JP4573272B2 - 連続成膜装置 - Google Patents
連続成膜装置 Download PDFInfo
- Publication number
- JP4573272B2 JP4573272B2 JP2006202735A JP2006202735A JP4573272B2 JP 4573272 B2 JP4573272 B2 JP 4573272B2 JP 2006202735 A JP2006202735 A JP 2006202735A JP 2006202735 A JP2006202735 A JP 2006202735A JP 4573272 B2 JP4573272 B2 JP 4573272B2
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- film
- roll
- chamber
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006202735A JP4573272B2 (ja) | 2006-07-26 | 2006-07-26 | 連続成膜装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006202735A JP4573272B2 (ja) | 2006-07-26 | 2006-07-26 | 連続成膜装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008031493A JP2008031493A (ja) | 2008-02-14 |
JP2008031493A5 JP2008031493A5 (ko) | 2008-09-11 |
JP4573272B2 true JP4573272B2 (ja) | 2010-11-04 |
Family
ID=39121245
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006202735A Expired - Fee Related JP4573272B2 (ja) | 2006-07-26 | 2006-07-26 | 連続成膜装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4573272B2 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5240782B2 (ja) * | 2009-05-18 | 2013-07-17 | 株式会社神戸製鋼所 | 連続成膜装置 |
CN110643969A (zh) * | 2018-06-27 | 2020-01-03 | 北京铂阳顶荣光伏科技有限公司 | 一种真空蒸镀设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60234971A (ja) * | 1984-03-28 | 1985-11-21 | ジエネラル・エンジニアリング・ラドクリフ・リミテツド | 真空成膜装置 |
JPH11350136A (ja) * | 1998-06-11 | 1999-12-21 | Sony Corp | 真空成膜装置 |
JP2001003168A (ja) * | 1999-06-18 | 2001-01-09 | Sony Corp | 真空成膜装置 |
JP2006077284A (ja) * | 2004-09-09 | 2006-03-23 | Kobe Steel Ltd | 連続成膜装置 |
-
2006
- 2006-07-26 JP JP2006202735A patent/JP4573272B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60234971A (ja) * | 1984-03-28 | 1985-11-21 | ジエネラル・エンジニアリング・ラドクリフ・リミテツド | 真空成膜装置 |
JPH11350136A (ja) * | 1998-06-11 | 1999-12-21 | Sony Corp | 真空成膜装置 |
JP2001003168A (ja) * | 1999-06-18 | 2001-01-09 | Sony Corp | 真空成膜装置 |
JP2006077284A (ja) * | 2004-09-09 | 2006-03-23 | Kobe Steel Ltd | 連続成膜装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2008031493A (ja) | 2008-02-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5000114A (en) | Continuous vacuum vapor deposition system having reduced pressure sub-chambers separated by seal devices | |
US20110139072A1 (en) | Continuous deposition apparatus | |
JP6360882B2 (ja) | フレキシブル基板のための堆積プラットフォーム及びその操作方法 | |
JP5312351B2 (ja) | 帯材状の基板を真空処理するための処理装置 | |
JP5240782B2 (ja) | 連続成膜装置 | |
TWI727921B (zh) | 真空處理系統以及用於固定其之方法 | |
JP6803917B2 (ja) | 真空処理システム及び真空処理を行う方法 | |
US20100304155A1 (en) | Film deposition method, film deposition apparatus, and gas barrier film | |
JP4573272B2 (ja) | 連続成膜装置 | |
US20050172898A1 (en) | Web coating apparatus with a vacuum chamber and a coating cylinder | |
CN103180484A (zh) | 真空处理装置 | |
JP4421980B2 (ja) | 連続成膜装置 | |
JP2006077284A5 (ko) | ||
TWI647743B (zh) | 用於處理基板上薄膜之設備,以及用於提供氣密製程分離壁之方法 | |
JP2008031493A5 (ko) | ||
JP2011094188A (ja) | 真空ロール搬送処理装置 | |
JP2008031492A (ja) | 連続成膜装置 | |
JPH11350136A (ja) | 真空成膜装置 | |
JP2001003168A (ja) | 真空成膜装置 | |
JP2002030430A (ja) | スパッタ装置 | |
JP2000178717A (ja) | 成膜装置 | |
JP2000290389A (ja) | 成膜装置 | |
JP7305565B2 (ja) | 真空処理装置 | |
CN114525469A (zh) | 一种卷对卷真空镀膜机的控制系统及控制方法 | |
JPH0735577B2 (ja) | 帯状物連続真空蒸着処理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080729 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080729 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100804 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100811 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100811 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4573272 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130827 Year of fee payment: 3 |
|
LAPS | Cancellation because of no payment of annual fees |