JP4603814B2 - 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法 - Google Patents

露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法 Download PDF

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Publication number
JP4603814B2
JP4603814B2 JP2004128802A JP2004128802A JP4603814B2 JP 4603814 B2 JP4603814 B2 JP 4603814B2 JP 2004128802 A JP2004128802 A JP 2004128802A JP 2004128802 A JP2004128802 A JP 2004128802A JP 4603814 B2 JP4603814 B2 JP 4603814B2
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JP
Japan
Prior art keywords
light
mark
optical system
stage
projection optical
Prior art date
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Expired - Fee Related
Application number
JP2004128802A
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English (en)
Japanese (ja)
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JP2005311198A5 (enExample
JP2005311198A (ja
Inventor
慎一郎 古賀
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004128802A priority Critical patent/JP4603814B2/ja
Priority to US11/110,735 priority patent/US7315348B2/en
Publication of JP2005311198A publication Critical patent/JP2005311198A/ja
Publication of JP2005311198A5 publication Critical patent/JP2005311198A5/ja
Application granted granted Critical
Publication of JP4603814B2 publication Critical patent/JP4603814B2/ja
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Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Automatic Focus Adjustment (AREA)
JP2004128802A 2004-04-23 2004-04-23 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法 Expired - Fee Related JP4603814B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004128802A JP4603814B2 (ja) 2004-04-23 2004-04-23 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法
US11/110,735 US7315348B2 (en) 2004-04-23 2005-04-21 Exposure apparatus, focal point detecting method, exposure method and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004128802A JP4603814B2 (ja) 2004-04-23 2004-04-23 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005311198A JP2005311198A (ja) 2005-11-04
JP2005311198A5 JP2005311198A5 (enExample) 2007-04-26
JP4603814B2 true JP4603814B2 (ja) 2010-12-22

Family

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Family Applications (1)

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JP2004128802A Expired - Fee Related JP4603814B2 (ja) 2004-04-23 2004-04-23 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法

Country Status (2)

Country Link
US (1) US7315348B2 (enExample)
JP (1) JP4603814B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4603814B2 (ja) 2004-04-23 2010-12-22 キヤノン株式会社 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法
JP3962736B2 (ja) * 2004-10-08 2007-08-22 キヤノン株式会社 露光装置およびデバイス製造方法
JP2007250947A (ja) * 2006-03-17 2007-09-27 Canon Inc 露光装置および像面検出方法
JP5181451B2 (ja) * 2006-09-20 2013-04-10 株式会社ニコン マスク、露光装置及び露光方法、並びにデバイス製造方法
JP5104107B2 (ja) * 2007-08-02 2012-12-19 ウシオ電機株式会社 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法
JP5361322B2 (ja) 2008-10-14 2013-12-04 キヤノン株式会社 露光装置及びデバイスの製造方法
US9411223B2 (en) * 2012-09-10 2016-08-09 Globalfoundries Inc. On-product focus offset metrology for use in semiconductor chip manufacturing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07335524A (ja) * 1994-06-06 1995-12-22 Canon Inc 位置合わせ方法
JP3634487B2 (ja) 1996-02-09 2005-03-30 キヤノン株式会社 位置合せ方法、位置合せ装置、および露光装置
JPH11238666A (ja) * 1998-02-19 1999-08-31 Nikon Corp Ｘ線投影露光装置
JP3595707B2 (ja) 1998-10-23 2004-12-02 キヤノン株式会社 露光装置および露光方法
JP4046884B2 (ja) 1999-03-26 2008-02-13 キヤノン株式会社 位置計測方法および該位置計測法を用いた半導体露光装置
JP4666747B2 (ja) * 2000-11-06 2011-04-06 キヤノン株式会社 露光装置およびデバイス製造方法
US6586160B2 (en) * 2001-03-26 2003-07-01 Motorola, Inc. Method for patterning resist
JP4803901B2 (ja) * 2001-05-22 2011-10-26 キヤノン株式会社 位置合わせ方法、露光装置、および半導体デバイス製造方法
JP2002353099A (ja) * 2001-05-22 2002-12-06 Canon Inc 位置検出方法及び装置及び露光装置及びデバイス製造方法
US6879374B2 (en) * 2001-06-20 2005-04-12 Asml Netherlands B.V. Device manufacturing method, device manufactured thereby and a mask for use in the method
US6784975B2 (en) * 2001-08-30 2004-08-31 Micron Technology, Inc. Method and apparatus for irradiating a microlithographic substrate
JP5002100B2 (ja) * 2001-09-13 2012-08-15 キヤノン株式会社 焦点位置検出方法及び焦点位置検出装置
JP4227402B2 (ja) * 2002-12-06 2009-02-18 キヤノン株式会社 走査型露光装置
JP4603814B2 (ja) 2004-04-23 2010-12-22 キヤノン株式会社 露光装置、合焦位置検出装置及びそれらの方法、並びにデバイス製造方法

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Publication number Publication date
US7315348B2 (en) 2008-01-01
JP2005311198A (ja) 2005-11-04
US20050237507A1 (en) 2005-10-27

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