying the transfer hanger 15 holding a plate-like workpiece W such as a printed circuit board. 13, along these guide rails, a pretreatment tank 1 for performing a plating pretreatment process, a plating tank 2 for performing an electroplating process, a recovery tank 3 for performing a post-plating treatment process, and Flushing tank 4, unloading part 5 for removing plate-like workpiece W, peeling tank 6 for carrying out peeling process (hanger return process), washing tank 7 for carrying out hanger peeling post-treatment process, mounting of plate-like work A load unit 8 is provided for performing the following.

  When the elevating guide rails 10 and 12 shown in FIG. 14 are lowered, the plate-like workpiece W is immersed in each processing tank (plating tank 2, peeling tank 6, water washing tank, hot water washing tank, cleaner tank, etc.). Note that. In the state where the elevating guide rails 10 and 12 shown in FIG. 15 are lowered, the guide rails 10 to 13 constitute one annular guide rail.

  14 and 15, the plate-like workpiece W is guided into the processing liquid at the immersion position (position (x) in FIG. 14) of the plating tank 2 by the lowering of the elevating guide rail 12 and is immersed in the processing liquid. The workpiece W is moved in the plating tank 2.

  As shown in FIG. 9, the transport hanger 15 used in the rackless type surface treatment apparatus 300 includes a workpiece holding member 47 having a plurality of clamps 48 that hold the plate-like workpiece W, and the fixed guide rail 11. A sliding member 35 that is in sliding contact with each other, and a connecting member 44 that connects these members. The transport hanger 15 holds the upper end portion of the plate-like workpiece W by the clamp 48.

  By the way, in the rackless type surface treatment apparatus as described above, for the purpose of realizing uniform plating quality and uniform plating film thickness, the spraying means disposed on both sides of the plate-like workpiece W in the plating tank. The plating liquid jet is applied to the plate-like workpiece W for processing. However, since the rack is not used, the plate-like workpiece W is swayed during conveyance, the distance from the electrode is not constant, the plating film thickness becomes non-uniform, and the current concentrates on the edge of the plate-like workpiece W. The plating film thickness at the end of the plate-like workpiece W may become abnormally thick.

  For this reason, in a rackless type surface treatment apparatus, it has become a big subject to suppress the shaking of the plate-like workpiece W and to prevent current from being concentrated on the end portion of the plate-like workpiece W.

  Therefore, in Patent Document 1, in order to prevent current concentration on the front and rear end portions of the plate-like workpiece W, the position of the front and rear plate-like workpieces W is a predetermined distance (for example, 5 mm) in the plating tank 2. The interval is adjusted by fast-forwarding. Further, a linear body guide made of Teflon (registered trademark) for preventing the plate-like workpiece W from shaking is provided in a surface treatment vessel such as a plating vessel, or current concentration at the end of the plate-like workpiece W is prevented. For example, a shielding plate is provided (Japanese Patent Laid-Open No. 2000-178784 (Patent Document 2), Japanese Patent Laid-Open No. 2002-13000 (Patent Document 3)).

  Further, when a printed board having a thickness of 0.1 mm or less (hereinafter referred to as a thin board) is used as a plate-like workpiece, the plate-like workpiece W is smoothly immersed in each processing tank. For this purpose, it has been proposed to provide a guide or the like as shown in FIG. 16 in the tank (Japanese Patent Laid-Open No. 2004-346391 (Patent Document 4)).

  The guide shown in Patent Document 4 is provided with a pair of rectifying members 131 (consisting of diagonally descending flow plates 131a and 131b) at the lowered position of the thin plate substrate. As shown in FIG. 16, the inclined downward flow plates 131a and 131b are formed in a substantially V shape on the upper side thereof, and an ejection pipe 132 is provided along the vicinity of the upper end portions of the inclined downward flow plates 131a and 131b. It has been. Further, a liquid suction pipe 133 is disposed below the obliquely descending flow plates 131a and 131b. The liquid suction pipe 133 ejects the sucked plating solution from the ejection pipe 132. Thereby, a thin board | substrate can be rapidly induced | guided | derived with the flow which ejects from the slanting downward flow board 131a and 131b and goes below.

JP 2002-36396 A

JP 2000-178784 A

JP 2002-13000 A

JP 2002-36396 A

  However, in the conventional technique as described above, current concentration at the front and rear ends of the plate-like workpiece W can be prevented. However, while achieving uniform quality by the jet of the plating solution, both upper and lower ends of the plate-like workpiece W are achieved. In some cases, current concentration on the portion was prevented and a uniform plating film thickness could not be achieved.

  For example, Patent Documents 2 and 3 attempt to rectify a plating solution jet with a louver to obtain uniform plating quality. However, the louver may have an unnecessary current shielding effect, resulting in poor plating efficiency. Or the plating quality may deteriorate. Moreover, although the shielding plate is provided at the lower end portion of the plate-like workpiece W, the current shielding effect may not be sufficiently obtained due to the occurrence of current wrapping, and the upper end portion and the lower end of the plate-like workpiece W may not be obtained. There is a possibility that the current concentrates on the part and the plating film thickness varies.

  Furthermore, although the Teflon wire rod is used as a guide for preventing the plate-like workpiece W from shaking, the Teflon wire rod is easily cut by contact with the plate workpiece W. As a result, the plate workpiece In some cases, W could not be prevented from shaking. In addition, a metal core material can be provided on the Teflon-made wire body so as not to be cut off. However, when the Teflon resin is peeled off and the metal core material is exposed, the exposed metal core material hits the plate-like workpiece W and is scratched. Or plating adhering to the metal core may be mixed in the processing solution, resulting in poor plating quality. In particular, when the plate-like workpiece W is a thin substrate having a thickness of 0.1 mm or less, the plating jet easily causes shaking and distortion, and the plate-like workpiece W is slidably in contact with the plate-like workpiece W, so that scratches are likely to occur.

  The present invention solves the above-described problems, and in a surface treatment apparatus such as rackless type electroplating (in particular, an electroplating apparatus that holds and conveys a plate-like workpiece such as a printed circuit board in a vertical state). , Can be transported and immersed safely without scratching the printed circuit board, especially plate-like work such as thin printed circuit board with a thickness of 0.1 mm or less, and can achieve uniform plating quality and plating film thickness An object is to provide a plating tank.

  Several independent aspects of the invention are shown below.

(1) The plating tank of this invention is a plating tank for electroplating a plate-shaped workpiece,
A processing tank body provided extending in the moving direction of the plate-like workpiece and holding the processing liquid;
An anode means;
Jetting means for jetting the processing liquid from the side surface of the processing tank body toward the plate-shaped workpiece;
In the inside of the processing tank main body, a plurality of rotatably provided continuously from the upper part to the lower part of the processing tank main body and in the traveling direction of the plate-like work so as to sandwich the moving plate-like work from both sides. A regulating roller means having a roller,
Current shielding means for preventing current from concentrating on the end of the plate-like workpiece;
It is provided with.

  Therefore, the uprightness of the plate-like workpiece is maintained by the regulating roller means. Further, since the roller is used, the plate-like workpiece is not scratched. Thereby, uniform processing is possible.

