JP4608202B2 - 成膜装置 - Google Patents

成膜装置 Download PDF

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Publication number
JP4608202B2
JP4608202B2 JP2003392328A JP2003392328A JP4608202B2 JP 4608202 B2 JP4608202 B2 JP 4608202B2 JP 2003392328 A JP2003392328 A JP 2003392328A JP 2003392328 A JP2003392328 A JP 2003392328A JP 4608202 B2 JP4608202 B2 JP 4608202B2
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Japan
Prior art keywords
aerosol
nozzles
raw material
film
material powder
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Expired - Fee Related
Application number
JP2003392328A
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English (en)
Japanese (ja)
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JP2005154803A5 (enExample
JP2005154803A (ja
Inventor
哲 三好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Priority to JP2003392328A priority Critical patent/JP4608202B2/ja
Publication of JP2005154803A publication Critical patent/JP2005154803A/ja
Publication of JP2005154803A5 publication Critical patent/JP2005154803A5/ja
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Publication of JP4608202B2 publication Critical patent/JP4608202B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Micromachines (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
JP2003392328A 2003-11-21 2003-11-21 成膜装置 Expired - Fee Related JP4608202B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003392328A JP4608202B2 (ja) 2003-11-21 2003-11-21 成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003392328A JP4608202B2 (ja) 2003-11-21 2003-11-21 成膜装置

Publications (3)

Publication Number Publication Date
JP2005154803A JP2005154803A (ja) 2005-06-16
JP2005154803A5 JP2005154803A5 (enExample) 2006-08-03
JP4608202B2 true JP4608202B2 (ja) 2011-01-12

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ID=34719064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003392328A Expired - Fee Related JP4608202B2 (ja) 2003-11-21 2003-11-21 成膜装置

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JP (1) JP4608202B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5099468B2 (ja) * 2006-03-13 2012-12-19 富士通株式会社 成膜装置及び電子部品の製造方法
EP1837181A3 (en) 2006-03-20 2009-04-29 Brother Kogyo Kabushiki Kaisha Method for producing piezoelectric actuator, method for producing liquid droplet jetting apparatus, piezoelectric actuator, and liquid droplet jetting apparatus
JP2015025210A (ja) * 2014-10-07 2015-02-05 株式会社ニコン 微粒子噴射成膜システム及び箔基材連続成膜方法
JP7117790B2 (ja) * 2020-11-24 2022-08-15 豊実精工株式会社 成膜装置、および、成膜製品の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4707209B2 (ja) * 2000-06-06 2011-06-22 独立行政法人産業技術総合研究所 セラミック構造物作製装置
JP2003277949A (ja) * 2000-10-23 2003-10-02 National Institute Of Advanced Industrial & Technology 複合構造物およびその作製方法並びに作製装置
JP3809860B2 (ja) * 2001-11-29 2006-08-16 独立行政法人産業技術総合研究所 複合構造物作製方法及び複合構造物作製装置
JP4236414B2 (ja) * 2002-02-28 2009-03-11 独立行政法人産業技術総合研究所 複合構造物作製用ノズル

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Publication number Publication date
JP2005154803A (ja) 2005-06-16

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