JP4559137B2 - 真空機器の製造装置及び製造方法 - Google Patents

真空機器の製造装置及び製造方法 Download PDF

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Publication number
JP4559137B2
JP4559137B2 JP2004194772A JP2004194772A JP4559137B2 JP 4559137 B2 JP4559137 B2 JP 4559137B2 JP 2004194772 A JP2004194772 A JP 2004194772A JP 2004194772 A JP2004194772 A JP 2004194772A JP 4559137 B2 JP4559137 B2 JP 4559137B2
Authority
JP
Japan
Prior art keywords
substrate
vacuum
manufacturing apparatus
gas
seal member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004194772A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006019101A (ja
JP2006019101A5 (enExample
Inventor
真希 細田
真人 村木
恭宏 染田
真人 根岸
浩一 脇坂
昌和 菅谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Canon Inc filed Critical Hitachi High Technologies Corp
Priority to JP2004194772A priority Critical patent/JP4559137B2/ja
Priority to US11/155,633 priority patent/US7341393B2/en
Publication of JP2006019101A publication Critical patent/JP2006019101A/ja
Publication of JP2006019101A5 publication Critical patent/JP2006019101A5/ja
Application granted granted Critical
Publication of JP4559137B2 publication Critical patent/JP4559137B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/18—Assembling together the component parts of electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31774—Multi-beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T403/00—Joints and connections
    • Y10T403/32—Articulated members
    • Y10T403/32606—Pivoted
    • Y10T403/32631—Universal ball and socket
    • Y10T403/32713—Elastomerically biased or backed components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP2004194772A 2004-06-30 2004-06-30 真空機器の製造装置及び製造方法 Expired - Fee Related JP4559137B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004194772A JP4559137B2 (ja) 2004-06-30 2004-06-30 真空機器の製造装置及び製造方法
US11/155,633 US7341393B2 (en) 2004-06-30 2005-06-20 Mechanism for sealing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004194772A JP4559137B2 (ja) 2004-06-30 2004-06-30 真空機器の製造装置及び製造方法

Publications (3)

Publication Number Publication Date
JP2006019101A JP2006019101A (ja) 2006-01-19
JP2006019101A5 JP2006019101A5 (enExample) 2007-08-16
JP4559137B2 true JP4559137B2 (ja) 2010-10-06

Family

ID=35540342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004194772A Expired - Fee Related JP4559137B2 (ja) 2004-06-30 2004-06-30 真空機器の製造装置及び製造方法

Country Status (2)

Country Link
US (1) US7341393B2 (enExample)
JP (1) JP4559137B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE512457T1 (de) * 2006-06-07 2011-06-15 Fei Co Gleitlager zur verwendung mit einer eine vakuumkammer umfassenden vorrichtung
CN101461026B (zh) * 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
JP6863784B2 (ja) * 2017-03-16 2021-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2481357A (en) * 1945-10-31 1949-09-06 Douglas Aircraft Co Inc Seal
JPS6054325U (ja) * 1983-09-21 1985-04-16 東芝機械株式会社 電子ビ−ム描画装置の試料カセット
JPS61288980A (ja) * 1985-06-14 1986-12-19 株式会社　東洋空機製作所 ねじ自動締結方法及び装置
JPS6390435U (enExample) * 1986-11-28 1988-06-11
JPH022104A (ja) * 1988-06-15 1990-01-08 Canon Inc マスク保持装置
JPH052755A (ja) * 1991-04-15 1993-01-08 Mitsubishi Electric Corp 光検知器固定機構
US5852093A (en) * 1994-11-30 1998-12-22 Nippon Zeon Co., Ltd. Vulcanizable rubber composition, seal used in dynamic state, and sealing material
US6281508B1 (en) 1999-02-08 2001-08-28 Etec Systems, Inc. Precision alignment and assembly of microlenses and microcolumns
JP2001107161A (ja) * 1999-10-08 2001-04-17 Railway Technical Res Inst 集電摺動用銅系耐摩焼結合金の製造法
JP4947841B2 (ja) * 2000-03-31 2012-06-06 キヤノン株式会社 荷電粒子線露光装置
JP3728217B2 (ja) * 2000-04-27 2005-12-21 キヤノン株式会社 荷電粒子線露光装置およびデバイス製造方法
JP4765200B2 (ja) * 2001-06-04 2011-09-07 Ｎｏｋ株式会社 ガスケット
JP2004029063A (ja) * 2002-06-21 2004-01-29 Adtec Engineeng Co Ltd 密着型露光装置
JP4477436B2 (ja) * 2004-06-30 2010-06-09 キヤノン株式会社 荷電粒子線露光装置

Also Published As

Publication number Publication date
US20060006342A1 (en) 2006-01-12
JP2006019101A (ja) 2006-01-19
US7341393B2 (en) 2008-03-11

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