(2) In the plating tank of the present invention, the regulating roller means is provided with a plurality of roller standing bodies in which a plurality of rollers are arranged in the vertical direction in the traveling direction of the plate-like workpiece, In the jetting position, the interval between adjacent roller standing bodies is wider than the other parts.

  Therefore, the processing liquid is uniformly applied to the plate-like workpiece (particularly, a thin plate-like workpiece having a thickness of 0.1 mm or less) by the ejecting means, and the uprightness of the plate-like workpiece is maintained by the regulating roller means. Further, since the roller is used, the plate-like workpiece is not scratched. Thereby, uniform processing is possible.

(3) The plating tank according to the present invention is provided with a substrate end-off prevention member in the vicinity of the lower end of the plate-like workpiece so as to sandwich the moving plate-like workpiece from both sides at the ejection position of the ejection means. Features.

  Therefore, it is possible to appropriately prevent bending at the lower end portion of the plate-like workpiece (particularly, a thin plate-like workpiece having a thickness of 0.1 mm or less).

(4) The plating tank according to the present invention is characterized in that at least one of the rollers is disposed per predetermined unit area in the region where the regulating roller means is disposed.

  Therefore, it is possible to prevent the plate-like workpiece (particularly, a thin plate-like workpiece having a thickness of 0.1 mm or less) from moving in the moving direction and in the vertical direction, and to keep the distance between the plate-like workpiece and the anode constant. Thereby, a uniform plating film thickness can be obtained.

(5) In the plating tank of the present invention, the regulating roller means is provided with a plurality of roller standing bodies in which a plurality of rollers are arranged in the vertical direction in the traveling direction of the plate-like workpiece. The vertical spacing of the rollers in the structure is 50 to 100 mm.

  Therefore, vertical shaking and distortion of the plate-like workpiece (particularly, a thin plate-like workpiece having a thickness of 0.1 mm or less) can be prevented, and uprightness can be maintained. Thereby, the distance between the plate-like workpiece and the anode can be kept constant, and a uniform plating film thickness can be obtained.

(6) In the plating tank of the present invention, the regulating roller means is provided with a plurality of roller standing bodies in which a plurality of rollers are arranged in the vertical direction in the traveling direction of the plate-like workpiece, Among them, those arranged at a height exceeding 50 mm from the lower end of the plate-like workpiece are characterized in that the rollers are arranged so that the vertical positions of the rollers are different between the roller standing bodies.

  Therefore, it is possible to prevent the current shielding effect from working at a constant height by the roller. As a result, the occurrence of uneven plating can be prevented and uniform plating can be achieved.

(7) In the plating tank of this invention, the current shielding means prevents the current from concentrating on the upper end of the plate-like workpiece, and / or the current concentrates on the lower end. It is characterized by comprising a lower shielding plate that prevents this.

  Therefore, current concentration on both the upper end portion and the lower end portion of the plate workpiece can be prevented. This makes it possible to make the plating film thickness uniform.

(8) In the plating tank of the present invention, the upper shielding plate and / or the lower shielding plate is composed of a plurality of shielding plates arranged between the plate workpiece and the anode means,
The plurality of shielding plates are arranged such that the closer the overlap with the plate-like workpiece is, the closer the plate-like workpiece is.

  Therefore, it is possible to prevent a current wraparound phenomenon that occurs with only one shielding plate. Thereby, even if it is a plate-shaped workpiece | work with a small area | region (throwing allowance) which can carry out electric current shielding, the plating film thickness can be made uniform. In addition, since the current shielding effect can be sufficiently obtained without lowering the current value, the productivity can be increased.

(9) The plating tank according to the present invention is characterized in that the plurality of shielding plates are integrally formed and can be moved up and down.

  Thereby, even if the size of the plate-like workpiece changes, the plating film thickness can be made uniform.

  The present invention also has independent aspects as described below.

(A) The plate-like workpiece immersion apparatus according to the present invention is a processing tank for immersing the plate-like workpiece in a processing liquid, and a substrate guide for guiding the plate-like workpiece descending to the processing tank, A lower guide plate arranged in parallel at a predetermined interval, and an upper guide plate arranged in a taper shape so that the interval is widened vertically upward, and provided with a notch hole are provided. It includes a substrate guide that protrudes from the surface and is disposed by immersing the notch hole in the processing liquid, and a liquid flow generator that is disposed outside the substrate guide.

  As a result, the liquid flow from the outside of the substrate guide can be guided downward in the substrate guide through the cutout hole, and the plate-like workpiece can be smoothly guided along the substrate guide. In particular, when the treatment liquid is an acidic cleaner containing an easily foamable substance such as a surfactant, it smoothly guides the plate-like work while preventing deterioration in the quality of the plating process due to bubbles generated on the liquid surface. Can do.

(B) In the plate-like workpiece immersion apparatus according to the present invention, the liquid flow generator is disposed at a substantially intermediate height in a sparger or a processing tank in which a jet is jetted in a substantially horizontal direction toward the notch hole. It is characterized by being a bubble generating tube.

  As a result, the liquid flow from the sparger sprayed in a substantially horizontal direction toward the notch hole can be guided downward in the substrate guide through the notch hole without generating bubbles on the liquid surface in the substrate guide. Thus, the plate-like workpiece can be smoothly guided along the substrate guide.

(C) The plate-like workpiece immersion apparatus according to the present invention is characterized in that the liquid flow generator is a sparger that injects a jet upward from the horizontal direction toward the upper portion of the cutout hole.

  As a result, the liquid flow from the sparger that is jetted upward from the horizontal direction toward the upper part of the notch hole in a state where bubbles are not generated on the liquid surface in the substrate guide allows the substrate guide to pass through the notch hole. Thus, it is possible to guide the plate-shaped workpiece more smoothly along the substrate guide.

(D) The plate-like workpiece immersion apparatus according to the present invention is characterized in that the liquid flow generator is a bubble generating tube for discharging gas upward.

  As a result, it is possible to guide the liquid flow from the bubble generating tube that discharges the gas upward in the state where the bubbles are not generated on the liquid surface in the substrate guide through the cutout hole, and to the substrate guide. It is possible to realize the smooth guidance of the plate-like workpiece along the simple structure.

(E) The plate-like workpiece immersion method according to the present invention includes a lower guide plate arranged in parallel at a predetermined interval, and an upper portion provided in a tapered shape so that the interval is widened vertically upward and provided with a notch hole. A plate-like workpiece immersion method for guiding a plate-like workpiece descending to a processing tank using a substrate guide provided with a guide plate, the tip of the upper substrate guide constituting the substrate guide protruding from the liquid surface, and The notch hole is immersed in a processing liquid, the substrate guide is disposed, a liquid flow is generated by a liquid flow generator disposed outside the substrate guide and below the surface of the processing liquid, and the plate workpiece is It is characterized by being lowered into the treatment tank and immersed in the treatment liquid.

  As a result, the liquid flow from the outside of the substrate guide can be guided downward in the substrate guide through the cutout hole, and the plate-like workpiece can be smoothly guided along the substrate guide. In particular, when the treatment liquid is a plating treatment liquid, it is possible to smoothly guide the plate-like workpiece while preventing deterioration of the quality of the plating treatment due to bubbles generated on the liquid surface.

