JP2006024921A5 - - Google Patents

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Publication number
JP2006024921A5
JP2006024921A5 JP2005176062A JP2005176062A JP2006024921A5 JP 2006024921 A5 JP2006024921 A5 JP 2006024921A5 JP 2005176062 A JP2005176062 A JP 2005176062A JP 2005176062 A JP2005176062 A JP 2005176062A JP 2006024921 A5 JP2006024921 A5 JP 2006024921A5
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JP
Japan
Prior art keywords
electron beam
primary electron
inspection apparatus
image
irradiation
Prior art date
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Granted
Application number
JP2005176062A
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English (en)
Japanese (ja)
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JP4625375B2 (ja
JP2006024921A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005176062A priority Critical patent/JP4625375B2/ja
Priority claimed from JP2005176062A external-priority patent/JP4625375B2/ja
Publication of JP2006024921A publication Critical patent/JP2006024921A/ja
Publication of JP2006024921A5 publication Critical patent/JP2006024921A5/ja
Application granted granted Critical
Publication of JP4625375B2 publication Critical patent/JP4625375B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005176062A 2000-02-22 2005-06-16 検査装置 Expired - Fee Related JP4625375B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005176062A JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000050501 2000-02-22
JP2005176062A JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000276640A Division JP4015352B2 (ja) 2000-02-22 2000-09-07 荷電粒子ビームを用いた検査方法

Publications (3)

Publication Number Publication Date
JP2006024921A JP2006024921A (ja) 2006-01-26
JP2006024921A5 true JP2006024921A5 (enExample) 2007-01-25
JP4625375B2 JP4625375B2 (ja) 2011-02-02

Family

ID=35797943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005176062A Expired - Fee Related JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Country Status (1)

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JP (1) JP4625375B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4978065B2 (ja) * 2006-06-12 2012-07-18 株式会社日立製作所 電子顕微鏡応用装置
JP5171101B2 (ja) * 2007-05-01 2013-03-27 株式会社日立ハイテクノロジーズ 電子線照射条件決定支援ユニット、および電子線式試料検査装置
JP5497980B2 (ja) * 2007-06-29 2014-05-21 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置、及び試料検査方法
JP7189103B2 (ja) * 2019-08-30 2022-12-13 株式会社日立ハイテク 荷電粒子線装置
US12169208B2 (en) 2021-11-30 2024-12-17 Innovatum Instruments Inc. Probe tip X-Y location identification using a charged particle beam
US12306241B2 (en) 2022-02-14 2025-05-20 Innovatum Instruments Inc. Automated probe landing
CN119339775B (zh) * 2024-09-06 2025-11-21 华中科技大学 一种存储器件电学性能缺陷的原位测量方法及系统

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3724949B2 (ja) * 1998-05-15 2005-12-07 株式会社東芝 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法

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