JP4553705B2 - 除害装置及びその管理方法 - Google Patents
除害装置及びその管理方法 Download PDFInfo
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- JP4553705B2 JP4553705B2 JP2004349600A JP2004349600A JP4553705B2 JP 4553705 B2 JP4553705 B2 JP 4553705B2 JP 2004349600 A JP2004349600 A JP 2004349600A JP 2004349600 A JP2004349600 A JP 2004349600A JP 4553705 B2 JP4553705 B2 JP 4553705B2
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- gas
- agent
- detoxifying agent
- detoxifying
- harmful
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- 238000007726 management method Methods 0.000 title claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 12
- 238000001784 detoxification Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000001627 detrimental effect Effects 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 description 90
- 239000007789 gas Substances 0.000 description 62
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 26
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 21
- 239000001569 carbon dioxide Substances 0.000 description 13
- 229910002092 carbon dioxide Inorganic materials 0.000 description 13
- 229940116318 copper carbonate Drugs 0.000 description 13
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 13
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000005751 Copper oxide Substances 0.000 description 10
- 229910000431 copper oxide Inorganic materials 0.000 description 10
- 238000002474 experimental method Methods 0.000 description 10
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 10
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 9
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical group [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 7
- 239000005750 Copper hydroxide Substances 0.000 description 7
- 229910001956 copper hydroxide Inorganic materials 0.000 description 7
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical group [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 231100000331 toxic Toxicity 0.000 description 6
- 230000002588 toxic effect Effects 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000002516 radical scavenger Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 3
- 239000000645 desinfectant Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 229910001502 inorganic halide Inorganic materials 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XAZAQTBGMXGTBD-UHFFFAOYSA-N tributylarsane Chemical compound CCCC[As](CCCC)CCCC XAZAQTBGMXGTBD-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000003588 decontaminative effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 229910010276 inorganic hydride Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001473 noxious effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
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- Investigating Or Analysing Materials By Optical Means (AREA)
- Treating Waste Gases (AREA)
Description
3CuO + 2PH3 → Cu3P + P + 3H2O
という除害反応により、分析計16で測定可能なガス成分として水(H2O)が生成する。
3Cu(OH)2・CuCO3 + 4PH3
→ 2Cu3P + 3CO2 + 9H2O +2P
という除害反応により、分析計16で測定可能なガス成分として水及び二酸化炭素(CO2)が生成する。同様に、除害剤が水酸化銅のときには水が、除害剤が硝酸銅のときには窒素酸化物(NOx)が、分析計16で測定可能なガス成分としてそれぞれ生成する。
有害ガス容器22をホスフィン容器、分析計28をフーリエ変換赤外吸収光度分析計(MIDAC社製:IGA200)、有害成分用分析計29をホスフィン用ガス分析計(バイオニクス社製:TG4000)とし、窒素中のホスフィン濃度を1%に調節した処理対象ガスを毎分12リットルで除害筒26に導入するようにした。除害筒26内には、上流側に主除害剤となる酸化銅を主成分とした除害剤を200mmの高さで、下流側に副除害剤となる塩基性炭酸銅を主成分とした除害剤を100mmの高さでそれぞれ充填して積層状態とした。
除害筒26の上流側に主除害剤となる塩基性炭酸銅を主成分とした除害剤を200mmの高さで、下流側に副除害剤となる酸化銅を主成分とした除害剤を100mmの高さでそれぞれ充填して積層状態とした。これ以外の条件は実施例1と同じとして実験を行った。
除害筒26の上流側に主除害剤となる水酸化銅を主成分とした除害剤を200mmの高さで、下流側に副除害剤となる酸化銅を主成分とした除害剤を100mmの高さでそれぞれ充填して積層状態とした。これ以外の条件は実施例1と同じとして実験を行った。
Claims (2)
- 有害成分を含むガスを除害剤を充填した除害筒内に導入して前記有害成分の除去処理を行う除害装置において、前記除害剤として、前記有害成分との反応形態が異なる主除害剤と副除害剤とを使用し、該副除害剤を前記主除害剤よりもガス流れ方向下流側に配置するとともに、前記有害成分の除去処理を行った後のガスを導出する処理ガス導出部に、前記副除害剤と前記有害成分との反応によって生成し、前記主除害剤と前記有害成分との反応では生成しないか、生成量が少ないガス成分を測定するガス成分測定手段を設けたことを特徴とする除害装置。
- 請求項1記載の除害装置の管理方法であって、測定対象となる前記ガス成分の濃度が上昇したときを除害剤の交換時期と判定することを特徴とする除害装置の管理方法。
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JP2004349600A JP4553705B2 (ja) | 2004-12-02 | 2004-12-02 | 除害装置及びその管理方法 |
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JP2004349600A JP4553705B2 (ja) | 2004-12-02 | 2004-12-02 | 除害装置及びその管理方法 |
Publications (2)
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JP2006158990A JP2006158990A (ja) | 2006-06-22 |
JP4553705B2 true JP4553705B2 (ja) | 2010-09-29 |
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JP2004349600A Expired - Fee Related JP4553705B2 (ja) | 2004-12-02 | 2004-12-02 | 除害装置及びその管理方法 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4887327B2 (ja) * | 2008-05-07 | 2012-02-29 | 日本パイオニクス株式会社 | フッ素化合物の分解処理システム |
JP5675409B2 (ja) * | 2011-02-09 | 2015-02-25 | 大陽日酸株式会社 | ガス測定装置、及び水素化物ガスの測定方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000117053A (ja) * | 1998-10-16 | 2000-04-25 | Tomoe Shokai:Kk | ClF3処理筒、及びClF3を含む被処理ガスの処理方法 |
JP2001321638A (ja) * | 2000-05-15 | 2001-11-20 | Central Glass Co Ltd | ハイポフルオライトの除害方法 |
JP2001334125A (ja) * | 2000-05-29 | 2001-12-04 | Japan Pionics Co Ltd | 窒素弗化物の浄化システム及び浄化方法 |
JP2004351364A (ja) * | 2003-05-30 | 2004-12-16 | Ebara Corp | 三フッ化塩素を含む無機ハロゲン化ガス含有排ガスの処理方法、処理剤及び処理装置 |
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- 2004-12-02 JP JP2004349600A patent/JP4553705B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000117053A (ja) * | 1998-10-16 | 2000-04-25 | Tomoe Shokai:Kk | ClF3処理筒、及びClF3を含む被処理ガスの処理方法 |
JP2001321638A (ja) * | 2000-05-15 | 2001-11-20 | Central Glass Co Ltd | ハイポフルオライトの除害方法 |
JP2001334125A (ja) * | 2000-05-29 | 2001-12-04 | Japan Pionics Co Ltd | 窒素弗化物の浄化システム及び浄化方法 |
JP2004351364A (ja) * | 2003-05-30 | 2004-12-16 | Ebara Corp | 三フッ化塩素を含む無機ハロゲン化ガス含有排ガスの処理方法、処理剤及び処理装置 |
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JP2006158990A (ja) | 2006-06-22 |
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