1． Plating tank The basic structure of the surface treatment apparatus is the same as that shown in FIGS. FIG. 14 is a plan view of the surface treatment apparatus 300 as viewed from above. FIG. 15 is a side view of the surface treatment apparatus 300 shown in FIG. 14 as viewed from the α direction.

  As shown in FIGS. 14 and 15, the surface treatment apparatus 300 includes guide rails 10 to 13 for transporting a transport hanger 15 that holds a plate-like workpiece W such as a printed circuit board, and these guide rails. A pretreatment tank 1 for performing a plating pretreatment process, a plating tank 2 for performing an electroplating process, a recovery tank 3 and a washing tank 4 for performing a plating posttreatment process, and removal of the plate-like workpiece W An unloading part 5 for carrying out, a peeling tank 6 for carrying out a peeling process (hanger returning process) for peeling off and removing the plating adhering to the transport hanger 15, a washing tank 7 for carrying out a hanger peeling post-treatment process, a plate shape A load portion 8 for attaching a workpiece is provided.

  As the elevating guide rails 10 and 12 shown in FIG. 14 are lowered, the plate-like workpiece W is immersed in each treatment tank (the pretreatment tank 1, the plating tank 2, the washing tank 3, the collection tank 4, the peeling tank 6, and the like). Is done. In the state where the elevating guide rails 10 and 12 shown in FIG. 15 are lowered, the guide rails 10 to 13 constitute one annular guide rail.

  FIG. 1 shows an α-α cross section of a plating tank 2 (FIG. 14) according to one embodiment of the present invention. The processing tank main body 100 (including an overflow tank 202 and a drain 200 described later) is filled with a plating solution. The thin plate substrate W, which is a plate-like workpiece processed in the processing tank main body 100 filled with the plating solution, is suspended by the clamp 48 of the transfer hanger 15 with its upper end held. As the transfer hanger 15 moves, the thin plate substrate W also moves in the processing tank body 100.

  In the treatment tank main body 100, an anode means 301 for supplying metal ions to be plated, an ejection means 302 for ejecting a plating solution toward the thin plate substrate W, and an electric current so that current does not concentrate on the end of the thin plate substrate W. Shielding means 303 that shields the thin plate substrate W is provided so as to sandwich the thin plate substrate W, and a regulation roller unit 304 that maintains an upright state when the thin plate substrate W advances in the processing tank main body 100 is provided. The specific configurations of the anode unit 301, the ejection unit 302, the shielding unit 303, and the regulating roller unit 304 will be described below.

  The anode means 301 includes a pair of anodes 102 and 104 provided at a predetermined interval along the traveling direction of the thin plate substrate W shown in FIG. 1 and the processing tank body 100 arranged along the traveling direction of the thin plate substrate W. And a feed rail 224 that suspends the anodes 102 and 104 and energizes the anodes 102 and 104.

  The ejecting means 302 has an eductor box 204 for equalizing the plating solution pressure shown in FIG. 1 and the plating solution from both sides of the thin plate substrate W to the thin plate substrate W at positions closer to the thin plate substrate W than the anodes 102 and 104. A pair of spargers 106 for injecting the water, a pipe 210 and a circulation pump 208 that return the plating solution discharged from the drain 200 or the overflow tank 202 to the eductor box 204 through the pipe 210 after being filtered by a filter. It consists of

  The shielding means 303 includes the following four shielding plates shown in FIG. A lower substrate shielding plate 108 is provided at the lower end portion of the thin plate substrate W so as to face the thin plate substrate W in the proximity of the thin plate substrate W in the traveling direction. On the other hand, in the vicinity of the upper end portion of the thin plate substrate W, an upper substrate shielding plate 109 facing the thin plate substrate W is provided along the traveling direction of the thin plate substrate W. Further, between the anode 102 and the sparger 106, and between the anode 104 and the sparger 106, a lower electrode shielding plate 112 is located near the lower end portions of the anodes 102 and 104, and an upper electrode shielding plate 113 is located near the upper end portions of the anodes 102 and 104. Are provided in the vicinity of the anodes 102 and 104 along the traveling direction of the thin plate substrate W, respectively. Further, the shielding means 303 has a height adjusting means 220 for adjusting the heights of the lower substrate shielding plate 108 and the lower electrode shielding plate 112 in accordance with the size of the thin substrate W. In FIG. The left side shows a state in which the height is lowered in accordance with the thin plate substrate W having a large size, and the right side shows a state in which the height is adjusted to be high in accordance with the thin plate substrate W having a small size.

  The restricting roller means 304 is configured by a roller standing body 120 erected on the upper surface of the lower substrate shielding plate 108 at a height almost reaching the upper portion of the thin substrate W and a detachment preventing member 122 shown in FIG. ing. The height of the regulating roller means 304 is adjusted by the height adjusting means 220 according to the size of the thin substrate W together with the lower substrate shielding plate 108 and the lower electrode shielding plate 112.

  The roller standing body 120 includes a shaft 114 that is erected on the lower substrate shielding plate 108 and a roller 116 that is rotatably attached along the vertical direction of the shaft 114. The roller 116 may be fixed to the shaft 114 so that the shaft 114 itself can be rotated.

  Specifically, as shown in FIG. 4 which is a detailed view of the roller erected body viewed from the β direction in FIG. 1, the roller erected body 120 includes a roller 116 molded with a resin such as PP, and upper and lower An adjusting member 116e that adjusts the distance between the upper and lower rollers 116 by being interposed between the rollers 116 is attached by inserting the shaft 114 into each insertion hole, and in the vicinity of the upper end of the shaft 114, the roller 116 and A fixing member 116g is attached so that the adjustment member 116e does not come off.

  Here, as shown in FIG. 25, the fixing member 116g is attached to the upper end of the uppermost roller 116 with a gap (L70). As a result, the roller 116 floats in the electroplating solution, prevents the roller 116 and the adjusting member 116e from rubbing and the like to prevent rotation failure, and prevents the thin plate substrate W from being scratched by contact with the roller 116. It is preventing.

  FIG. 2 shows the structure in the plating tank 2 as seen from the β direction of FIG. It can be seen that a large number of roller standing bodies 120 are provided in the traveling direction C of the thin substrate W.

  FIG. 3 is a plan view of the plating tank 2 viewed from the γ direction of FIG. The thin substrate W is transported between the opposing roller standing bodies 120. That is, the thin plate substrate W is transported in a straight state (while maintaining an upright state) while being regulated by the roller 116 of the roller standing body 120. By the way, the regulation roller means 304 is provided with the roller standing body 120 and the roller 116 as described below in order to keep the thin substrate W straight (upright state).

  First, the arrangement of the roller standing body 120 will be described. As shown in FIG. 22, the opposing roller standing body 120 is disposed such that the distance L40 between the roller 116 and the thin plate substrate W is 1 to 5 mm (here, 4 mm). If the thickness is less than 1 mm, the roller 116 is always in contact with the thin substrate W, and there is a possibility that the surface of the thin substrate W may be scratched. On the other hand, if the thickness exceeds 5 mm, the thin plate substrate W is distorted in the vertical direction (FIG. 23), and there is a possibility that the uniform plating film thickness may not be obtained.

