JP4625375B2 - 検査装置 - Google Patents

検査装置 Download PDF

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Publication number
JP4625375B2
JP4625375B2 JP2005176062A JP2005176062A JP4625375B2 JP 4625375 B2 JP4625375 B2 JP 4625375B2 JP 2005176062 A JP2005176062 A JP 2005176062A JP 2005176062 A JP2005176062 A JP 2005176062A JP 4625375 B2 JP4625375 B2 JP 4625375B2
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Japan
Prior art keywords
electron beam
image
inspection
resistance
inspected
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Expired - Fee Related
Application number
JP2005176062A
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English (en)
Japanese (ja)
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JP2006024921A5 (enExample
JP2006024921A (ja
Inventor
英利 西山
真理 野副
博之 品田
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Hitachi Ltd
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Hitachi Ltd
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Priority to JP2005176062A priority Critical patent/JP4625375B2/ja
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Publication of JP2006024921A5 publication Critical patent/JP2006024921A5/ja
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Publication of JP4625375B2 publication Critical patent/JP4625375B2/ja
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  • Analysing Materials By The Use Of Radiation (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2005176062A 2000-02-22 2005-06-16 検査装置 Expired - Fee Related JP4625375B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005176062A JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000050501 2000-02-22
JP2005176062A JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000276640A Division JP4015352B2 (ja) 2000-02-22 2000-09-07 荷電粒子ビームを用いた検査方法

Publications (3)

Publication Number Publication Date
JP2006024921A JP2006024921A (ja) 2006-01-26
JP2006024921A5 JP2006024921A5 (enExample) 2007-01-25
JP4625375B2 true JP4625375B2 (ja) 2011-02-02

Family

ID=35797943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005176062A Expired - Fee Related JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

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JP (1) JP4625375B2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12169208B2 (en) 2021-11-30 2024-12-17 Innovatum Instruments Inc. Probe tip X-Y location identification using a charged particle beam
US12306241B2 (en) 2022-02-14 2025-05-20 Innovatum Instruments Inc. Automated probe landing

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4978065B2 (ja) * 2006-06-12 2012-07-18 株式会社日立製作所 電子顕微鏡応用装置
JP5171101B2 (ja) * 2007-05-01 2013-03-27 株式会社日立ハイテクノロジーズ 電子線照射条件決定支援ユニット、および電子線式試料検査装置
JP5497980B2 (ja) * 2007-06-29 2014-05-21 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置、及び試料検査方法
JP7189103B2 (ja) * 2019-08-30 2022-12-13 株式会社日立ハイテク 荷電粒子線装置
CN119339775B (zh) * 2024-09-06 2025-11-21 华中科技大学 一种存储器件电学性能缺陷的原位测量方法及系统

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3724949B2 (ja) * 1998-05-15 2005-12-07 株式会社東芝 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12169208B2 (en) 2021-11-30 2024-12-17 Innovatum Instruments Inc. Probe tip X-Y location identification using a charged particle beam
US12306241B2 (en) 2022-02-14 2025-05-20 Innovatum Instruments Inc. Automated probe landing

Also Published As

Publication number Publication date
JP2006024921A (ja) 2006-01-26

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