JP4684563B2 - 露光装置及び方法 - Google Patents

露光装置及び方法 Download PDF

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Publication number
JP4684563B2
JP4684563B2 JP2004052330A JP2004052330A JP4684563B2 JP 4684563 B2 JP4684563 B2 JP 4684563B2 JP 2004052330 A JP2004052330 A JP 2004052330A JP 2004052330 A JP2004052330 A JP 2004052330A JP 4684563 B2 JP4684563 B2 JP 4684563B2
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JP
Japan
Prior art keywords
optical system
reticle
projection optical
light source
effective light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004052330A
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English (en)
Japanese (ja)
Other versions
JP2005243953A (ja
JP2005243953A5 (enExample
Inventor
健一郎 篠田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004052330A priority Critical patent/JP4684563B2/ja
Priority to EP05251021A priority patent/EP1569033A3/en
Priority to US11/064,635 priority patent/US7385672B2/en
Publication of JP2005243953A publication Critical patent/JP2005243953A/ja
Publication of JP2005243953A5 publication Critical patent/JP2005243953A5/ja
Application granted granted Critical
Publication of JP4684563B2 publication Critical patent/JP4684563B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004052330A 2004-02-26 2004-02-26 露光装置及び方法 Expired - Fee Related JP4684563B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004052330A JP4684563B2 (ja) 2004-02-26 2004-02-26 露光装置及び方法
EP05251021A EP1569033A3 (en) 2004-02-26 2005-02-23 Exposure apparatus and method
US11/064,635 US7385672B2 (en) 2004-02-26 2005-02-24 Exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004052330A JP4684563B2 (ja) 2004-02-26 2004-02-26 露光装置及び方法

Publications (3)

Publication Number Publication Date
JP2005243953A JP2005243953A (ja) 2005-09-08
JP2005243953A5 JP2005243953A5 (enExample) 2007-04-12
JP4684563B2 true JP4684563B2 (ja) 2011-05-18

Family

ID=34747524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004052330A Expired - Fee Related JP4684563B2 (ja) 2004-02-26 2004-02-26 露光装置及び方法

Country Status (3)

Country Link
US (1) US7385672B2 (enExample)
EP (1) EP1569033A3 (enExample)
JP (1) JP4684563B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI252965B (en) * 2004-04-13 2006-04-11 Benq Corp Device for manufacturing hologram and method for manufacturing hologram with the device
JP4957058B2 (ja) 2006-04-12 2012-06-20 大日本印刷株式会社 回折光学素子、および該素子を備えた露光装置
JP2007317960A (ja) * 2006-05-26 2007-12-06 Canon Inc 露光条件の検出方法及び装置、並びに、露光装置
US7724349B2 (en) * 2007-05-02 2010-05-25 Asml Netherlands B.V. Device arranged to measure a quantity relating to radiation and lithographic apparatus
US20090118714A1 (en) * 2007-11-07 2009-05-07 Dan Teodorescu Surgical console information display system and method
DE102008007449A1 (de) 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
JP2009194107A (ja) * 2008-02-13 2009-08-27 Canon Inc 有効光源形状のデータベースの生成方法、光学像の算出方法、プログラム、露光方法及びデバイス製造方法
DE102011003066A1 (de) * 2010-02-26 2011-09-01 Carl Zeiss Smt Gmbh Verfahren zum belastungsgerechten Betrieb einer Projektionsbelichtungsanlage sowie entsprechende Projektionsbelichtungsanlage
DE102012205096B3 (de) * 2012-03-29 2013-08-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
DE102015209051B4 (de) * 2015-05-18 2018-08-30 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator sowie Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage
JP6944323B2 (ja) * 2017-09-21 2021-10-06 キヤノン株式会社 計算方法、露光方法、プログラム、露光装置、および物品の製造方法
FR3107766B1 (fr) * 2020-02-28 2022-07-15 Eldim Dispositif optique permettant de mesurer rapidement l’émission angulaire d’une source de lumière de surface finie

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03186011A (ja) * 1989-12-15 1991-08-14 Matsushita Electric Ind Co Ltd ディジタル自動位相制御回路
JP3278782B2 (ja) * 1991-08-09 2002-04-30 キヤノン株式会社 半導体デバイスの製造方法及び投影露光装置
US5424803A (en) * 1991-08-09 1995-06-13 Canon Kabushiki Kaisha Projection exposure apparatus and semiconductor device manufacturing method
US6078380A (en) * 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
US6404482B1 (en) * 1992-10-01 2002-06-11 Nikon Corporation Projection exposure method and apparatus
US6078381A (en) * 1993-02-01 2000-06-20 Nikon Corporation Exposure method and apparatus
JP3301153B2 (ja) * 1993-04-06 2002-07-15 株式会社ニコン 投影露光装置、露光方法、及び素子製造方法
JP3463335B2 (ja) * 1994-02-17 2003-11-05 株式会社ニコン 投影露光装置
US6304317B1 (en) 1993-07-15 2001-10-16 Nikon Corporation Projection apparatus and method
JP3186011B2 (ja) * 1994-06-24 2001-07-11 キヤノン株式会社 投影露光装置及びデバイス製造方法
US5798838A (en) * 1996-02-28 1998-08-25 Nikon Corporation Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same
JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
JP3262039B2 (ja) * 1997-07-18 2002-03-04 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
US6333777B1 (en) 1997-07-18 2001-12-25 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JPH11150053A (ja) * 1997-11-18 1999-06-02 Nikon Corp 露光方法及び装置
JP2001168000A (ja) * 1999-12-03 2001-06-22 Nikon Corp 露光装置の製造方法、および該製造方法によって製造された露光装置を用いたマイクロデバイスの製造方法
TW546699B (en) * 2000-02-25 2003-08-11 Nikon Corp Exposure apparatus and exposure method capable of controlling illumination distribution
JP3599629B2 (ja) * 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP3631094B2 (ja) * 2000-03-30 2005-03-23 キヤノン株式会社 投影露光装置及びデバイス製造方法
DE10046218B4 (de) * 2000-09-19 2007-02-22 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
JP3341767B2 (ja) * 2001-10-10 2002-11-05 株式会社ニコン 投影露光装置及び方法、並びに回路素子形成方法
JP4191923B2 (ja) * 2001-11-02 2008-12-03 株式会社東芝 露光方法および露光装置
JP3826047B2 (ja) 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
JP3950731B2 (ja) 2002-04-23 2007-08-01 キヤノン株式会社 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
JP4497949B2 (ja) 2004-02-12 2010-07-07 キヤノン株式会社 露光装置

Also Published As

Publication number Publication date
US7385672B2 (en) 2008-06-10
EP1569033A2 (en) 2005-08-31
US20050190350A1 (en) 2005-09-01
EP1569033A3 (en) 2007-01-17
JP2005243953A (ja) 2005-09-08

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