  Further, in this embodiment, at the position of the sparger 106 (shown as N in FIG. 4), the interval L3 of the roller standing body 120 is made wider than the interval L2 of other portions. In this embodiment, at the position N of the sparger 106, a gap L3 larger than the diameter of the roller 116 is provided. At other positions, the distance L2 is smaller than the diameter of the roller 116. Thus, the roller standing body 120 is less likely to become an obstacle to the plating solution jet spouted from the sparger 106, and the plating solution jet can be effectively spread over the surface of the thin plate substrate W. .

  However, if the gap L3 is large as described above, the thin plate substrate W is bent by the jet flow from the sparger 106 at that portion, and a bent portion enters between the roller standing bodies 120, causing a conveyance failure. There is a risk that. Therefore, in this embodiment, the detachment prevention member 122a is provided at the lower end portion of the roller standing body 120, and the detachment prevention member 122b is provided at the intermediate height. In particular, it is important to provide a detachment preventing member 122a at the lower end so that the lower end of the thin plate substrate W is not bent.

  FIG. 5 shows details of the detachment preventing member 122 (122a, 122b). 5A is a view from the top, and FIG. 5B is a view from the side. As is clear from FIG. 5B, the disengagement preventing member 122a is fixed to the lower end portion of the shaft 114 (0 to 50 mm from the upper surface of the lower substrate shielding plate 108, particularly in the range of 0 to 20 mm: 5 mm here). While the roller 116 can rotate, the detachment preventing member 122a does not rotate. Further, as shown in FIG. 5A, a conveyance space 124 for the thin plate substrate W is provided between the pair of detachment preventing members 122a. In this way, the end portion of the thin plate substrate W is bent in the vicinity of the sparger 106 to prevent the end portion of the thin plate substrate W from being caught between the roller standing bodies 120 and coming off from the lower substrate shielding plate 108. The detachment preventing member 122b has the same structure as the detachment preventing member 122a.

  Next, the arrangement of the rollers 116 will be described. As shown in FIG. 26, at least one roller 116 is arranged per predetermined area (for example, 100 mm × 100 mm) in a region where 10 to 12 roller standing bodies 120 are arranged. Here, the region where the roller standing body 120 is disposed is a direction in which the roller standing body 120 disposed along the traveling direction of the thin plate substrate W is orthogonal to the traveling direction as shown in FIG. The arrangement area when viewed from the above. In this region, by arranging at least one roller 116 that regulates the shaking of the thin substrate W so as to come into contact with the thin substrate W in a predetermined area, the shaking that occurs in the thin substrate W is effectively suppressed. . The reason why the roller 116 is arranged in units of a predetermined area is to restrict the shaking of the thin plate substrate W to the moving direction and the vertical direction. The predetermined area is preferably 100 mm × 100 mm at the maximum.

  As a result, the thin plate substrate W loses its uprightness due to the plating solution jet, and the distance from the anodes 102 and 104 is changed as shown in FIGS. 23 and 24. As a result, the plating film thickness is prevented from varying. It can be prevented that the leading end portion (the leading end in the traveling direction) of the thin plate substrate W swings and bends, so that the thin substrate W fits into the gap of the roller standing body 120 and causes a conveyance failure. FIG. 24 is a view of the thin substrate W that has been shaken as viewed from above the plating tank.

  Moreover, the vertical installation interval between the rollers 116 in the roller standing body 120 is 50 to 100 mm. Here, the upper stage installation interval refers to the vertical interval (L30 shown in FIG. 4) of the disk portion of the roller 116. If it is less than 50 mm, the roller 116 may act as an electrical shield against the thin plate substrate W, and the plating film thickness may vary. On the other hand, if it exceeds 100 mm, the thin plate substrate W is bent between the rollers 116 and the uprightness is lost. As shown in FIG. 23, the distance between the thin plate substrate W and the anodes 102 and 104 is locally in the vertical direction. It may change and the plating film thickness may vary. FIG. 23 is a view of the thin substrate W that has been shaken as seen from the transport direction.

  Furthermore, the arrangement | positioning state of the roller standing body 120 is shown in FIG. In the arrangement of the plurality of roller erected bodies 120 provided, the positions of the rollers 116 in the height direction are different from each other with 10 to 12 roller erected bodies 120 as one unit in the traveling direction of the thin plate substrate W. Are arranged as follows. For example, it is arranged so that there is no roller located at the same height H as the roller 116a near the center. For the other rollers, two or more of the same height do not exist. This prevents the occurrence of streaky “unevenness” in the plating of the thin plate substrate W by contacting the roller 116 at the same height, and the electric shadow on the surface of the thin plate substrate W generated by the roller 116 is constant. This is to prevent the plating film thickness of the portion that is made to be high and the shadow from becoming thin.

  However, the roller 116 is allowed to be positioned at the same height under the roller standing body 120 that is 50 mm or less from the upper surface of the lower substrate shielding plate 108. The lowermost roller 116b of the roller standing body 120 is installed 50 mm or less from the upper surface of the lower substrate shielding plate 108, particularly 20 mm or less. This is because, as shown in FIG. 23, when the uprightness of the thin plate substrate W is lost by the plating solution jet, the lower end of the thin plate substrate W becomes high. A roller 116 is provided in the vicinity of the portion to prevent the lower end portion of the thin plate substrate W from coming out of the gap formed by the lower substrate shielding plate 108.

  As described above, the roller standing body 120 is erected on the lower substrate shielding plate 108 and moves up and down integrally with the lower substrate shielding plate 108. Thereby, even if the height of the lower substrate shielding plate 108 is adjusted according to the size of the thin plate substrate W, the positional relationship between the lower substrate shielding plate 108 and the lowermost roller 116b of the roller standing body 120 and the anti-slipping member 122a. Since it does not change, it can be made to function similarly with respect to the thin board | substrate W of various sizes with a simple structure.

  As described above, the regulating roller means 304 in this embodiment regulates five elements for improving the quality of electroplating, and the arrangement of the rollers 116 is determined. That is, i) maintenance of the upright posture of the thin plate substrate W, ii) suppression of the current shielding effect by the roller 116, iii) maintenance of the effect of the plating flow jet by the jetting means, iv) gap between the thin plate substrate W and the roller standing body 120 The arrangement of the rollers 116 and the like is determined in order to prevent conveyance failure such as jamming and v) to prevent the rollers 116 from being scratched.

  Specifically, in order to achieve the above i), at least one roller 116 is basically arranged in a predetermined unit area (for example, 100 mm × 100 mm), and the longitudinal direction of the thin plate substrate W is more effectively achieved. In order to suppress the deflection, the distance between the roller 116 and the thin plate substrate W is set to 1 to 5 mm (not wider than 5 mm), and the distance between the upper and lower rollers 116 is set to 50 to 100 mm (not wider than 100 mm). ing. In order to achieve the above ii), the interval between the upper and lower rollers 116 is set to 50 to 100 mm (not smaller than 50 mm), and the rollers 116 are installed at the same vertical position between 10 to 12 roller standing bodies 120. I try not to. In order to achieve the above iii), at the position where the sparger 106 is disposed, the interval between the roller standing bodies 120 is disposed at L3 wider than other portions. In order to achieve the above iv), the roller 116 is allowed to be disposed at the same height at the lower part of the roller standing body 120, and the roller standing structure 120 is prevented from coming off at the position at the interval L3. The member 122 is disposed, and the roller standing body 120 is disposed at an interval of L2 narrower than the diameter of the roller 116 at a position where the sparger 106 is not disposed. Finally, in order to achieve the above v), a gap is formed from the upper end of the uppermost roller 116 and fixed by a fixing member 116g so that it can rotate smoothly in the plating solution, and the distance between the roller 116 and the thin plate substrate W. 1 to 5 mm (not narrower than 1 mm).

