JP4692787B2 - 薄膜磁気ヘッド - Google Patents
薄膜磁気ヘッド Download PDFInfo
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- JP4692787B2 JP4692787B2 JP2009095920A JP2009095920A JP4692787B2 JP 4692787 B2 JP4692787 B2 JP 4692787B2 JP 2009095920 A JP2009095920 A JP 2009095920A JP 2009095920 A JP2009095920 A JP 2009095920A JP 4692787 B2 JP4692787 B2 JP 4692787B2
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- 230000005291 magnetic effect Effects 0.000 title claims description 459
- 239000010409 thin film Substances 0.000 title claims description 51
- 230000008878 coupling Effects 0.000 claims description 198
- 238000010168 coupling process Methods 0.000 claims description 198
- 238000005859 coupling reaction Methods 0.000 claims description 198
- 230000005415 magnetization Effects 0.000 claims description 104
- 230000005290 antiferromagnetic effect Effects 0.000 claims description 76
- 229910003321 CoFe Inorganic materials 0.000 claims description 48
- 239000010408 film Substances 0.000 claims description 47
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 230000005540 biological transmission Effects 0.000 claims description 15
- 239000013078 crystal Substances 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 230000004044 response Effects 0.000 claims description 3
- 239000000725 suspension Substances 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 2
- 229910052707 ruthenium Inorganic materials 0.000 claims 2
- 239000010410 layer Substances 0.000 description 635
- 230000008859 change Effects 0.000 description 22
- 239000000463 material Substances 0.000 description 18
- 230000006870 function Effects 0.000 description 16
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 14
- 230000002093 peripheral effect Effects 0.000 description 13
- 230000005294 ferromagnetic effect Effects 0.000 description 10
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 229910002551 Fe-Mn Inorganic materials 0.000 description 3
- 229910003286 Ni-Mn Inorganic materials 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000002885 antiferromagnetic material Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910019236 CoFeB Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910002546 FeCo Inorganic materials 0.000 description 1
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001808 coupling effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/317—Testing of digital circuits
- G01R31/3181—Functional testing
- G01R31/3185—Reconfiguring for testing, e.g. LSSD, partitioning
- G01R31/318533—Reconfiguring for testing, e.g. LSSD, partitioning using scanning techniques, e.g. LSSD, Boundary Scan, JTAG
- G01R31/318536—Scan chain arrangements, e.g. connections, test bus, analog signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/317—Testing of digital circuits
- G01R31/3181—Functional testing
- G01R31/3185—Reconfiguring for testing, e.g. LSSD, partitioning
- G01R31/318533—Reconfiguring for testing, e.g. LSSD, partitioning using scanning techniques, e.g. LSSD, Boundary Scan, JTAG
- G01R31/318541—Scan latches or cell details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3912—Arrangements in which the active read-out elements are transducing in association with active magnetic shields, e.g. magnetically coupled shields
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- General Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Hall/Mr Elements (AREA)
- Magnetic Heads (AREA)
Description
2 MR積層体
3 下部シールド層
4 上部シールド層
5 第1の交換結合伝達層
6 第1のMR磁性層
7 非磁性中間層
8 第2のMR磁性層
9 第2の交換結合伝達層
11 第1の主シールド層
12 第1の反強磁性層
13 第1の交換結合磁界印加層
14 第2の交換結合磁界印加層
15 第2の反強磁性層
16 第2の主シールド層
17 絶縁層
18 バイアス磁界印加層
42 金属下地層
A1 投影領域
Claims (12)
- 外部磁界に応じて磁化方向が変化する第1のMR磁性層と、非磁性中間層と、外部磁界に応じて磁化方向が変化する第2のMR磁性層とを有し、該第1のMR磁性層と、該非磁性中間層と、該第2のMR磁性層とがこの順で互いに接して積層されたMR積層体と、
各々が前記第1のMR磁性層と前記第2のMR磁性層とに面して、前記MR積層体の膜面直交方向に前記MR積層体を挟んで設けられ、センス電流を前記MR積層体の前記膜面直交方向に流す電極を兼ねる下部及び上部シールド層と、
前記MR積層体の記録媒体対向面の反対面に設けられ、前記MR積層体に該記録媒体対向面と直交する向きのバイアス磁界を印加するバイアス磁界印加手段と、
前記MR積層体のトラック幅方向両側に設けられた絶縁層と、
を有し、
前記下部シールド層は、
前記第1のMR磁性層に面して設けられ、前記第1のMR磁性層に前記記録媒体対向面と平行な向きの交換結合磁界を印加する第1の交換結合磁界印加層と、
前記第1のMR磁性層から見て前記第1の交換結合磁界印加層の裏面に該第1の交換結合磁界印加層に接して設けられ、該第1の交換結合磁界印加層との間で反強磁性結合する第1の反強磁性層と、を有し、
前記上部シールド層は、
前記第2のMR磁性層及び前記絶縁層に面して設けられ、前記第2のMR磁性層に前記記録媒体対向面と平行で、かつ前記第1の交換結合磁界印加層が前記第1のMR磁性層に及ぼす交換結合磁界と反平行な向きの交換結合磁界を印加する第2の交換結合磁界印加層と、
