JP4633499B2 - 外観検査装置及び外観検査方法 - Google Patents

外観検査装置及び外観検査方法 Download PDF

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Publication number
JP4633499B2
JP4633499B2 JP2005052799A JP2005052799A JP4633499B2 JP 4633499 B2 JP4633499 B2 JP 4633499B2 JP 2005052799 A JP2005052799 A JP 2005052799A JP 2005052799 A JP2005052799 A JP 2005052799A JP 4633499 B2 JP4633499 B2 JP 4633499B2
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JP
Japan
Prior art keywords
substrate
light source
illumination
appearance inspection
optical axis
Prior art date
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Expired - Fee Related
Application number
JP2005052799A
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English (en)
Japanese (ja)
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JP2006234721A (ja
Inventor
裕幸 岡平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
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Olympus Corp
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Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP2005052799A priority Critical patent/JP4633499B2/ja
Priority to TW095104369A priority patent/TW200632311A/zh
Priority to CN2006100576897A priority patent/CN1828280B/zh
Priority to KR1020060018372A priority patent/KR20060095479A/ko
Publication of JP2006234721A publication Critical patent/JP2006234721A/ja
Application granted granted Critical
Publication of JP4633499B2 publication Critical patent/JP4633499B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30141—Printed circuit board [PCB]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2005052799A 2005-02-28 2005-02-28 外観検査装置及び外観検査方法 Expired - Fee Related JP4633499B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005052799A JP4633499B2 (ja) 2005-02-28 2005-02-28 外観検査装置及び外観検査方法
TW095104369A TW200632311A (en) 2005-02-28 2006-02-09 Visual inspection apparatus and visual inspection method
CN2006100576897A CN1828280B (zh) 2005-02-28 2006-02-24 外观检查装置及外观检查方法
KR1020060018372A KR20060095479A (ko) 2005-02-28 2006-02-24 외관 검사 장치 및 외관 검사 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005052799A JP4633499B2 (ja) 2005-02-28 2005-02-28 外観検査装置及び外観検査方法

Publications (2)

Publication Number Publication Date
JP2006234721A JP2006234721A (ja) 2006-09-07
JP4633499B2 true JP4633499B2 (ja) 2011-02-16

Family

ID=36946776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005052799A Expired - Fee Related JP4633499B2 (ja) 2005-02-28 2005-02-28 外観検査装置及び外観検査方法

Country Status (4)

Country Link
JP (1) JP4633499B2 (zh)
KR (1) KR20060095479A (zh)
CN (1) CN1828280B (zh)
TW (1) TW200632311A (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100831629B1 (ko) * 2006-08-31 2008-05-22 동일파텍주식회사 병렬지지 방식 매크로 검사장치
JP5006024B2 (ja) * 2006-12-27 2012-08-22 オリンパス株式会社 外観検査用投光装置
KR101373129B1 (ko) * 2011-12-30 2014-03-13 엘아이지에이디피 주식회사 기판 검사장비
KR101593020B1 (ko) * 2014-07-09 2016-02-11 세광테크 주식회사 조명 반사판을 구비한 패널 얼라인장치
JP6587822B2 (ja) * 2015-04-22 2019-10-09 株式会社ブイ・テクノロジー 外観検査装置
CN105115978A (zh) * 2015-09-09 2015-12-02 山东华芯富创电子科技有限公司 触摸屏检验治具
CN107589072A (zh) * 2017-08-30 2018-01-16 东莞新友智能科技有限公司 一种用于表面检测的光源装置
CN108627516A (zh) * 2018-03-21 2018-10-09 郑州轻工业学院 一种用于空调产品的检修方法以及检修系统
CN109030495A (zh) * 2018-06-26 2018-12-18 大连鉴影光学科技有限公司 一种基于机器视觉技术的光学元件缺陷检测方法
JP7111659B2 (ja) * 2019-06-28 2022-08-02 矢崎総業株式会社 端子の外観検査装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000097864A (ja) * 1998-09-21 2000-04-07 Olympus Optical Co Ltd 外観検査用投光装置
WO2002016916A1 (fr) * 2000-08-24 2002-02-28 Olympus Optical Co., Ltd. Projecteur pour controle d'aspect
JP2002374445A (ja) * 2001-06-12 2002-12-26 Nikon Corp 電子カメラ
WO2003102562A1 (fr) * 2002-05-31 2003-12-11 Olympus Corporation Dispositif de macro-illumination
JP2004101748A (ja) * 2002-09-06 2004-04-02 Seiko Epson Corp 液晶パネルの検査装置及びその検査方法
JP2004153422A (ja) * 2002-10-29 2004-05-27 Toshiba Corp 撮影装置、顔照合装置、撮影装置の汚れ検知方法、及び顔照合方法
JP2005117262A (ja) * 2003-10-06 2005-04-28 Fujitsu Ltd レンズの汚れ判定方法及び装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000097864A (ja) * 1998-09-21 2000-04-07 Olympus Optical Co Ltd 外観検査用投光装置
WO2002016916A1 (fr) * 2000-08-24 2002-02-28 Olympus Optical Co., Ltd. Projecteur pour controle d'aspect
JP2002374445A (ja) * 2001-06-12 2002-12-26 Nikon Corp 電子カメラ
WO2003102562A1 (fr) * 2002-05-31 2003-12-11 Olympus Corporation Dispositif de macro-illumination
JP2004101748A (ja) * 2002-09-06 2004-04-02 Seiko Epson Corp 液晶パネルの検査装置及びその検査方法
JP2004153422A (ja) * 2002-10-29 2004-05-27 Toshiba Corp 撮影装置、顔照合装置、撮影装置の汚れ検知方法、及び顔照合方法
JP2005117262A (ja) * 2003-10-06 2005-04-28 Fujitsu Ltd レンズの汚れ判定方法及び装置

Also Published As

Publication number Publication date
KR20060095479A (ko) 2006-08-31
JP2006234721A (ja) 2006-09-07
CN1828280A (zh) 2006-09-06
CN1828280B (zh) 2011-07-13
TW200632311A (en) 2006-09-16

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