  Each of these combinations can be appropriately selected depending on the element to be regulated, but it is preferable to include all of them.

  FIG. 17 is a view showing the ejection unit 302, in which the anode unit 301, the regulating roller unit 304, and the shielding unit 303 are omitted. In FIG. 17, the ejection means 302 blows a plating solution jet from the sparger 106 against the thin plate substrate W. The plating solution ejected from the sparger 106 is discharged from the drain tank 200 or the overflow tank 202 from the treatment tank main body 100 and filtered by the filtration filter 209, and then to the eductor box 204 through the pipe 210 by the circulation pump 208. After the pressure is returned and the plating solution pressure is equalized in the eductor box 204, the pressure is returned to the sparger 106 and circulated again.

  A plurality of eductor boxes 204 are extended on the bottom surface of the processing tank body 100 along the traveling direction of the thin plate substrate W, and the height thereof can be adjusted with respect to the bottom plate of the processing tank body 100 as shown in FIG. It is bolted to. A communication hole is provided in the side wall of the eductor box 204, and a pipe 210 is connected so that liquid can flow through the communication hole. Further, a reinforcing member 204a is attached to the eductor box 204 to prevent the eductor box 204 from being deformed by the pressure of the plating solution sent from the circulation pump 208 and preventing the plating solution pressure from being equalized. is doing.

  As shown in FIG. 17, the sparger 106 is constituted by a plurality of jet nozzles 106a for jetting a plating solution attached to the nozzle pipe 106b at a predetermined interval. The nozzle tube 106b is erected on the eductor box 204, and the eductor box 204 and the lower end of the nozzle tube 106b are connected by a communication hole so as to allow liquid flow. On the other hand, the upper end of the nozzle tube 106b is fitted in a hole provided in the nozzle fixing member 212 attached along the traveling direction of the thin substrate W, and the sparger 106 is generated by the ejection pressure when the plating solution is ejected. Is prevented from tilting (falling down) or vibrating in the opposite direction to the thin plate substrate W, so that the plating solution jet to the thin plate substrate W becomes constant.

  As shown in FIG. 17, the jet nozzles 106 a are alternately installed at the right and left spargers 106 of the thin substrate W. This is because a difference is caused in the plating solution jet pressure on the surface of the thin plate substrate W to effectively realize the liquid flow in the through hole provided in the thin plate substrate W.

  FIG. 18 is a diagram showing the shielding means 303, and a part of the anode means 301 and the ejection means 302 is omitted. As shown in FIG. 18, the shielding means 303 includes an upper substrate shielding plate 109, an upper electrode shielding plate 113, a lower substrate shielding plate 108, a lower electrode shielding means 112 having a rotation mechanism 150, a lower substrate shielding plate 108 and a lower electrode shielding. The plate 110 and the reinforcing connecting member 216 that connect the plate 112 so as to be integrated, the height adjusting means 220 that moves the lower substrate shielding plate 108 and the lower electrode shielding plate 112 together, and the lower substrate shielding when the height is adjusted. It comprises a guide table 214 and a support column 155 that guide the plate 108 and the lower electrode shielding plate 112.

  The upper substrate shielding plate 109 and the upper electrode shielding plate 113 are attached to the nozzle fixing member 212 as shown in FIG. Each of the upper substrate shielding plate 109 and the upper electrode shielding plate 113 has a long hole in the vertical direction of the drawing, and is bolted to the nozzle fixing member 212 through the long hole so that the height can be adjusted in the vertical direction of the drawing. ing.

  The reason why the upper substrate shielding plate 109 and the upper electrode shielding plate 113 are used in combination is to effectively shield the current in a minute region of 1 to 5 mm from the substrate end of the thin substrate W. The upper substrate shielding plate 109 locally controls current concentration on the upper end of the thin substrate W, and shields the upper electrode so that current that cannot be controlled by the upper substrate shielding plate 109 does not enter the vicinity of the upper end of the thin substrate W. It is controlled by the plate 113.

  Further, in this embodiment, as shown in FIG. 18, in order to effectively prevent current concentration on the lower end portion of the thin substrate W, the lower substrate shielding plate 108 and the lower electrode shielding plate 112 are used as shielding plates at the lower end portion of the substrate. have. The reason why the lower substrate shielding plate 108 and the lower electrode shielding plate 112 are used together is the same as the reason why the upper substrate shielding plate 109 and the upper electrode shielding plate 113 are provided.

  Here, the shielding plates 108 and 112 and 109 and 113 overlap from the end of the thin plate substrate W as the distance from the thin plate substrate W becomes shorter (the length of the thin plate substrate W and the shielding plate shown in FIG. 21 overlapping: , “Fogging value”) L60 is set to be small. For example, as shown in FIG. 21, the lower substrate shielding plate 108 having a shorter distance from the thin substrate W is set to have a larger fog value than the lower electrode shielding plate 112.

  Moreover, it is preferable that the board | substrate shielding plates 108 and 109 are installed in the range whose distance L50 (FIG. 22) from the thin board | substrate W is 1-50 mm. Thereby, current concentration at the end portion of the thin plate substrate W can be effectively prevented without reducing the amount of energization necessary for plating (decreasing plating efficiency).

  Specifically, the upper substrate shielding plate 109 is installed so as to overlap with the upper end portion of the thin plate substrate W by 1 to 15 mm (here, 10 mm), and the upper electrode shielding plate 113 is arranged at the upper end portion of the thin plate substrate W. It is installed so that it may overlap with 10-60 mm (here 50 mm) with respect to. Further, the upper substrate shielding plate 109 (L-shaped bottom end) is installed at a distance of 25 mm from the thin plate substrate W.

  On the other hand, the height of the lower substrate shielding plate 108 is set so as to overlap with the lower end portion of the thin plate substrate W by 1 to 10 mm (here, 5 mm). The lower electrode shielding plate 112 is set to have a height so as to overlap with the lower end portion of the thin plate substrate by 50 to 75 mm (here, 65 mm). Further, the lower substrate shielding plate 108 is installed at a distance of 4 mm from the thin plate substrate W.

  By the way, if the setting of the cover value of the substrate shielding plate and the electrode shielding plate is changed, the current shielding effect is also changed. Therefore, as described above, the lower substrate shielding plate 108 and the lower electrode shielding plate 112 are provided with the height adjusting means 220 so that the cover values of the substrate shielding plate and the electrode shielding plate do not change even if the size of the thin substrate W is changed. The height can be adjusted as a whole.

  In FIG. 18, the lower substrate shielding plate 108 is attached on the plate 110, and the plate 110 is connected to the lower electrode shielding plate 112 via the reinforcing connecting member 216, and the lower electrode shielding plate 112 and the lower substrate shielding plate 108 are connected. Are integrated. The reinforcing connecting member 216 is also fixed to the upper surface of the lower substrate shielding plate 108 to prevent the plate 110 from being distorted.

