JP4644707B2 - 特にマイクロシステム技術における幾何構成の干渉と画像化の組合せに基づく検出のための装置 - Google Patents
特にマイクロシステム技術における幾何構成の干渉と画像化の組合せに基づく検出のための装置 Download PDFInfo
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- JP4644707B2 JP4644707B2 JP2007512002A JP2007512002A JP4644707B2 JP 4644707 B2 JP4644707 B2 JP 4644707B2 JP 2007512002 A JP2007512002 A JP 2007512002A JP 2007512002 A JP2007512002 A JP 2007512002A JP 4644707 B2 JP4644707 B2 JP 4644707B2
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/04—Measuring microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
Claims (12)
- 干渉測定モードと画像処理モードを有し、前記干渉測定モードにおいて干渉分光法を用いて測定対象物(9)の高さの値を2次元で検出して、前記画像処理モードにおいて光学画像の再生およびディジタル評価を用いて前記測定対象物(9)の幾何的な要素の横方向寸法を測定する装置であって、
対物レンズ(5)と、
切換え光源を含んでいる反射照明用の機器(1)と、
参照ミラー(7)を備えている干渉計と、
を備えた、装置において、
前記対物レンズ(5)は、前記干渉測定モードにおいて、前記切換え光源のうちの低可干渉性光源(1b)から供給される電磁波のスペクトルに対しては干渉対物レンズとして構成され、
前記対物レンズ(5)は、前記画像処理モードにおいて、電磁波のスペクトルの別部分に対しては光学画像化対物レンズとして構成され、更に、前記参照ミラー(7)が周波数を選択する切換え要素として機能し、
反射照明に用いられる光のスペクトルの組み立てを切換え光源の切り換えを用いて変更することによって、前記干渉測定モードと前記画像処理モードを変更することができることを特徴とする装置。 - 反射照明用の前記機器(1)は、異なるスペクトル組成からなる少なくとも2つの異なる種類の光を発するように構成されることを特徴とする請求項1に記載の装置。
- 前記切換え光源は、少なくとも2つの光源(1a、1b)であることを特徴とする請求項1に記載の装置。
- 前記光源(1a、1b)は、異なる色を有するLEDであることを特徴とする請求項3に記載の装置。
- 前記画像処理モード用の光源(1a)として青色LEDが設けられることを特徴とする請求項3に記載の装置。
- 前記干渉計は、白色光干渉計であることを特徴とする請求項1に記載の装置。
- 前記干渉計、前記対物レンズ(5)および/または前記測定対象物(9)に垂直走査型干渉分光法を行うための調整機器(10)が割り当てられることを特徴とする請求項6に記載の装置。
- 前記干渉計は、位相シフトのために用いられる参照ミラー(7)を備えることを特徴とする請求項1に記載の装置。
- 前記低可干渉性光源(1b)に加えて、高可干渉性光源(1c)が設けられ、位相シフト型干渉分光法に基づく第3の測定モードを可能にすることを特徴とする請求項8に記載の装置。
- ドット状の態様で測定するスキャナ(16)が、前記装置の視野に配置されることを特徴とする請求項1に記載の装置。
- 前記スキャナ(16)は、接触式のスキャナであることを特徴とする請求項10に記載の装置。
- 前記装置と前記測定対象物(9)を相対調整するために位置決め機器(10)が設けられることを特徴とする請求項1に記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004022341A DE102004022341A1 (de) | 2004-05-04 | 2004-05-04 | Vorrichtung und Verfahren zur kombinierten interferometrischen und abbildungsbasierten Geometrieerfassung insbesondere in der Mikrosystemtechnik |
PCT/EP2005/004795 WO2005108915A1 (de) | 2004-05-04 | 2005-05-03 | Vorrichtung und verfahren zur kombinierten interferometrischen und abbildungsbasierten geometrieerfassung, insbesondere in der mikrosystemtechnik |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007536539A JP2007536539A (ja) | 2007-12-13 |
JP4644707B2 true JP4644707B2 (ja) | 2011-03-02 |
Family
ID=34968734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007512002A Expired - Fee Related JP4644707B2 (ja) | 2004-05-04 | 2005-05-03 | 特にマイクロシステム技術における幾何構成の干渉と画像化の組合せに基づく検出のための装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7545505B2 (ja) |
JP (1) | JP4644707B2 (ja) |
CN (1) | CN100414248C (ja) |
DE (2) | DE102004022341A1 (ja) |
WO (1) | WO2005108915A1 (ja) |
Families Citing this family (31)
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DE102006021557B3 (de) | 2006-05-08 | 2007-07-12 | Carl Mahr Holding Gmbh | Vorrichtung und Verfahren zur kombinierten interferometrischen und abbildungsbasierten Geometrieerfassung, insbesondere in der Mikrosystemtechnik |
JP2008116900A (ja) * | 2006-10-11 | 2008-05-22 | Olympus Corp | 干渉対物レンズと、その干渉対物レンズを備える干渉顕微鏡装置 |
DE102007020860A1 (de) | 2007-05-02 | 2008-11-13 | Carl Mahr Holding Gmbh | XY- und Winkelmessung mittels kombinierter Weißlichtinterferometrie |
JP2008299210A (ja) * | 2007-06-01 | 2008-12-11 | Olympus Corp | 干渉対物レンズと、その干渉対物レンズを備える干渉顕微鏡装置 |
TWI378221B (en) * | 2007-09-21 | 2012-12-01 | Ind Tech Res Inst | Scatterfield microscopical measuring method and apparatus |
DE102007053124B3 (de) * | 2007-11-08 | 2009-01-29 | Carl Mahr Holding Gmbh | Kompaktes Linnik-Interferometer |
DE102007054734B4 (de) | 2007-11-16 | 2009-12-24 | GFE Gesellschaft für Fertigungstechnik u. Entwicklung Schmalkalden e.V. | Verfahren zum Erfassen eines Oberflächenprofils |
