JP4671142B2 - 半導体ウエハの処理装置、温度測定用プローブ及びその温度測定方法 - Google Patents
半導体ウエハの処理装置、温度測定用プローブ及びその温度測定方法 Download PDFInfo
- Publication number
- JP4671142B2 JP4671142B2 JP35875499A JP35875499A JP4671142B2 JP 4671142 B2 JP4671142 B2 JP 4671142B2 JP 35875499 A JP35875499 A JP 35875499A JP 35875499 A JP35875499 A JP 35875499A JP 4671142 B2 JP4671142 B2 JP 4671142B2
- Authority
- JP
- Japan
- Prior art keywords
- probe
- probe head
- temperature
- semiconductor wafer
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/14—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations
- G01K1/143—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations for measuring surface temperatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/16—Special arrangements for conducting heat from the object to the sensitive element
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US213925 | 1998-12-17 | ||
| US09/213,925 US6110288A (en) | 1998-12-17 | 1998-12-17 | Temperature probe and measurement method for low pressure process |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000200815A JP2000200815A (ja) | 2000-07-18 |
| JP2000200815A5 JP2000200815A5 (cg-RX-API-DMAC7.html) | 2007-05-10 |
| JP4671142B2 true JP4671142B2 (ja) | 2011-04-13 |
Family
ID=22797057
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35875499A Expired - Fee Related JP4671142B2 (ja) | 1998-12-17 | 1999-12-17 | 半導体ウエハの処理装置、温度測定用プローブ及びその温度測定方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6110288A (cg-RX-API-DMAC7.html) |
| EP (1) | EP1014058B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4671142B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE69927921T2 (cg-RX-API-DMAC7.html) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6594780B1 (en) * | 1999-10-19 | 2003-07-15 | Inasoft, Inc. | Operating system and data protection |
| US7080940B2 (en) * | 2001-04-20 | 2006-07-25 | Luxtron Corporation | In situ optical surface temperature measuring techniques and devices |
| US6572265B1 (en) | 2001-04-20 | 2003-06-03 | Luxtron Corporation | In situ optical surface temperature measuring techniques and devices |
| US20040012808A1 (en) * | 2001-06-04 | 2004-01-22 | Payne David M. | Network-based technical support and diagnostics |
| US6796711B2 (en) * | 2002-03-29 | 2004-09-28 | Axcelis Technologies, Inc. | Contact temperature probe and process |
| US6695886B1 (en) * | 2002-08-22 | 2004-02-24 | Axcelis Technologies, Inc. | Optical path improvement, focus length change compensation, and stray light reduction for temperature measurement system of RTP tool |
| US7183779B2 (en) * | 2004-12-28 | 2007-02-27 | Spectrum Technologies, Inc. | Soil probe device and method of making same |
| US7651269B2 (en) * | 2007-07-19 | 2010-01-26 | Lam Research Corporation | Temperature probes having a thermally isolated tip |
| JP5591565B2 (ja) * | 2010-03-12 | 2014-09-17 | 東京エレクトロン株式会社 | 温度測定用プローブ、温度測定システム及びこれを用いた温度測定方法 |
| US9196516B2 (en) * | 2013-03-14 | 2015-11-24 | Qualitau, Inc. | Wafer temperature measurement tool |
| WO2022187343A1 (en) * | 2021-03-02 | 2022-09-09 | Applied Materials, Inc. | Apparatus for fiber optic temperature probe in processing chambers |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2093045A6 (cg-RX-API-DMAC7.html) * | 1970-05-29 | 1972-01-28 | Commissariat Energie Atomique | |
| US4909314A (en) * | 1979-12-21 | 1990-03-20 | Varian Associates, Inc. | Apparatus for thermal treatment of a wafer in an evacuated environment |
| US4457359A (en) * | 1982-05-25 | 1984-07-03 | Varian Associates, Inc. | Apparatus for gas-assisted, solid-to-solid thermal transfer with a semiconductor wafer |
| JPS59215718A (ja) * | 1983-05-23 | 1984-12-05 | Kokusai Electric Co Ltd | 半導体基板の赤外線熱処理装置 |
| US4949783A (en) * | 1988-05-18 | 1990-08-21 | Veeco Instruments, Inc. | Substrate transport and cooling apparatus and method for same |
| US4907894A (en) * | 1988-12-20 | 1990-03-13 | Bnf Metals Technology Centre | Surface-temperature sensing method and apparatus |
| US5755511A (en) * | 1994-12-19 | 1998-05-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
| US6140612A (en) * | 1995-06-07 | 2000-10-31 | Lam Research Corporation | Controlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuck |
| US5791782A (en) * | 1995-09-21 | 1998-08-11 | Fusion Systems Corporation | Contact temperature probe with unrestrained orientation |
| JP3323927B2 (ja) * | 1995-11-02 | 2002-09-09 | 株式会社アドバンスト・ディスプレイ | 基板表面検査方法および該方法に用いる装置 |
| US5775416A (en) * | 1995-11-17 | 1998-07-07 | Cvc Products, Inc. | Temperature controlled chuck for vacuum processing |
| US5761023A (en) * | 1996-04-25 | 1998-06-02 | Applied Materials, Inc. | Substrate support with pressure zones having reduced contact area and temperature feedback |
| JPH10239165A (ja) * | 1997-02-27 | 1998-09-11 | Sony Corp | 基板の温度測定器、基板の温度を測定する方法および基板の加熱方法 |
| US5937541A (en) * | 1997-09-15 | 1999-08-17 | Siemens Aktiengesellschaft | Semiconductor wafer temperature measurement and control thereof using gas temperature measurement |
-
1998
- 1998-12-17 US US09/213,925 patent/US6110288A/en not_active Expired - Lifetime
-
1999
- 1999-12-13 DE DE69927921T patent/DE69927921T2/de not_active Expired - Fee Related
- 1999-12-13 EP EP99310004A patent/EP1014058B1/en not_active Expired - Lifetime
- 1999-12-17 JP JP35875499A patent/JP4671142B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1014058A1 (en) | 2000-06-28 |
| DE69927921T2 (de) | 2006-07-27 |
| DE69927921D1 (de) | 2005-12-01 |
| JP2000200815A (ja) | 2000-07-18 |
| US6110288A (en) | 2000-08-29 |
| EP1014058B1 (en) | 2005-10-26 |
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