  As shown in FIG. 18, a guide base 214 for guiding the lower electrode shielding plate 112 is attached to the bottom plate of the processing tank main body 100 so as to accommodate the eductor box 204 below. A support column 155 is erected on the upper surface of the guide table 214, and the upper end of the support column 155 is bolted to the nozzle fixing member 212. The lower electrode shielding plate 112 is bolted to the side surface of the guide table 214 through a long hole in the vertical direction (not shown), and the lower electrode shielding plate 112 is shielded against the support column 155. A rotation mechanism 150 provided on the plate 112 is engaged via a roller 150a so as to be movable up and down. In this way, the lower electrode shielding plate 112, the lower electrode shielding plate 112, and the roller standing body when the height adjusting means 220 adjusts the height by the lower electrode shielding plate 112 being guided by the guide table 214 and the support column 155. 120 is integrally guided.

  In FIG. 18, the height adjusting means 220 includes a drive motor 220a, a pulley 220b, a connecting wire 220c, and a driving belt 220d. One end of the connecting wire 220c is fixed to the pulley 220b, and the other end is reinforced. It is connected to the connecting member. By driving the drive motor 220a, the wire 220c is wound around the pulley 220b, so that the lower substrate shielding plate 108, the lower electrode shielding plate 112, and the roller standing body 120 rise together.

  FIG. 19 is a view of the reinforcing connecting member 216 as viewed from the thin plate substrate W side. As shown in FIG. 19, the connecting wire 220 c is connected to the upper surface of the reinforcing connecting member 216 via a wire joint 218.

  FIG. 20 is a view showing the structure of the anode 102. The anode 102 constituting the anode means 301 has an anode case 102a that accommodates a plated metal material such as a copper ball. A handle 102d is attached to a side surface of the anode case 102a, and a lower end of the handle 102d A flange 102e for attaching the anode case 102a to the power supply rail 224 shown in FIG. 1 is provided. The upper end of the handle 102d has a height that substantially reaches the opening 102b. In addition, four bar guides 102c (two are not visible in the back direction in the drawing in the figure) are attached to the upper opening 102b of the anode case 102a at equal intervals. The upper end of the rod guide 102c extends to the vicinity of the charging hole 100b provided in the lid 100a of the processing tank body 100 for charging the plating metal material. Reference numeral 100c denotes a cap for the charging hole 100b.

  When the plating operation is continued, it is necessary to replenish the anode case 102a with a plating metal material. Due to the presence of the rod guide 102c, the plating metal material is not accommodated in the anode case 102a when it is introduced from the introduction hole 100b, and is prevented from falling into the treatment tank body 100.

  Further, when the plating operation is continued, it is necessary to remove the anode case 102a and perform maintenance (cleaning). By the way, in order to avoid the shortage of the plated metal material, the plated metal material may be excessively charged (the plated metal material is charged so as to overflow from the opening 102b). The guide was fitted, and the plating metal material was prevented from falling into the treatment tank main body 100. However, when the cylindrical guide is used, it is difficult to remove the excessively added plating metal material, and it takes time to remove the anode case 102a during maintenance. By using the rod guide 102c, it is possible to easily remove the excessively added plated metal material from the charging hole 100b, so that the anode case 102a can be easily removed during maintenance.

2． Substrate immersion apparatus In the plating tank 2 of the above-described embodiment, a substrate immersion apparatus 2a (see FIG. 15) in which the thin plate substrate W is immersed is provided with a substrate immersion apparatus. The structure of the substrate immersion apparatus will be described with reference to FIG. 13A is a cross-sectional view of the substrate immersion apparatus 600 showing a state where the substrate is lowered at the position (x) of FIG. 14, and FIG. 13B is a view of the substrate immersion apparatus 600 shown in FIG. 13A as viewed from above. is there.

  As shown in FIG. 13A, a substrate immersion apparatus 600 includes a processing tank main body 60 that stores a plating solution for immersing the thin plate substrate W, and a substrate guide 62 for guiding the thin plate substrate W descending to the processing tank main body 60. A bubble generating tube 68 which is a liquid flow generator disposed outside the substrate guide 62 is provided.

  As shown in FIG. 13A, the substrate guide 62 has a lower guide plate 62a arranged in parallel with a predetermined interval t, a taper shape arranged so that the interval is widened vertically upward, and a slit 62c which is a notch hole. The upper guide plate 62b is provided, and a rectifying plate 62d that prevents the liquid flow generated by air agitation from diffusing and weakening is provided. Further, as shown in FIG. 13A, the substrate guide 62 is arranged with the tip 62e of the upper guide plate 62b protruding from the liquid surface and the notch hole 62c immersed in the plating solution. FIG. 7 is a perspective view showing the structure of the substrate guide 62.

  The bubble generating pipe 68 that is a liquid flow generator receives supply of air from the pipe 66 shown in FIG. 13A and discharges air upward. Thus, as the plating solution around the air rises as the air rises, the outer plating solution separated by the rectifying plate 62d flows from the lower end of the rectifying plate 62d. It is considered that the rising plating solution passes through the slit 62c and then flows downward between the lower guides 62a to flow again from the lower end of the rectifying plate 62d to generate a circulating fluid flow. . Therefore, the thin plate substrate W can be smoothly guided and immersed along the substrate guide 62. As an experimental result, the bubble generation tube 68 is located near the center in the depth direction of the processing tank body 60, rather than being disposed at the same height as the slit 62c or near the lower end of the rectifying plate 62d. It was possible to guide more smoothly when it was installed. Similarly, as an experimental result, it was possible to guide the thin plate substrate W more smoothly by providing the slit 62c in the upper guide 62b than in providing the slit 62c in the lower guide 62a.

  With the configuration as described above, the substrate guide 62 is disposed in a state in which the tip 62e of the upper guide 62b protrudes from the liquid surface and the slit 62c is disposed at a position immersed in the plating solution in the lower guide 62a. A liquid flow can be generated by a liquid flow generator disposed on the outside, and the thin plate substrate W can be smoothly immersed in the plating solution.

  In FIG. 13, the substrate immersion apparatus is disposed where the substrate of the plating tank 2 is immersed, and the bubble generating tube 68 is used as the liquid flow generator. However, the processing effect in the through holes and via holes of the thin plate substrate W is improved. In the case where the pickling cleaner process is performed in the pretreatment tank 1 where it is desired to avoid foaming, for example, a jet nozzle 64 can be used as a liquid flow generator as shown in FIG. 6A. In this case, the jet flow is jetted in a substantially horizontal direction from the jet nozzle 64 toward the slit 62c. As a result, a liquid flow that passes through the slit 62 c and then downwards between the lower guides 62 b is generated, and the thin substrate W can be smoothly guided and immersed along the substrate guide 62.

  As an experimental result, it was possible to guide the thin plate substrate W more smoothly when jetting toward the upper portion R of the slit as shown in FIG. 8 than when jetting the jet directly toward the slit. . In FIG. 8, the jet is jetted upward with respect to the horizontal plane.