TWI366749B (en) * | 2007-12-10 | 2012-06-21 | Ind Tech Res Inst | Multi-color off-axis digital holographic system and the imaging method thereof |
TWI384195B (zh) * | 2008-10-08 | 2013-02-01 | Ind Tech Res Inst | 振動位移與振動頻率決定方法與其裝置 |
JP2011038829A (ja) * | 2009-08-07 | 2011-02-24 | Topcon Corp | 干渉顕微鏡及び測定装置 |
EP2327953B1 (en) * | 2009-11-20 | 2013-06-19 | Mitutoyo Corporation | Apparatus and method for determining a height map of a surface through both interferometric and non interferometric measurements. |
FR2962531B1 (fr) * | 2010-07-08 | 2014-01-17 | Lltech Inc | Methode et dispositif d'imagerie tridimensionnelle par microscopie interferentielle plein champ |
CN102759332B (zh) * | 2011-04-27 | 2016-09-28 | 上海微电子装备有限公司 | 散射计量装置及其计量方法 |
US9036157B2 (en) * | 2012-10-19 | 2015-05-19 | National Applied Research Laboratories | System of computing surface reconstruction, in-plane and out-of-plane displacements and strain distribution |
US9395173B2 (en) * | 2014-10-22 | 2016-07-19 | National Applied Research Laboratories | Multi-functioned optical measurement device and method for optically measuring a plurality of parameters |
EP2813801B1 (en) * | 2013-06-10 | 2018-10-31 | Mitutoyo Corporation | Interferometer system and method to generate an interference signal of a surface of a sample |
JP2015118076A (ja) * | 2013-12-20 | 2015-06-25 | 株式会社ミツトヨ | 光干渉測定装置、およびプログラム |
EP3077763B1 (de) | 2014-01-23 | 2018-01-03 | Carl Zeiss Industrielle Messtechnik GmbH | Verfahren zur auswertung von koordinatenmessdaten, entsprechende vorrichtung zum vermessen eines messobjektes und entsprechendes computerprogrammprodukt |
DE102014118151A1 (de) * | 2014-12-08 | 2016-06-09 | Universität Kassel | Weißlicht-Interferenzmikroskop und Verfahren zum Betreiben eines Weißlicht-Interferenzmikroskops |
JP2017090395A (ja) | 2015-11-17 | 2017-05-25 | 株式会社ミツトヨ | 干渉対物レンズ及び参照面ユニットセット |
DE102016125451B4 (de) | 2016-12-22 | 2023-02-02 | Universität Kassel | Vorrichtung und Verfahren zur interferometrischen Bestimmung einer Oberflächentopographie eines Messobjekts |
CN109387155B (zh) * | 2017-08-10 | 2020-09-22 | 上海微电子装备(集团)股份有限公司 | 形貌检测装置与形貌检测方法 |
JP6769566B2 (ja) * | 2017-12-18 | 2020-10-14 | 横河電機株式会社 | 対物光学系及び顕微鏡システム |
CN109211934B (zh) * | 2018-08-29 | 2021-01-26 | 南京理工大学 | 基于干涉显微的微球面缺陷检测装置及其检测方法 |
CN111220088B (zh) * | 2018-11-26 | 2021-08-31 | 深圳中科飞测科技股份有限公司 | 测量系统和方法 |
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CN110285771A (zh) * | 2019-05-15 | 2019-09-27 | 淮阴师范学院 | 基于白光干涉的嵌入式三维形貌测量模块 |
CN110332904B (zh) * | 2019-07-18 | 2021-06-25 | 天津大学 | 基于平面光栅分光的线型显微干涉光谱测量系统与方法 |
DE102022102572A1 (de) | 2022-02-03 | 2023-08-03 | Carl Zeiss Microscopy Gmbh | Abbildungssystem und Verfahren zum Abbilden und Vermessen eines Objektes |
CN117006971A (zh) * | 2023-09-25 | 2023-11-07 | 板石智能科技(深圳)有限公司 | 一种三维形貌测量系统 |
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- 2005-05-03 JP JP2007512002A patent/JP4644707B2/ja not_active Expired - Fee Related
- 2005-05-03 CN CNB2005800137342A patent/CN100414248C/zh not_active Expired - Fee Related
- 2005-05-03 WO PCT/EP2005/004795 patent/WO2005108915A1/de active Application Filing
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2006
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Also Published As
Publication number | Publication date |
---|---|
CN100414248C (zh) | 2008-08-27 |
DE112005000639B4 (de) | 2010-05-12 |
US7545505B2 (en) | 2009-06-09 |
DE112005000639A5 (de) | 2008-01-17 |
WO2005108915A1 (de) | 2005-11-17 |
US20070035744A1 (en) | 2007-02-15 |
CN1950668A (zh) | 2007-04-18 |
DE102004022341A1 (de) | 2005-12-29 |
JP2007536539A (ja) | 2007-12-13 |
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