前記第2のMR磁性層から見て前記第2の交換結合磁界印加層の裏面に該第2の交換結合磁界印加層に接して、かつ該第2の交換結合磁界印加層の前記裏面を覆って設けられ、該第2の交換結合磁界印加層との間で反強磁性結合する第2の反強磁性層と、
を有し、
前記絶縁層と前記第2の交換結合磁界印加層との間には、アモルファス、体心立方格子、または稠密六方格子の結晶構造をもつ金属下地層が設けられている、薄膜磁気ヘッド。 - 前記金属下地層はTa,Cr,CrTiまたはRuからなる、請求項1に記載の薄膜磁気ヘッド。
- 前記金属下地層の膜厚は、1nm以上で、かつ前記上部シールド層と前記下部シールド層との間隔よりも小さい、請求項1または2に記載の薄膜磁気ヘッド。
- 前記バイアス磁界印加手段はバイアス磁界印加層である、請求項1から3のいずれか1項に記載の薄膜磁気ヘッド。
- 前記第1及び第2の交換結合磁界印加層は各々、前記第1及び第2の反強磁性層に接して設けられたCoFe合金層を含んでいる、請求項1から4のいずれか1項に記載の薄膜磁気ヘッド。
- 前記MR積層体は、前記第1のMR磁性層と前記第1の交換結合磁界印加層との間、または前記第2のMR磁性層と前記第2の交換結合磁界印加層との間の少なくとも一方に、少なくとも1層のルテニウム(Ru)層を含む磁性層からなる交換結合伝達層を有している、請求項1から5のいずれか1項に記載の薄膜磁気ヘッド。
- 前記MR積層体は、前記第1のMR磁性層と前記第1の交換結合磁界印加層との間、または前記第2のMR磁性層と前記第2の交換結合磁界印加層との間の少なくとも一方に、ルテニウム(Ru)層からなる交換結合伝達層を有している、請求項1から5のいずれか1項に記載の薄膜磁気ヘッド。
- 請求項1から7のいずれか1項に記載の薄膜磁気ヘッドを備えたスライダ。
- 請求項1から7のいずれか1項に記載の薄膜磁気ヘッドとなるべき積層体が形成されたウエハ。
- 請求項8に記載のスライダと、前記スライダを弾性的に支持するサスペンションと、を有するヘッドジンバルアセンブリ。
- 請求項8に記載のスライダと、該スライダを支持するとともに、該スライダを記録媒体に対して位置決めする装置と、を有するハードディスク装置。
- 請求項8に記載のスライダと、該スライダを支持するとともに、該スライダを記録媒体に対して位置決めする装置と、を有するハードディスク装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/222,543 | 2008-08-12 | ||
US12/222,543 US8189303B2 (en) | 2008-08-12 | 2008-08-12 | Thin film magnetic head having a pair of magnetic layers whose magnetization is controlled by shield layers |
Publications (2)
Publication Number | Publication Date |
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JP2010044848A JP2010044848A (ja) | 2010-02-25 |
JP4692787B2 true JP4692787B2 (ja) | 2011-06-01 |
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JP2009095920A Expired - Fee Related JP4692787B2 (ja) | 2008-08-12 | 2009-04-10 | 薄膜磁気ヘッド |
Country Status (2)
Country | Link |
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US (1) | US8189303B2 (ja) |
JP (1) | JP4692787B2 (ja) |
Families Citing this family (36)
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US8049997B2 (en) * | 2008-09-29 | 2011-11-01 | Tdk Corporation | Magnetoresistive element including a pair of free layers coupled to a pair of shield layers |
US8289660B2 (en) * | 2010-06-16 | 2012-10-16 | Seagate Technology Llc | Auxiliary magnetoresistive shield |
US8144437B2 (en) | 2010-06-28 | 2012-03-27 | Tdk Corporation | Magnetoresistive element and thin film magnetic head |
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US8451567B2 (en) * | 2010-12-13 | 2013-05-28 | Headway Technologies, Inc. | High resolution magnetic read head using top exchange biasing and/or lateral hand biasing of the free layer |
US8760819B1 (en) | 2010-12-23 | 2014-06-24 | Western Digital (Fremont), Llc | Magnetic recording sensor with sputtered antiferromagnetic coupling trilayer between plated ferromagnetic shields |
US8564911B2 (en) | 2011-02-17 | 2013-10-22 | Tdk Corporation | Magneto-resistive effect element having spacer layer including gallium oxide layer with metal element |
US8593766B2 (en) * | 2011-02-22 | 2013-11-26 | Tdk Corporation | Magneto-resistive effect element having spacer layer including main spacer layer containing gallium oxide and metal intermediate layer |
US8498083B2 (en) | 2011-03-16 | 2013-07-30 | Tdk Corporation | Magneto-resistive effect element having spacer layer containing gallium oxide, partially oxidized copper |
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US8477461B2 (en) * | 2008-07-29 | 2013-07-02 | Tdk Corporation | Thin film magnetic head having a pair of magnetic layers whose magnetization is controlled by shield layers |
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2008
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JP2002222504A (ja) * | 2000-11-27 | 2002-08-09 | Tdk Corp | 薄膜磁気ヘッドおよびその製造方法 |
JP2002298314A (ja) * | 2001-04-02 | 2002-10-11 | Alps Electric Co Ltd | 薄膜磁気ヘッド |
US7035062B1 (en) * | 2001-11-29 | 2006-04-25 | Seagate Technology Llc | Structure to achieve sensitivity and linear density in tunneling GMR heads using orthogonal magnetic alignments |
JP2003318462A (ja) * | 2002-04-22 | 2003-11-07 | Matsushita Electric Ind Co Ltd | 磁気抵抗効果素子とこれを用いた磁気ヘッドおよび磁気メモリ |
JP2008192269A (ja) * | 2007-02-07 | 2008-08-21 | Hitachi Global Storage Technologies Netherlands Bv | 磁気リード・ヘッド及びその製造方法 |
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JP2010044848A (ja) | 2010-02-25 |
US20100039734A1 (en) | 2010-02-18 |
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