  As shown in FIG. 6B, a plurality of jet nozzles 64a are arranged at equal intervals in the traveling direction (D direction) of the transport hanger 15, and as shown in FIG. 6A, the same as the notch hole 62b of the substrate guide 62. It is fixedly arranged at a height.

  Further, on the liquid surface, an air blow is provided in the vicinity of the outside of the substrate guide 62 so that the air blowing direction is opposite to the substrate guide, and before the air discharged to the bubble generating tube 68 becomes bubbles on the liquid surface. You may make it blow away. Thereby, it is possible to prevent bubbles from adhering to the surface of the thin substrate W and to sufficiently obtain the treatment effect by the treatment liquid.

  In the above embodiment, the case where the present invention is applied to a plating tank has been described. However, the present invention can also be applied to a treatment tank that performs other cleaning processes.

3． Structure of Surface Treatment Device and Transport Hanger As shown in FIGS. 14 and 15, the surface treatment device 300 includes guide rails 10 to 13 for transporting the transport hanger 15 holding a thin substrate W such as a printed circuit board. A pretreatment tank 1 for performing a plating pretreatment process, a plating tank 2 for performing an electroplating process, a recovery tank 3 and a water washing tank for performing a post-plating treatment process along these guide rails 4. Unloading part 5 for removing the plate-like work (thin plate substrate) W, peeling tank 6 for carrying out a peeling process (hanger returning process) for peeling and removing the plating adhering to the transport hanger 15, hanger peeling A washing tank 7 for performing a post-processing step and a load portion 8 for mounting a plate-like workpiece (thin plate substrate) W are provided.

  The lifting guide rails 10 and 12 shown in FIG. 5 attach and detach the plate-like workpiece (thin plate substrate) W to the transport hanger 15, or tank the plate-like workpiece (thin plate substrate) W (pretreatment bath 1, plating). Guide rails that move up and down when immersed in the tank 2, the washing tank 4, the recovery tank 4, and the like. The fixed guide rails 11 and 13 are guide rails fixed to transport the transport hanger 15 lowered to the plating tank 2 and the peeling tank 6, respectively.

  The structure of the transport hanger 15 of the present invention will be described with reference to FIG.

  As shown in FIG. 9, the transport hanger 15 is in sliding contact with the workpiece holding member 47 having a plurality of clamps 48 for holding a plate-like workpiece (thin plate substrate W) and the fixed guide rail 11. It has the moving member 35 and the connection member 44 which connects these. As the material of the sliding member 35 and the connecting member 44, copper, brass or the like is used.

  The width L0 of the workpiece holding member 47 shown in FIG. 9 is calculated based on the width W0 of the plate-like workpiece W (thin plate substrate W) and the margin W1. For example, as shown in FIG. 9, when the margin W1 is provided at both ends of the plate-like workpiece W (width length W0), the width length L0 of the workpiece holding member 47 is L0 = W0-2 × W1. calculate.

  Further, as shown in FIG. 10, a bearing 36 having a one-way clutch type gear 40 meshing with a chain belt 39 (constituting the fixed guide rail conveying means 19 shown in FIG. 14) is fixed to the upper part of the sliding member 35. Yes. For this reason, the gear 40 meshing with the chain belt 39 on the fixed guide rails 11 and 13 can rotate only in the direction B shown in FIG.

  The pusher contact surface 37 shown in FIG. 9 is a portion where the pushers 16 and 21 (FIG. 11) of the intermittent transport means 17 and 22 that are transport means of the transport hanger 15 abut.

  The claw abutting portion 32 in FIG. 10 is a portion where the conveyance claw 27 (FIG. 14) of the positioning conveyance means 18 which is the conveyance means of the conveyance hanger 15 abuts. Each conveyance means of the conveyance hanger 15 will be described below.

Four. Each transport means of the transport hanger 15 The transport hanger 15 shown in FIG. 9 is the following intermittent transport means 17, 22, positioning transport means 18, 23, fixed guide rail transport means 19, 24, and It is conveyed by the delivery conveying means 20, 25.

  First, the intermittent conveyance means 17 and 22 provided on the upper parts of the elevating guide rails 10 and 12 shown in FIG. 15 are respectively located at the positions (c) to (f) and (h) to (k) of the elevating guide rails 19. A certain transport hanger 15 is intermittently transported one pitch at a time using pushers 16a to 16d and 21a to 21d (FIG. 11). FIG. 11 is a plan view showing the structure of the intermittent conveying means 17 provided on the upper part of the lifting guide rail 10.

  The positioning conveyance means 18 shown in FIG. 15 is provided along the fixed guide rail 11 and is a conveyance hanger 15 that is lowered from the (x) position above the plating tank 2 into the workpiece immersion portion (substrate immersion portion) 2a. (Refer to FIG. 15) is transferred to the fixed guide rail 11 and moved forward to the position (b), and the plate-like workpiece W (thin plate substrate W) in the plating tank 2 and its front (left side in FIG. 6). ) Is adjusted to a predetermined width L1 (for example, L1 = 5 mm) with the plate-like workpiece W (thin plate substrate W) at the position (a).

  FIG. 12 shows the structure of the positioning and conveying means 18. The positioning and conveying means 18 shown in FIG. 12 can be moved back and forth in the X and Y directions along rails separately provided along the fixed guide rail 11, and is biased in the Z direction by a spring in the state shown in FIG. 12A. The conveyance claw 31 is provided. As a result, when the transport hanger 15 is transported, the spring first contracts when it moves in the X direction, and after passing over the claw contact portion 32 shown in FIG. It moves to (Y direction of FIG. 12C), the conveyance nail | claw 31 hooks the nail | claw contact part 32 of the hanger 15 for conveyance, and conveys the hanger 14 for conveyance to the C direction shown in FIG. At this time, the moving speed of the positioning and conveying means 18 is such that the fixed guide rail conveying means 19 moves so as to catch up with the conveying hanger 15 before being conveyed by the fixed guide rail conveying means 19 (that is, the movement of the chain belt 39). Speed). The positioning / conveying means 23 on the peeling tank 6 side also has the same structure and operation as the positioning / conveying means 13 on the plating tank 2 side shown in FIG.

  The fixed guide rail conveying means 19, 24 keeps the conveying hanger 15 forwardly fed by the positioning conveying means 18, 23 at a predetermined interval (L 1 in FIG. 6) (in the direction of arrow C in FIG. 14). Transport.

  The sending and conveying means 20 and 25 respectively transfer the conveying hangers 15 conveyed to the positions (g) and (o) by the fixed guide rail conveying means 19 and 24, respectively (h) and (f) of the lifting guide rails 12 and 10, respectively. ) Send to position and change (FIG. 14). The structures and operations of the delivery / conveying means 20 and 25 are the same as those of the positioning / conveying means 18 shown in FIG.

Five. Other Embodiments In the above embodiment, the shielding plate for the thin substrate W is provided with the two shielding plates of the upper (lower) substrate shielding plate and the upper (lower) electrode shielding plate. However, the substrate shielding plate and the electrode shielding are provided. A shielding plate may be further added between the plates.

  In the above embodiment, the upper substrate shielding plate and the upper electrode shielding plate are raised and lowered separately, but a mechanism for raising and lowering them integrally may be used.

