JP4614386B2 - 位置決め装置、露光装置およびそれを用いたデバイス製造方法 - Google Patents

位置決め装置、露光装置およびそれを用いたデバイス製造方法 Download PDF

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Publication number
JP4614386B2
JP4614386B2 JP2005029832A JP2005029832A JP4614386B2 JP 4614386 B2 JP4614386 B2 JP 4614386B2 JP 2005029832 A JP2005029832 A JP 2005029832A JP 2005029832 A JP2005029832 A JP 2005029832A JP 4614386 B2 JP4614386 B2 JP 4614386B2
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JP
Japan
Prior art keywords
exhaust
stator
gas
positioning device
exposure apparatus
Prior art date
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Expired - Fee Related
Application number
JP2005029832A
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English (en)
Japanese (ja)
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JP2006216866A5 (enExample
JP2006216866A (ja
Inventor
洋之 丸山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005029832A priority Critical patent/JP4614386B2/ja
Priority to US11/347,037 priority patent/US7298457B2/en
Publication of JP2006216866A publication Critical patent/JP2006216866A/ja
Priority to US11/925,026 priority patent/US7460213B2/en
Publication of JP2006216866A5 publication Critical patent/JP2006216866A5/ja
Priority to US12/268,794 priority patent/US20090066928A1/en
Application granted granted Critical
Publication of JP4614386B2 publication Critical patent/JP4614386B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

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  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005029832A 2005-02-04 2005-02-04 位置決め装置、露光装置およびそれを用いたデバイス製造方法 Expired - Fee Related JP4614386B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005029832A JP4614386B2 (ja) 2005-02-04 2005-02-04 位置決め装置、露光装置およびそれを用いたデバイス製造方法
US11/347,037 US7298457B2 (en) 2005-02-04 2006-02-03 Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus
US11/925,026 US7460213B2 (en) 2005-02-04 2007-10-26 Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus
US12/268,794 US20090066928A1 (en) 2005-02-04 2008-11-11 Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005029832A JP4614386B2 (ja) 2005-02-04 2005-02-04 位置決め装置、露光装置およびそれを用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006216866A JP2006216866A (ja) 2006-08-17
JP2006216866A5 JP2006216866A5 (enExample) 2008-01-17
JP4614386B2 true JP4614386B2 (ja) 2011-01-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005029832A Expired - Fee Related JP4614386B2 (ja) 2005-02-04 2005-02-04 位置決め装置、露光装置およびそれを用いたデバイス製造方法

Country Status (2)

Country Link
US (3) US7298457B2 (enExample)
JP (1) JP4614386B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4614386B2 (ja) * 2005-02-04 2011-01-19 キヤノン株式会社 位置決め装置、露光装置およびそれを用いたデバイス製造方法
US20120043300A1 (en) * 2010-08-22 2012-02-23 Nauganeedles Llc NanoNeedles Pulling System
JP5836005B2 (ja) 2011-08-15 2015-12-24 キヤノン株式会社 位置決め装置、露光装置及びデバイス製造方法
JP6278833B2 (ja) * 2014-05-21 2018-02-14 キヤノン株式会社 リソグラフィ装置、および物品の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2724787B2 (ja) * 1992-10-09 1998-03-09 キヤノン株式会社 位置決め装置
JP3689949B2 (ja) * 1995-12-19 2005-08-31 株式会社ニコン 投影露光装置、及び該投影露光装置を用いたパターン形成方法
US5959732A (en) * 1996-04-10 1999-09-28 Nikon Corporation Stage apparatus and a stage control method
US6714278B2 (en) * 1996-11-25 2004-03-30 Nikon Corporation Exposure apparatus
JPH10209040A (ja) * 1996-11-25 1998-08-07 Nikon Corp 露光装置
JP3013837B2 (ja) * 1998-04-27 2000-02-28 日本電気株式会社 ステージ位置計測装置およびその計測方法
JPH11315883A (ja) * 1998-04-30 1999-11-16 Canon Inc 除振装置、露光装置およびデバイス製造方法
AU1179200A (en) * 1998-11-18 2000-06-05 Nikon Corporation Exposure method and device
JP4474020B2 (ja) 2000-06-23 2010-06-02 キヤノン株式会社 移動装置及び露光装置
AUPQ879200A0 (en) 2000-07-14 2000-08-10 Thomas & Betts International, Inc. A lamp assembly
JP2003124101A (ja) * 2001-10-17 2003-04-25 Canon Inc 露光装置
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
EP1510867A1 (en) * 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005150533A (ja) * 2003-11-18 2005-06-09 Canon Inc 露光装置
JP2004328014A (ja) * 2004-08-10 2004-11-18 Nikon Corp 投影露光装置、及び該投影露光装置を用いたパターン形成方法
JP4614386B2 (ja) * 2005-02-04 2011-01-19 キヤノン株式会社 位置決め装置、露光装置およびそれを用いたデバイス製造方法

Also Published As

Publication number Publication date
US7298457B2 (en) 2007-11-20
US7460213B2 (en) 2008-12-02
US20060176465A1 (en) 2006-08-10
US20080079953A1 (en) 2008-04-03
JP2006216866A (ja) 2006-08-17
US20090066928A1 (en) 2009-03-12

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