JP4597367B2 - プラズマ発生装置及びプラズマ発生方法 - Google Patents

プラズマ発生装置及びプラズマ発生方法 Download PDF

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Publication number
JP4597367B2
JP4597367B2 JP2000541717A JP2000541717A JP4597367B2 JP 4597367 B2 JP4597367 B2 JP 4597367B2 JP 2000541717 A JP2000541717 A JP 2000541717A JP 2000541717 A JP2000541717 A JP 2000541717A JP 4597367 B2 JP4597367 B2 JP 4597367B2
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JP
Japan
Prior art keywords
antenna
high frequency
plasma
phase shifter
current
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Expired - Lifetime
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JP2000541717A
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English (en)
Japanese (ja)
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JP2002510841A5 (enExample
JP2002510841A (ja
Inventor
ジアン， ジェイ． チェン，
ロバート， ジー． ヴェルトロップ，
トーマス， イー． ウィッカー，
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Lam Research Corp
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Lam Research Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2000541717A 1998-03-31 1999-03-25 プラズマ発生装置及びプラズマ発生方法 Expired - Lifetime JP4597367B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/052,144 US6155199A (en) 1998-03-31 1998-03-31 Parallel-antenna transformer-coupled plasma generation system
US09/052,144 1998-03-31
PCT/US1999/006495 WO1999050885A1 (en) 1998-03-31 1999-03-25 Parallel-antenna transformer-coupled plasma generation systems

Publications (3)

Publication Number Publication Date
JP2002510841A JP2002510841A (ja) 2002-04-09
JP2002510841A5 JP2002510841A5 (enExample) 2006-05-18
JP4597367B2 true JP4597367B2 (ja) 2010-12-15

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ID=21975750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000541717A Expired - Lifetime JP4597367B2 (ja) 1998-03-31 1999-03-25 プラズマ発生装置及びプラズマ発生方法

Country Status (4)

Country Link
US (1) US6155199A (enExample)
JP (1) JP4597367B2 (enExample)
KR (1) KR100602074B1 (enExample)
WO (1) WO1999050885A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI861948B (zh) * 2022-06-22 2024-11-11 大陸商深圳市恒運昌真空技術股份有限公司 電流控制方法和能量輻射系統

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JP6341329B1 (ja) * 2017-02-16 2018-06-13 日新電機株式会社 プラズマ発生用のアンテナ及びそれを備えるプラズマ処理装置
KR102235221B1 (ko) * 2017-02-16 2021-04-02 닛신덴키 가부시키 가이샤 플라즈마 발생용의 안테나, 그것을 구비하는 플라즈마 처리 장치 및 안테나 구조
JP6931461B2 (ja) * 2017-03-15 2021-09-08 日新電機株式会社 プラズマ発生用のアンテナ、それを備えるプラズマ処理装置及びアンテナ構造
JP7209483B2 (ja) * 2017-10-10 2023-01-20 東京エレクトロン株式会社 プラズマ処理装置および測定回路
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI861948B (zh) * 2022-06-22 2024-11-11 大陸商深圳市恒運昌真空技術股份有限公司 電流控制方法和能量輻射系統

Also Published As

Publication number Publication date
WO1999050885A1 (en) 1999-10-07
KR100602074B1 (ko) 2006-07-14
KR20010042269A (ko) 2001-05-25
JP2002510841A (ja) 2002-04-09
US6155199A (en) 2000-12-05

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