It is a figure which shows the alpha-alpha cross section of the plating tank 2 (FIG. 14). It is a figure which shows the structure in the plating tank 2 seen from (beta) direction of FIG. It is a figure which shows the top view of the plating tank 2 seen from the (gamma) direction of FIG. FIG. 2 is a detailed view of a roller standing body viewed from the β direction in FIG. 1. It is a figure which shows the detail of the disconnection prevention member 122 (122a, 122b). It is detail drawing which shows the structure of the board | substrate immersion apparatus 600. 5 is a perspective view showing a structure of a substrate guide 62. FIG. It is a figure which shows the detail of the jet nozzle 64. FIG. It is a figure which shows the structure of the hanger 15 for conveyance. FIG. 3 is a central sectional view of a transport hanger 15. 3 is a plan view showing the structure of a plane intermittent conveying means 17 provided on the upper part of the lifting guide rail 10. FIG. FIG. 4 is a view showing the structure of positioning and conveying means 18. It is a figure which shows the structure of a board | substrate immersion apparatus. It is the top view which looked at the surface treatment apparatus 300 from upper direction. It is the side view which looked at the surface treatment apparatus 300 shown in FIG. 14 from (alpha) direction. It is a figure which shows the structure of the conventional guide. It is a figure which shows the structure of the ejection means 302. It is a figure which shows the shielding means 303. FIG. It is the figure which looked at the reinforcement connection member 216 from the thin-plate board | substrate W side. 2 is a view showing a structure of an anode 102. FIG. It is a figure showing the length with which the thin board | substrate W and a shielding board overlap. It is a figure which shows the structure in the lower part of the roller standing body 120. FIG. It is the figure which looked at the board | substrate W which produced the shake from the conveyance direction. It is the figure which looked at the board | substrate W which produced the shake from the upper direction of the plating tank. It is a figure which shows the structure of the upper end part of the roller standing body 120. FIG. It is a figure which shows the relationship between the number of the rollers 116, and the predetermined area of the thin board | substrate W conveyed.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Pretreatment tank 2 ... Plating tank 3 ... Recovery tank 4, 7 ... Washing tank 5 ... Unloader 6 ... Peeling tank 8 ... Loader 10, 12... Lifting guide rails 11, 13... Fixed guide rails 15, 15... Hanger 17, 22. Means 19, 24... Fixed guide rail conveying means 20, 25... Sending and conveying means 60... Processing tank main body 62 ... Substrate guide 64 ... Liquid flow generator (jet nozzle )
66 ... Pipe 68 ... Liquid flow generator (air discharge pipe)
100 ... Processing tank body 102, 104 ... Positive electrode 108 ... Lower substrate shielding plate 109 ... Upper substrate shielding plate 111 ... Upper electrode shielding plate 112 ... Lower electrode shielding plate 114 ..Shaft 116 ... Roller 120 ... Roller standing body 151 ... Elevating unit 300 ... Surface treatment device

Claims (10)

A processing tank body provided extending in the moving direction of the plate-like workpiece and holding the processing liquid;
An anode means;
Jetting means for jetting the processing liquid from the side surface of the processing tank body toward the plate-shaped workpiece;
In the inside of the processing tank main body, a plurality of rotatably provided continuously from the upper part to the lower part of the processing tank main body and in the traveling direction of the plate-like work so as to sandwich the moving plate-like work from both sides. A regulating roller means having a roller,
Current shielding means for preventing current from concentrating on the end of the plate-like workpiece;
A plating tank for electroplating a plate-like workpiece,
The current shielding means includes an upper shielding plate that prevents current from concentrating on the upper end of the plate-like workpiece, and / or a lower shielding plate that prevents current from concentrating on the lower end of the plate-like workpiece. Has
The upper shielding plate and / or the lower shielding plate is composed of a plurality of integrally movable shielding plates arranged between the plate-like workpiece and the anode means, and the plurality of shielding plates arranged. , Arranged so that the overlap with the plate workpiece becomes smaller as it is closer to the plate workpiece,
A plating tank characterized by that. A processing tank body provided extending in the moving direction of the plate-like workpiece and holding the processing liquid;
An anode means;
Jetting means for jetting the processing liquid from the side surface of the processing tank body toward the plate-shaped workpiece;
In the inside of the processing tank main body, a plurality of rotatably provided continuously from the upper part to the lower part of the processing tank main body and in the traveling direction of the plate-like work so as to sandwich the moving plate-like work from both sides. A regulating roller means having a roller,
Current shielding means for preventing current from concentrating on the end of the plate-like workpiece;
A plating tank for electroplating a plate-like workpiece,
The current shielding means includes an upper shielding plate that prevents current from concentrating on the upper end portion of the plate-like workpiece, and a lower shielding plate that prevents current from concentrating on the lower end portion of the plate-like workpiece. ,
The upper shielding plate and the lower shielding plate are constituted by a plurality of shielding plates arranged between the plate-like workpiece and the anode means, and the plurality of shielding plates are arranged with the plate-like workpiece. Arranged so that the overlap is closer to the plate workpiece,
A plating tank characterized by that.   A plurality of rollers included in the regulating roller means are disposed at intervals of 1 mm to 5 mm from the plate-like workpiece;
  The plating tank according to claim 1 or 2, wherein   The jetting means is composed of jet nozzles installed on both sides of the plate-like workpiece, and the jet nozzles are arranged so that the heights of the jet nozzles alternate on both sides of the plate-like workpiece;
  The plating tank according to any one of claims 1 to 3. The restricting roller means is provided with a plurality of roller standing bodies in which a plurality of rollers are arranged in the vertical direction in the traveling direction of the plate-like workpiece, and at the ejection position of the ejection means, adjacent roller stands are arranged. That the interval between the structures is wider than other parts,
The plating tank according to any one of claims 1 to 4, wherein: A substrate end detachment prevention member is provided in the vicinity of the lower end of the plate-like workpiece so as to sandwich the moving plate-like workpiece from both sides at the ejection position of the ejection means;
The plating tank of any one of Claims 1-5 characterized by these. In the region where the regulating roller means is arranged, at least one roller is arranged per predetermined unit area;
The plating tank according to any one of claims 1 to 6 , wherein: The regulating roller means includes a plurality of roller standing bodies in which a plurality of rollers are arranged in the vertical direction in the traveling direction of the plate-like workpiece, and the vertical distance between the rollers in the roller standing body is 50. Arranged at ~ 100mm,
The plating tank according to any one of claims 1 to 7 , wherein: The regulating roller means is provided with a plurality of roller standing bodies in which a plurality of rollers are arranged in the vertical direction in the advancing direction of the plate-like workpiece, of which 50 mm from the lower end of the plate-like workpiece. What is arranged at a height that exceeds is arranged so that the vertical position of the roller is different between the roller standing bodies,
Plating tank according to any one of claim 1 to 8, wherein.   A plurality of jet nozzles for jetting the plating solution constituting the jetting means are attached to the nozzle tube at a predetermined interval, and each nozzle tube is erected on an eductor box for equalizing the plating solution pressure. The eductor box and the lower end of the nozzle tube are connected by a communication hole so that the plating solution can flow.
  The plating tank of any one of Claims 1-9 characterized by these.

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